Abstract: The present invention provides a measurement apparatus which measures a position of a second object relative to a first object, the apparatus including a first measurement unit which includes a diffraction grating provided on the first object, and a first head and a second head provided on the second object, and is configured to measure the position of the second object relative to the first object by the first head or the second head, and a processing unit configured to perform a process of obtaining the position of the second object relative to the first object.

Abstract: The present invention provides an irradiation apparatus which irradiates an object with a charged particle beam, the apparatus including a first charged particle optical system including a charged particle source, a second charged particle optical system into which a charged particle beam is incident from the first charged particle optical system, a detector configured to be moved and to detect a charged particle beam from the first charged particle optical system, and a regulator configured to regulate relative positions between the first charged particle optical system and the second charged particle optical system based on an output from the detector disposed between the first charged particle optical system and the second charged particle optical system.

Abstract: The present invention provides a measurement apparatus which measures a position of a second object relative to a first object, the apparatus including a first measurement unit which includes a diffraction grating provided on the first object, and a first head and a second head provided on the second object, and is configured to measure the position of the second object relative to the first object by the first head or the second head, and a processing unit configured to perform a process of obtaining the position of the second object relative to the first object.

Abstract: An alignment unit includes a measurement unit configured to measure a coordinate of a center position of an alignment mark transferred to each layer that is located under an uppermost layer of a substrate, and a controller configured to determine a target coordinate of the center position of the alignment mark transferred to the uppermost layer of the substrate based on a result of a weighted average that is made by weighting the coordinate of the center position of the alignment mark of each layer of the substrate measured by the measurement unit using as a weight a function inversely proportional to a minimum critical dimension of the pattern of an original formed on each layer of the substrate.

Abstract: An electron gun includes a cathode, a bias electrode, and an anode disposed along a common axis in order thereof. In the electron gun, an electron emitting surface of the cathode has such a shape that brightness of a crossover is more uniform than that in a case that both a first region including a point on the axis and a second region located outside the first region have a first radius of curvature.

Abstract: An alignment unit includes a measurement unit configured to measure a coordinate of a center position of an alignment mark transferred to each layer that is located under an uppermost layer of a substrate, and a controller configured to determine a target coordinate of the center position of the alignment mark transferred to the uppermost layer of the substrate based on a result of a weighted average that is made by weighting the coordinate of the center position of the alignment mark of each layer of the substrate measured by the measurement unit using as a weight a function inversely proportional to a minimum critical dimension of the pattern of an original formed on each layer of the substrate.