Patents by Inventor Nobuko MATSUMOTO

Nobuko MATSUMOTO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PELLICLE FILM, PELLICLE, ORIGINAL PLATE FOR EXPOSURE, EXPOSURE DEVICE, METHOD OF PRODUCING PELLICLE, AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE
    Publication number: 20230036846
    Abstract: Provided are a pellicle film, a pellicle, an original plate for exposure, an exposure device, a method of producing a semiconductor device, and a method of producing a pellicle, the pellicle film containing carbon nanotubes having a silicon carbide layer in which at least a part of carbon is substituted with silicon at least on a surface layer side.
    Type: Application
    Filed: February 16, 2021
    Publication date: February 2, 2023
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Atsushi OKUBO, Kazuo KOHMURA, Hisako ISHIKAWA, Yosuke ONO, Yasuhisa FUJII, Wataru YOSHIKAWA, Nobuko MATSUMOTO, Tomoe DEGUCHI
  • Pellicle film, pellicle frame, pellicle, and method for producing same
    Patent number: 10261411
    Abstract: A pellicle is contaminated with dust or the like for various reasons during the production thereof. Especially, there is a problem that the risk that the dust or the like is attached is high during trimming or various other processes performed on a pellicle film. The present invention provides a method for producing a pellicle for EUV that decreases the attachment of dust or the like. A method for producing a pellicle includes forming a pellicle film on a substrate; trimming the substrate; and removing at least a part of the substrate after trimming the substrate. Before the part of the substrate is removed, at least particles attached to a surface of the pellicle film are removed.
    Type: Grant
    Filed: June 21, 2017
    Date of Patent: April 16, 2019
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Atsushi Okubo, Tsuneaki Biyajima, Yosuke Ono, Kazuo Kohmura, Yasuhisa Fujii, Nobuko Matsumoto
  • PELLICLE FILM, PELLICLE FRAME, PELLICLE, AND METHOD FOR PRODUCING SAME
    Publication number: 20170285461
    Abstract: A pellicle is contaminated with dust or the like for various reasons during the production thereof. Especially, there is a problem that the risk that the dust or the like is attached is high during trimming or various other processes performed on a pellicle film. The present invention provides a method for producing a pellicle for EUV that decreases the attachment of dust or the like. A method for producing a pellicle includes forming a pellicle film on a substrate; trimming the substrate; and removing at least a part of the substrate after trimming the substrate. Before the part of the substrate is removed, at least particles attached to a surface of the pellicle film are removed.
    Type: Application
    Filed: June 21, 2017
    Publication date: October 5, 2017
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Atsushi OKUBO, Tsuneaki BIYAJIMA, Yosuke ONO, Kazuo KOHMURA, Yasuhisa FUJII, Nobuko MATSUMOTO