Patents by Inventor Nobuo Nishikawa

Nobuo Nishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240167474
    Abstract: A scroll compressor includes a crankshaft, a bearing rotatably supporting the crankshaft, a casing accommodating the crankshaft and the bearing, an arm supporting the bearing, a fixing portion connected to an end of the arm and fixed to the casing, and first and second pins. The first and second pins are press fitted into first and second holes and fixed to the casing by welding. The first hole is formed in the fixing portion and has a first center disposed at a position overlapping a minimum sectional area portion of the arm. The second hole is formed in the fixing portion and has a second center disposed at a position outside the minimum sectional area portion of the arm. A first force with which the first pin is held by the fixing portion is larger than a second force with which the second pin is held by the fixing portion.
    Type: Application
    Filed: January 30, 2024
    Publication date: May 23, 2024
    Inventors: Kenji NAGAHARA, Yoshitomo TSUKA, Nobuo TAKAHASHI, Sayumi NISHIKAWA, Kosuke ARAKI, Tsuyoshi FUKUNAGA
  • Patent number: 4929533
    Abstract: A process is described for producing a presensitized lithographic printing plate by coating onto a surface-roughened aluminum plate a solution having dissolved in a solvent containing at least 10 wt % 1-methoxy-2-propanol a negative-working, light-sensitive composition which contains a light-sensitive diazo resin and a high-molecular weight compound and which is developable with an aqueous alkali developer, and drying the coated solution.
    Type: Grant
    Filed: July 1, 1988
    Date of Patent: May 29, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobuo Nishikawa, Hiroshi Misu
  • Patent number: 4917988
    Abstract: A process for producing a photosensitive lithographic plate comprises coating onto a substrate having a hydrophilic surface a solution of a negative working photosensitive composition containing a photosensitive diazo resin and a linear organic polymer dissolved in a solvent mixture comprising:(a) at least 10 wt. % of 1-methoxy-2-propanol,(b) an amino group-free polar solvent having a boiling point under 1 atm of 50.degree. to 100.degree. C. and a dielectric constant at 20.degree. C. of at least 5.5, and(c) 2 to 50 wt. % of methyl lactate,and drying the coated solution.
    Type: Grant
    Filed: February 17, 1988
    Date of Patent: April 17, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shigeo Koizumi, Nobuo Nishikawa, Nobuyuki Kita