Patents by Inventor Nobuo Kushibiki

Nobuo Kushibiki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8097690
    Abstract: Cyclic dihydrogenpolysiloxanes, hydrogenpolysiloxanes of specific siloxane unit formulas etc., a process for their production using hydrolysis/condensation, a process for the production of silica type glass moldings with an optical transmittance of 90% to 100% in the vacuum-UV region to UV region and an optical transmittance of 98% to 100% in the visible region to near infrared region by curing said cyclic dihydrogensiloxanes or said hydrogenpolysiloxanes in a mold, said silica type glass moldings, optical elements made up of the silica type glass, a process for the production of optical elements having such a silica type glass film layer by coating an optical element with the hydrogenpolysiloxanes and curing them, and optical elements having such a silica type glass film layer.
    Type: Grant
    Filed: August 4, 2006
    Date of Patent: January 17, 2012
    Assignee: Dow Corning Toray Company, Ltd.
    Inventors: Yukinari Harimoto, Nobuo Kushibiki, Maki Itoh, Dimitris Elias Katsoulis
  • Publication number: 20110177342
    Abstract: A cured organopolysiloxane resin film having gas barrier properties in which a layer of cured organopolysiloxane that contains an organic functional group, an organic group produced by the polymerization of polymerizable organic functional groups, or the hydrosilyl group or silanol group, is formed on a visible region-transparent film comprising cured organopolysiloxane resin yielded by hydrosilylation reaction-mediated crosslinking, and in which a silicon oxynitride layer, silicon nitride layer, or silicon oxide layer is formed on the aforementioned layer of cured organopolysiloxane. Also, a method of producing this cured organopolysiloxane resin film having gas barrier properties.
    Type: Application
    Filed: June 26, 2009
    Publication date: July 21, 2011
    Inventors: Maki Itoh, Michitaka Suto, Nobuo Kushibiki, Hidekatsu Hatanaka, Katsuya Eguchi, Dimitris Elias Katsoulis
  • Patent number: 7960030
    Abstract: A free-standing film comprising a cured organopolysiloxane resin obtained by conducting a cross-linking reaction between (A) an organopolysiloxane resin represented by the following average siloxane unit formula: [R1aR23-aSiO1/2]v[R3SiO3/2]w (1) or [R1aR23-aSiO1/2]x[R3SiO3/2]y[SiO4/2]z (2) (where R1 designates univalent hydrocarbon groups of one or more than one type selected from alkyl groups having 1 to 4 carbon atoms and univalent aromatic hydrocarbon groups having 6 to 8 carbon atoms; R2 designate alkenyl groups having 2 to 6 carbon atoms; R3 designates alkyl groups with 1 to 4 carbon atoms or univalent aromatic hydrocarbon groups having 6 to 8 carbon atoms; at least 50 mole % of R3 groups being phenyl groups; “a” is 0, 1, or 2; 0.8?w<1.0 and v+w=1; 0<x<0.4, 0.5<y<1, 0<z<0.
    Type: Grant
    Filed: May 13, 2005
    Date of Patent: June 14, 2011
    Assignee: Dow Corning Corporation
    Inventors: Maki Itoh, Michitaka Suto, Nobuo Kushibiki, Katsuya Eguchi
  • Publication number: 20110011447
    Abstract: A method of forming a ceramic silicon oxide type coating and a method of producing an inorganic base material having this coating, by coating an organohydrogensiloxane/hydrogensiloxane copolymer on the surface of an inorganic base material and converting the coating into a ceramic silicon oxide type coating by heating to high temperatures in an inert gas or an oxygen-containing inert gas (oxygen gas less than 20 volume %). A coating-forming agent comprising an organohydrogensiloxane/hydrogensiloxane copolymer or its solution. A semiconductor device comprising at least a semiconductor layer formed on a silicon oxide type coating on an inorganic substrate.
    Type: Application
    Filed: October 3, 2008
    Publication date: January 20, 2011
    Inventors: Yukinari Harimoto, Tetsuyuki Michino, Dimitris Elias Katsoulis, Nobuo Kushibiki, Michitaka Suto
  • Publication number: 20100188766
    Abstract: Cyclic dihydrogenpolysiloxanes, hydrogenpolysiloxanes of specific siloxane unit formulas etc., a process for their production using hydrolysis/condensation, a process for the production of silica type glass moldings with an optical transmittance of 90% to 100% in the vacuum-UV region to UV region and an optical transmittance of 98% to 100% in the visible region to near infrared region by curing said cyclic dihydrogensiloxanes or said hydrogenpolysiloxanes in a mold, said silica type glass moldings, optical elements made up of the silica type glass, a process for the production of optical elements having such a silica type glass film layer by coating an optical element with the hydrogenpolysiloxanes and curing them, and optical elements having such a silica type glass film layer.
    Type: Application
    Filed: August 4, 2006
    Publication date: July 29, 2010
    Inventors: Yukinari Harimoto, Nobuo Kushibiki, Maki Itoh, Elias Dimitris Katsoulis
  • Publication number: 20080318067
    Abstract: A free-standing film comprising a cured organopolysiloxane resin obtained by conducting a cross-linking reaction between (A) an organopolysiloxane resin represented by the following average siloxane unit formula: [R1aR23-aSiO1/2]v[R3SiO3/2]w (1) or [R1aR23-aSiO1/2]x[R3SiO3/2]y[SiO4/2]z (2) (where R1 designates univalent hydrocarbon groups of one or more than one type selected from alkyl groups having 1 to 4 carbon atoms and univalent aromatic hydrocarbon groups having 6 to 8 carbon atoms; R2 designate alkenyl groups having 2 to 6 carbon atoms; R3 designates alkyl groups with 1 to 4 carbon atoms or univalent aromatic hydrocarbon groups having 6 to 8 carbon atoms; at least 50 mole % of R3 groups being phenyl groups; “a” is 0, 1, or 2; 0.8?w<1.0 and v+w=1; 0<x<0.4, 0.5<y<1, 0<z<0.
    Type: Application
    Filed: May 13, 2005
    Publication date: December 25, 2008
    Applicants: DOW CORNING TORAY COMPANY, LTD., DOW CORNING CORPORATION
    Inventors: Maki Itoh, Michitaka Suto, Nobuo Kushibiki, Katsuya Eguchi
  • Patent number: 7381470
    Abstract: The present invention relates to a film made from a cross-linked polysiloxane obtained by subjecting a polysiloxane that has a specific chemical structure and contains at least two unsaturated aliphatic hydrocarbon groups in one molecule and an organosilicon compound with at least two hydrogen atoms directly bonded to silicon atoms in one molecule to cross-linking reaction in the presence of a platinum-type catalyst. The film provided by the invention possesses superior heat-resistant properties, has excellent permeability for light in the visible wavelength range, is characterized by low birefringence, and demonstrates physical properties suitable for practical application. By forming an inorganic substance layer on the aforementioned polysiloxane, it is possible to use the laminated film of the invention, e.g., as a transparent electrode film.
    Type: Grant
    Filed: June 5, 2003
    Date of Patent: June 3, 2008
    Assignee: Dow Corning Toray Co., Ltd.
    Inventors: Michitaka Suto, Dimitris Elias Katsoulis, Nobuo Kushibiki
  • Publication number: 20070025678
    Abstract: The present invention relates to a hydrosilation-curable organopolysiloxane resin composition comprising (A) an organopolysiloxane resin having three or more monovalent unsaturated aliphatic hydrocarbon groups and aromatic hydrocarbon carbon groups, (B) an organosilicon compound having two or more silicon-bonded hydrogen atoms and aromatic hydrocarbon groups, (C) a hydrosilation catalyst, and optionally (D) (d1) a solvent or (d2) a hydrosilation-reactive organosiloxane-based diluent, for optical transmission components, especially for optical transmission components serving as optical communication elements, relates to optical transmission components, represented by optical waveguides, comprisiong a hydrosilation-cured product of the aforementioned organopolysiloxane resin and organosilicon compound, and relates to a process for fabricatiing optical transmission components.
    Type: Application
    Filed: April 7, 2004
    Publication date: February 1, 2007
    Inventors: Nobuo Kushibiki, Takuya Ogawa, Kikuko Takeuchi
  • Publication number: 20050227091
    Abstract: The present invention relates to a film made from a cross-linked polysiloxane obtained by subjecting a polysiloxane that has a specific chemical structure and contains at least two unsaturated aliphatic hydrocarbon groups in one molecule and an organosilicon compound with at least two hydrogen atoms directly bonded to silicon atoms in one molecule to cross-linking reaction in the presence of a platinum-type catalyst. The film provided by the invention possesses superior heat-resistant properties, has excellent permeability for light in the visible wavelength range, is characterized by low birefringence, and demonstrates physical properties suitable for practical application. By forming an inorganic substance layer on the aforementioned polysiloxane, it is possible to use the laminated film of the invention, e.g., as a transparent electrode film.
    Type: Application
    Filed: June 5, 2003
    Publication date: October 13, 2005
    Inventors: Michitaka Suto, Dimitris Katsoulis, Nobuo Kushibiki
  • Patent number: 6592945
    Abstract: The present invention provides a nanoparticle dispersed structure featuring a polymer having a crosslinked structure that is chemically inert with respect to the nanoparticles and that is effective in suppressing diffusion, and provides a method for manufacturing this nanoparticle dispersion.
    Type: Grant
    Filed: March 2, 2001
    Date of Patent: July 15, 2003
    Assignees: Dow Corning Asia, Ltd., Director-General of National Institute of Advanced Industrial Science & Technology
    Inventors: Masaaki Suzuki, Maria Teresa de los Arcos de Pedro, Yoshinori Nakata, Yoshiho Imai, Munehiro Yamaguchi, Nobuo Kushibiki, Kikuko Takeuchi
  • Patent number: 6416855
    Abstract: A composite material having a plurality of laminated polysilylenemethylene layers each having an inside region adjacent to a surface thereof in which nanoparticles of a metal of Au, Pt, Pd, Cu or Ag are dispersed. The composite material is produced by heating a layer of disilacyclobutane overlaid with a layer of nanoparticles of the above metal to polymerize the disilacyclobutane. The above procedure is repeated at least once more.
    Type: Grant
    Filed: July 13, 1999
    Date of Patent: July 9, 2002
    Assignees: Dow Corning Asia, Ltd., National Institute of Advanced Industrial Science and Technology
    Inventors: Fabrice Rossignol, Masaaki Suzuki, Hideaki Nagai, Yoshinori Nakata, Takeshi Okutani, Nobuo Kushibiki, Masashi Murakami
  • Patent number: 6376695
    Abstract: An organosilicon-modified charge transporting compound having a structure represented by the following Formula (I): wherein A represents a charge transporting group, Q represents a hydrolytic group or a hydroxyl group, R2 represents a monovalent hydrocarbon group or a halogen-substituted monovalent hydrocarbon group having 1 to 15 carbon atoms, n is 1 to 18, m is 1 to 3, and 1 is 1 to 5; and a curable composition containing the organosilicon-modified charge transporting compound and a cure type resin chiefly composed of an organosilicon high polymer.
    Type: Grant
    Filed: November 5, 1996
    Date of Patent: April 23, 2002
    Assignees: Dow Corning Asia Ltd., Dow Corning Toray Silicone Co., Ltd., Canon Kabushiki Kaisha
    Inventors: Nobuo Kushibiki, Kikuko Takeuchi, Hideki Kobayashi, Toru Masatomi, Kazuo Yoshinaga, Yuichi Hashimoto, Shunichiro Nishida
  • Publication number: 20010019774
    Abstract: The present invention provides a nanoparticle dispersed structure featuring a polymer having a crosslinked structure that is chemically inert with respect to the nanoparticles and that is effective in suppressing diffusion, and provides a method for manufacturing this nanoparticle dispersion.
    Type: Application
    Filed: March 2, 2001
    Publication date: September 6, 2001
    Inventors: Masaaki Suzuki, Maria Teresa de Los Arcos de Pedro, Yoshinori Nakata, Keiho Imai, Munehiro Yamaguchi, Nobuo Kushibiki, Kikuko Takeuchi
  • Patent number: 6149979
    Abstract: A process for the preparation of a photosensitive body surface coating material comprises hydrolytically condensing an alkoxysilane in a mixed solvent comprising an alcohol and water in the presence of finely divided silica. A polysiloxane resin is produced by heat curing the silane after its hydrolytic condensation. The polysiloxane resin has the formula: R.sup.1 SiO.sub.3/2, and R.sup.1 comprises fluorohydrocarbon groups. The photosensitive body surface coating material is not detrimental to the functionality required of the electrophotographic photosensitive bodies, has superior optical uniformity, has low surface energy, and has superior surface hardness.
    Type: Grant
    Filed: March 18, 1998
    Date of Patent: November 21, 2000
    Inventors: Nobuo Kushibiki, Kikuko Takeuchi, Hideki Kobayashi, Toru Masatomi
  • Patent number: 6045962
    Abstract: A method for forming a low surface energy coating for electrophotographic photosensitive body substrates does not require performing a physical surface reforming treatment such as corona discharge, plasma treatment, and the like. The process comprises: forming on the substrate at least one polysiloxane coating material, (B), that has a water contact angle greater than the water contact angle of the substrate; and thereafter forming an outermost surface coating material, (A), on top of coating material (B). The water contact angle of coating material (B) is smaller than the water contact angle of coating material (A). Coating material (A) comprises finely divided silica and a resin of the formula RSiO.sub.3/2, wherein not less than 1 mol % and not more than 80 mol % of the R groups are fluorohydrocarbon groups of 3 to 12 carbon atoms.
    Type: Grant
    Filed: March 18, 1998
    Date of Patent: April 4, 2000
    Assignee: Dow Corning Asia, Ltd.
    Inventors: Nobuo Kushibiki, Kikuko Takeuchi
  • Patent number: 5910272
    Abstract: A process for the preparation of an electrically conductive coating material for use in electrophotography applications comprises subjecting an epoxy-functional silane to hydrolytic condensation in a mixed solvent of alcohol and water in the presence of silica. The hydrolyzed material is then heat cured to form a resin coating comprising (R.sup.1 SiO).sub.3/2 units, where R.sup.1 comprises epoxy-functional groups. The coating has superior optical homogeneity and electrical conductivity without being detrimental to the functionality required of electrophotographic photosensitive bodies.
    Type: Grant
    Filed: March 18, 1998
    Date of Patent: June 8, 1999
    Assignee: Dow Corning Asia, Ltd.
    Inventors: Nobuo Kushibiki, Kikuko Takeuchi
  • Patent number: 5910386
    Abstract: An electrophotographic photosensitive member is disclosed which has a photosensitive layer and a protection layer. The protection layer contains a particulate colloidal silica and a siloxane resin to have a contact angle of water of not less than 90.degree.. The photosensitive member has a lowered surface energy and excellent mechanical and electrical durability.
    Type: Grant
    Filed: July 9, 1997
    Date of Patent: June 8, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuo Yoshinaga, Shunichiro Nishida, Masataka Kawahara, Keiko Hiraoka, Nobuo Kushibiki, Hideki Kobayashi, Kikuko Takeuchi, Toru Masatomi
  • Patent number: 5905108
    Abstract: An optical silica-containing polysiloxane resin comprises colloidal silica and a polysiloxane resin. The polysiloxane resin has the formula RSiO.sub.3/2, where R is selected from the group consisting of hydrocarbon groups of 1 to 4 carbon atoms and fluorohydrocarbon groups of 3 to 10 carbon atoms. The fluorohydrocarbon groups have the general formula C.sub.n F.sub.(2n+1) C.sub.2 H.sub.4 --, where n is an integer of 1 to 8. The optical silica-containing polysiloxane resin has high light transmissivity and high surface hardness, and can be used for optical elements.
    Type: Grant
    Filed: March 18, 1998
    Date of Patent: May 18, 1999
    Assignee: Dow Corning Asia, Ltd.
    Inventors: Nobuo Kushibiki, Kikuko Takeuchi
  • Patent number: 5840816
    Abstract: The invention provides a method for manufacturing a polysiloxane resin with charge transporting property by uniformly dissolving a charge transporting material to a practical concentration in a polysiloxane resin. The charge transporting material that is dissolved in the polysiloxane resin is an aromatically substituted tertiary amine which has been modified by substitution of one or more of the aromatic groups with a hydrocarbon group containing a silyl group with hydrolyzable substituents.
    Type: Grant
    Filed: November 4, 1996
    Date of Patent: November 24, 1998
    Assignees: Dow Corning Toray Silicone Co., Ltd., Dow Corning Asia, Ltd.
    Inventors: Hideki Kobayashi, Nobuo Kushibiki, Tohru Masatomi, Kikuko Takeuchi
  • Patent number: 5824443
    Abstract: A method of manufacturing solvent-soluble charge transporting materials capable of imparting charge-tranporting properties to polysiloxane resins. These materials have the formula A-?R.sup.1 SiR.sup.2.sub.3-n Q.sub.n !.sub.p where A is a tertiary amine and organic group derived from a compound having charge transporting properties with an ionization potential of 4.5-6.2 eV; R.sup.1 is an alkylene group of 1-18 carbon atoms; R.sup.2 is a monovalent hydrocarbon group or a monovalent halogen-substituted hydrocarbon group of 1-15 carbon atoms; Q is a hydrolyzable group such as--OR.sup.3 where R.sup.3 is an alkyl group of 1-6 carbon atoms; n and p are each 1-3. This silicon-type charge transporting material is characterized by aromatic groups, and alkoxysilyl groups bonded via hydrocarbon groups onto the aromatic rings.
    Type: Grant
    Filed: November 4, 1996
    Date of Patent: October 20, 1998
    Assignee: Dow Corning Asia, Ltd.
    Inventors: Nobuo Kushibiki, Kikuko Takeuchi