Patents by Inventor Nobumasa Higemoto
Nobumasa Higemoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240178876Abstract: A wireless communication device of the disclosure includes: an antenna, in response to receiving a radio wave, transmitting a radio frequency signal corresponding to the radio wave; a detector, detecting the radio frequency signal to obtain a detection signal; a circuit part, performing signal processing based on reception data obtained by performing demodulation processing on the detection signal; a regulator, in response to receiving an external power source voltage from an external source, generating and supplying an internal power source voltage for operating the circuit part to the circuit part; and a radio wave detection control part, detecting whether or not the antenna is receiving a radio wave and stopping a generation operation of the internal power source voltage by the regulator in response to the antenna not receiving the radio wave.Type: ApplicationFiled: November 13, 2023Publication date: May 30, 2024Applicant: LAPIS Technology Co., Ltd.Inventor: Nobumasa HIGEMOTO
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Patent number: 8872620Abstract: A wireless key system and location detection method determine whether a wireless key is located inside or outside a main body. A communication device in the main body transmits a wireless signal using an inner antenna and an outer antenna outside the main body having a different directivity. A wireless key measures direction of movement of the wireless key when the wireless signal is received by one of antennas having different directivities, detects one of the antennas receiving the highest signal level of the wireless signal as a first antenna, selects one of the antennas having the same directivity as the inner antenna as a second antenna according to the measured direction of movement and detected directivity of the antenna, and decides that the wireless key is inside the main body based on the signal levels of the wireless signals received by the first and second antennas.Type: GrantFiled: September 12, 2011Date of Patent: October 28, 2014Assignee: Lapis Semiconductor Co., Ltd.Inventors: Nobumasa Higemoto, Takashi Taya
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Publication number: 20120286926Abstract: A wireless key system and location detection method determine whether a wireless key is located inside or outside a main body. A communication device in the main body transmits a wireless signal using an inner antenna and an outer antenna outside the main body having a different directivity. A wireless key measures direction of movement of the wireless key when the wireless signal is received by one of antennas having different directivities, detects one of the antennas receiving the highest signal level of the wireless signal as a first antenna, selects one of the antennas having the same directivity as the inner antenna as a second antenna according to the measured direction of movement and detected directivity of the antenna, and decides that the wireless key is inside the main body based on the signal levels of the wireless signals received by the first and second antennas.Type: ApplicationFiled: September 12, 2011Publication date: November 15, 2012Applicant: OKI SEMICONDUCTOR CO., LTD.Inventors: Nobumasa Higemoto, Takashi Taya
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Patent number: 7532449Abstract: An analog semiconductor integrated circuit has an analog circuit, a PMOS and a bias adjustment circuit. The gate of the PMOS is the output section of an open drain system, and is connected to an internal node on the output side of the analog circuit. The bias adjustment circuit is connected to the internal node, and allows adjustment of the bias current in accordance with the fuse disconnection number. The relationship between the voltage when a fixed current flows to an input terminal and the fuse disconnection number that allows the optimum bias current to flow to the output section of the analog LSI is checked by using a plurality of sample analog LSIs having different threshold voltages. The voltage is measured by causing a fixed current to flow to the input terminal of a non-sample analog LSI, and the fuse disconnection number corresponding with this voltage is obtained. Thus, the fuses in the bias adjustment circuit are disconnected.Type: GrantFiled: March 10, 2006Date of Patent: May 12, 2009Assignee: Oki Semiconductor Co., Ltd.Inventors: Nobumasa Higemoto, Shinji Tanabe, Takashi Taya
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Publication number: 20060261898Abstract: An analog semiconductor integrated circuit has an analog circuit, a PMOS and a bias adjustment circuit. The gate of the PMOS is the output section of an open drain system, and is connected to an internal node on the output side of the analog circuit. The bias adjustment circuit is connected to the internal node, and allows adjustment of the bias current in accordance with the fuse disconnection number. The relationship between the voltage when a fixed current flows to an input terminal and the fuse disconnection number that allows the optimum bias current to flow to the output section of the analog LSI is checked by using a plurality of sample analog LSIs having different threshold voltages. The voltage is measured by causing a fixed current to flow to the input terminal of a non-sample analog LSI, and the fuse disconnection number corresponding with this voltage is obtained. Thus, the fuses in the bias adjustment circuit are disconnected.Type: ApplicationFiled: March 10, 2006Publication date: November 23, 2006Inventors: Nobumasa Higemoto, Shinji Tanabe, Takashi Taya
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Publication number: 20050184798Abstract: A comparator is constructed to exclude an adverse effect of variation of a power source potential VDD or the like on a current output Iout. The comparator comprises a first voltage follower portion which receives an input potential Vin and outputs a potential (=Vin) following the input potential, a second voltage follower portion which receives a reference voltage Vref and outputs a potential (=Vref) following the input potential, and a current subtracting portion which outputs as a comparison result (Iout) a value achieved by subtracting the amount of current flowing due to the potential difference between the power source potential VDD of the comparator and the output potential (=Vref) of the second voltage follower portion from the amount of current flowing due to the potential difference between the power source potential VDD of the comparator and the output potential (=Vin) of the first voltage follower portion.Type: ApplicationFiled: February 10, 2005Publication date: August 25, 2005Inventors: Nobumasa Higemoto, Shuichi Matsumoto, Akira Horikawa
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Patent number: 6537865Abstract: A semiconductor device fabrication process includes forming a Schottky layer, a cap layer covering the surface of the Schottky layer, and a Schottky electrode of a two-level structure having a lower portion that penetrates through the cap layer and reaches the Schottky layer, and having an upper portion larger than the lower portion in cross-sectional area and that overlies the cap layer. With this construction, surface defects are unlikely to occur, so that a highly reliable semiconductor device can be fabricated.Type: GrantFiled: August 16, 2001Date of Patent: March 25, 2003Assignee: Oki Electric Industry Co., Ltd.Inventors: Kazuyuki Inokuchi, Seiichi Takahashi, Shinichi Hoshi, Tadashi Saito, Nobusuke Yamamoto, Yuko Itoh, Nobumasa Higemoto
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Publication number: 20020024057Abstract: A semiconductor device according to the invention comprises a Schottky layer, a cap layer covering the surface of the Schottky layer, and a Schottky electrode of a two-level structure, having an under structure penetrating through the cap layer and reaching the Schottky layer, and an upper structure larger than the under structure in a cross-sectional area and overlying the cap layer. With such a construction as described, surface defect is unlikely to occur, and therefore, a highly reliable semiconductor device can be fabricated.Type: ApplicationFiled: August 16, 2001Publication date: February 28, 2002Inventors: Kazuyuki Inokuchi, Seiichi Takahashi, Shinichi Hoshi, Tadashi Saito, Nobusuke Yamamoto, Yuko Itoh, Nobumasa Higemoto
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Patent number: 6294801Abstract: A semiconductor device includes a Schottky layer, a cap layer covering the surface of the Schottky layer, and a Schottky electrode of a two-level structure. The Schottky electrode has a lower portion that penetrates through the cap layer and reaches the Schottky layer, and has an upper portion larger than the lower portion in cross-sectional area and that overlies the cap layer. With this construction, surface defects are unlikely to occur, so that a highly reliable semiconductor device can be fabricated.Type: GrantFiled: April 22, 1999Date of Patent: September 25, 2001Assignee: Oki Electric Industry Co., Ltd.Inventors: Kazuyuki Inokuchi, Seiichi Takahashi, Shinichi Hoshi, Tadashi Saito, Nobusuke Yamamoto, Yuko Itoh, Nobumasa Higemoto