Patent number: 4866091
Abstract: This invention relates to new alkane-sulfonanilide derivatives of the formula: ##STR1## wherein R.sup.1, R.sup.2 and R.sup.8 are each hydrogen, cyano, halogen, lower alkyl, halo (lower) alkyl, lower alkylthio, lower alkylsulfinyl, lower alkylsulfonyl or lower alkoxy,R.sup.3 is lower alkyl,R.sup.4 is acyl, cyano, carboxy, hydroxy(lower)-alkyl, mercapto, lower alkylthio, lower alkylsulfinyl, lower alkylsulfonyl, 5-membered unsaturated heterocyclic group which may have amino, lower alkanoylamino, lower alkylthio or lower alkylsulfonyl, phenylthio which may have nitro or amino, lower alkanoyl(lower)alkenyl or a group of the formula: ##STR2## wherein R.sup.6 is hydrogen, amino or lower alkyl andR.sup.7 is hydroxy, lower alkoxy, carboxy(lower)alkoxy, lower alkoxycarbonyl(lower)alkoxy, ureido or thioureido, andR.sup.5 is hydrogen, halogen, lower alkyl or lower alkanoyl, and pharmaceutically acceptable salts thereof.
Type:
Grant
Filed:
June 2, 1988
Date of Patent:
September 12, 1989
Assignee:
Fujisawa Pharmaceutical Co., Ltd.
Inventors:
Masaaki Matsuo, Kiyoshi Tsuji, Nobukiyo Konishi
Patent number: 4738967
Abstract: A compound of the formula: ##STR1## wherein R.sup.1 is lower alkyl,R.sup.3 is hydrogen, halogen or ar(lower)alkoxy, andR is lower alkanoyl, nitroso, amino, carboxy, esterified carboxy, carbamoyl, hydroxycarbamoyl, haloformyl, aminomethyleneamino which may be substituted with cyano or lower alkyl, iminomethylamino which may be substituted with cyano or lower alkyl, or a group of the formula: --A--R.sup.2 in which A is lower alkylene andR.sup.2 is di(lower) alkylamino, cyano, lower alkoxy, N-containing heterocyclic group which may have suitable substituent(s), lower alkynyloxy, lower alkenyloxy, lower alkylthio, amino(lower)alkylthio, lower alkylsulfinyl, lower alkylsulfonyl, carboxy, esterified carboxy, carbamoyl, hydroxycarbamoyl, hydroxy, lower alkanoyloxy, heterocyclicamino(lower)alkylthio having two oxo groups, hydrogen or a group of the formula: ##STR2## in which R.sup.4, R.sup.5 and R.sup.6 are each lower alkyl andX is an acid residue,and pharmaceutically acceptable salts thereof.
Type:
Grant
Filed:
December 23, 1986
Date of Patent:
April 19, 1988
Assignee:
Fujisawa Pharmaceutical Co., Ltd.
Inventors:
Ikuo Ueda, Youichi Shiokawa, Masayuki Kato, Nobukiyo Konishi, Atsushi Akahane
Patent number: 4686227
Abstract: A compound of the formula: ##STR1## wherein R.sup.1 is lower alkyl,R.sup.3 is hydrogen, halogen or ar(lower)alkoxy, andR is lower alkanoyl, nitroso, amino, carboxy, esterified carboxy, carbamoyl, hydroxycarbamoyl, haloformyl, aminomethyleneamino which may be substituted with cyano or lower alkyl, iminomethylamino which may be substituted with cyano or lower alkyl, or a group of the formula: --A--R.sup.2 in whichA is lower alkylene andR.sup.2 is di(lower)alkylamino, cyano, lower alkoxy, N-containing heterocyclic group which may have suitable substituent(s), lower alkynyloxy, lower alkenyloxy, lower alkylthio, amino(lower)alkylthio, lower alkylsulfinyl, lower alkylsulfonyl, carboxy, esterified carboxy, carbamoyl, hydroxycarbamoyl, hydroxy, lower alkanoyloxy, heterocyclicamino (lower)alkylthio having two oxo groups, hydrogen or a group of the formula: ##STR2## in which R.sup.4, R.sup.5 and R.sup.6 are each lower alkyl andX is an acid residue,and pharmaceutically acceptable salts thereof.
Type:
Grant
Filed:
June 17, 1985
Date of Patent:
August 11, 1987
Assignee:
Fujisawa Pharmaceutical Co., Ltd.
Inventors:
Ikuo Ueda, Youichi Shiokawa, Masayuki Kato, Nobukiyo Konishi, Atsushi Akahane