Patents by Inventor Nobuo Iijima

Nobuo Iijima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7303712
    Abstract: Injection molding of a product and compressive decoration molding of a surface of the molded product are performed using individual cavity molds. A decorative film can be molded efficiently with a thermosetting coating material under suitable temperature control regardless of the shape of the molded product. An injection cavity mold and a decoration cavity mold are employed. The injection cavity mold is set at a hardening temperature of a thermoplastic resin. The decoration cavity mold is set at a thermosetting temperature of a coating material. A molded product is injection-molded in the cavity mold for injection molding and released from the mold. A decorative coating material composed of a liquid thermosetting composition is mounted at least on a part of the top of the injection-molded product. The molded product is located within the cavity mold for decoration molding.
    Type: Grant
    Filed: April 25, 2003
    Date of Patent: December 4, 2007
    Assignees: Nippon Bee Chemical Co., Ltd., Nissei Plastic Industrial Co., Ltd.
    Inventors: Akihiro Kitamura, Nobuo Iijima, Yoshihiko Saitou, Haruo Okada, Toru Ikeda
  • Publication number: 20030227109
    Abstract: Injection molding of a product and compressive decoration molding of a surface of the molded product are performed using individual cavity molds. A decorative film can be molded efficiently with a thermosetting coating material under suitable temperature control regardless of the shape of the molded product. An injection cavity mold and a decoration cavity mold are employed. The injection cavity mold is set at a hardening temperature of a thermoplastic resin. The decoration cavity mold is set at a thermosetting temperature of a coating material. A molded product is injection-molded in the cavity mold for injection molding and released from the mold. A decorative coating material composed of a liquid thermosetting composition is mounted at least on a part of the top of the injection-molded product. The molded product is located within the cavity mold for decoration molding.
    Type: Application
    Filed: April 25, 2003
    Publication date: December 11, 2003
    Inventors: Akihiro Kitamura, Nobuo Iijima, Yoshihiko Saitou, Haruo Okada, Toru Ikeda
  • Publication number: 20030197307
    Abstract: Injection molding of a product and decoration molding of a surface of the molded product are performed using individual cavity molds. A decorative film can be molded efficiently with a thermosetting coating material under suitable temperature control regardless of the shape of the molded product. An injection cavity mold and a decoration cavity mold are employed. The injection cavity mold is set at a hardening temperature of a thermoplastic resin. The decoration cavity mold is set at a thermosetting temperature of a coating material. A molded product is formed by injection molding in the injection cavity mold. The injection molded product is located within the decoration cavity mold to create a space as a cavity for decoration molding between an inner surface of the decoration cavity mold and a surface of the injection molded product.
    Type: Application
    Filed: March 13, 2003
    Publication date: October 23, 2003
    Inventors: Akihiro Kitamura, Nobuo Iijima, Yoshihiko Saitou, Haruo Okada, Toru Ikeda
  • Patent number: 6170149
    Abstract: According to a method of manufacturing a magnetic head, a magnetoresistive device is formed on a substrate, a top end portion of the magnetoresistive device is placed in an external magnetic field, and a height of the magnetic head is adjusted by ceasing a polishing operation at an instant when change in resistance of the magnetoresistive device relative to change in the external magnetic field comes up to a predetermined value.
    Type: Grant
    Filed: January 30, 1997
    Date of Patent: January 9, 2001
    Assignee: Fujitsu Limited
    Inventors: Mitsumasa Oshiki, Nobuo Iijima, Motoichi Watanuki
  • Patent number: 5286329
    Abstract: A tape-on-wafer mounting apparatus and method for mounting a dicing tape on a wafer. The wafer stage mounts a wafer in the hole, which is constructed such that, when the wafer is mounted there, the wafer top surface stands higher than the wafer stage surface, with the wafer surface on which chip circuits are fabricated faced down. The tape stage mounts a dicing tape on its ring with the tape surface on which adhesives are applied faced down. The tape pressing tool presses the tape stage on the wafer stage so that the tape presser, which is constructed such that vertical force exerted by it is the largest at its center and smaller with the increase in distance from the center, causes the dicing tape to stick to the wafer.
    Type: Grant
    Filed: March 8, 1993
    Date of Patent: February 15, 1994
    Assignee: Fujitsu Limited
    Inventors: Nobuo Iijima, Akihisa Hayashida
  • Patent number: 4955780
    Abstract: A wafer positioning apparatus includes at least first, second and third optical position detectors for detecting a circumference portion of a wafer. The first to third optical position detectors are arranged on a circumference of a circle having a diameter identical to that of the wafer. A transportation robot is used for holding the wafer and moving the held wafer with respect to the first to third optical position detectors. A control circuit controls the transportation robot in accordance with output signals of the first to third optical position detectors so that all of the first to third optical position detectors detect the circumference portion of the wafer at the same time.
    Type: Grant
    Filed: October 13, 1988
    Date of Patent: September 11, 1990
    Assignee: Fujitsu Limited
    Inventors: Kazuo Shimane, Nobuo Iijima, Tatsuro Kawabata
  • Patent number: 4825093
    Abstract: In an automatic wafer process for gate array integrated circuits, it becomes necessary to identify the wafer every time at the beginning of each process. However, it is difficult for conventional methods to identify the wafer by detecting a bar code pattern because of a low contrast due to reflection of the deposited layers. The present invention provides a method in which the light source, which abundantly includes infrared rays, located on the back side of the wafer and a detector located on the front side thereof. The infrared rays are irradiated onto the wafer easily penetrate the silicon wafer. The infrared rays are received without an effect of reflection due to the deposited layers on the front side of the wafer. The first metallization layer is a very suitable layer to form the bar code pattern, which is easily marked by a laser beam scriber.
    Type: Grant
    Filed: May 19, 1987
    Date of Patent: April 25, 1989
    Assignee: Fujitsu Limited
    Inventors: Tadashi Kiriseko, Nobuo Iijima
  • Patent number: 4690591
    Abstract: A method for transporting an article disposed on an upper surface of a stage in a vacuum. Gas is ejected through a plurality of inclined nozzles formed in the stage so that the article is transported in the direction of inclination of the nozzles.
    Type: Grant
    Filed: May 27, 1983
    Date of Patent: September 1, 1987
    Assignee: Fujitsu Limited
    Inventors: Masayasu Nagashima, Nobuo Iijima
  • Patent number: 4570059
    Abstract: An automatic focus control device for adjusting the height of a lens above a surface of a workpiece used in an exposure apparatus for exposing the sample with a light beam including a first light emitting device for emitting a first light ray to a sample; a second light emitting device for emitting a second light ray to the sample. First and second light detecting devices for detect the second and first light rays reflected by a surface of the sample, respectively. The first and second light detecting device have a plurality of light detecting elements. A discriminating device discriminating between an inclination of the sample and a variation of the height of the lens above the surface of the sample on the basis of an output of the first and second light detecting devices.
    Type: Grant
    Filed: December 20, 1983
    Date of Patent: February 11, 1986
    Assignee: Fujitsu Limited
    Inventor: Nobuo Iijima
  • Patent number: 4420223
    Abstract: An optical apparatus wherein a mirror is mounted on a stage. On such stage a supporting portion is provided and the mirror is fixed such to supporting portion at a single portion of the mirror. At the free end portions of the mirror, which are not fixed to the stage, the end surface is in contact with a buffering member.
    Type: Grant
    Filed: November 27, 1981
    Date of Patent: December 13, 1983
    Assignee: Fujitsu Limited
    Inventors: Yoshio Watanabe, Nobuo Iijima
  • Patent number: 4352643
    Abstract: An apparatus with a vacuum system, said vacuum system including a vacuum chamber adapted to contain main instruments of the apparatus, and an exhaust device adapted to exhaust air from the vacuum chamber, which apparatus comprises a structure for vibration isolation adapted to prevent the transmission of the vibration of the exhaust device to a main section of the apparatus, the exhaust device of the structure comprising a bellows connected with the vacuum chamber, an exhaust tube connected with the bellows and a vacuum pump attached to the exhaust tube; and the bellows, the exhaust tube and the vacuum pump are arranged to construct a pendulum system in which the bellows is adapted for a fulcrum, whereby the vibrations of the vacuum pump are absorbed by the pendulum system and do not reach the main section of the apparatus. Other structure for providing additional guidance and dampening of the pendulum system may also be provided.
    Type: Grant
    Filed: May 12, 1980
    Date of Patent: October 5, 1982
    Assignee: Fujitsu Limited
    Inventor: Nobuo Iijima
  • Patent number: 4310764
    Abstract: An electron beam irradiation apparatus which comprises: a base plate of a magnetically permeable material; a movable stage mounted on said base plate; an upper magnetic shield plate having an electron beam passage hole disposed above said stage; a side member of high permeability which magnetically interconnects said base plate and said upper shield plate, and; a magnetic shield cover plate which covers the table surface of said stage.
    Type: Grant
    Filed: June 11, 1980
    Date of Patent: January 12, 1982
    Assignee: Fujitsu Limited
    Inventor: Nobuo Iijima