Patents by Inventor Nobuo Ogane

Nobuo Ogane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9416220
    Abstract: A resin composition for optical stereolithography including a cation-polymerizable organic compound (A), a radical polymerizable organic compound (B), a cationic polymerization initiator (C) and a radical polymerization initiator (D), wherein the cationic polymerization initiator (C) is an aromatic sulfonium compound (C-1) represented by the following general formula (C-1): wherein R1, R2, and R3 represent a monovalent organic group, Rf represents a fluoroalkyl group, m is the same number as the cationic charge of the “cation [S+(R1)(R2)(R3)]”, and n is an integer in a range of 0 to 6. The resin composition also includes an aromatic thiol compound (E) represented by the following general formula (E): R4SH)p??(E) wherein, R4 represents a mono- or di-valent aromatic hydrocarbon which may optionally have a substituent, and p is an integer of 1 or 2.
    Type: Grant
    Filed: May 16, 2013
    Date of Patent: August 16, 2016
    Assignee: CMET Inc.
    Inventors: Nobuo Ogane, Yuya Daicho, Eiji Nakamoto, Chiharu Homma
  • Publication number: 20150158971
    Abstract: A resin composition for optical stereolithography including a cation-polymerizable organic compound (A), a radical polymerizable organic compound (B), a cationic polymerization initiator (C) and a radical polymerization initiator (D) which is characterized by including, as a cationic polymerization initiator (C), an aromatic sulfonium compound (C-1) represented by the following general formula (C-1): (in the above general formula (C-1), R1, R2 and R3 represents a monovalent organic group, Rf represents a fluoroalkyl group, m is the same number as the cationic charge of the “cation [S+(R1) (R2) (R3)]”, n is an integer in the range of 0 to 6) as well as an aromatic thiol compound (E) represented by the following general formula (E): R4—(—SH)p ??(E) (wherein, R4 represents a mono- or di-valent aromatic hydrocarbon which may optionally have a substituent, p is an integer of 1 or 2.
    Type: Application
    Filed: May 16, 2013
    Publication date: June 11, 2015
    Inventors: Nobuo Ogane, Yuya Daicho, Eiji Nakamoto, Chiharu Homma
  • Patent number: 5959107
    Abstract: New isoquinoline derivatives and pharmaceutically acceptable acid addition salts represented by the following general formula (I) ##STR1## wherein Ar is an aromatic ring which may be substituted, and n shows 0, 1 or 2, have an inhibitory activity against apoptotic neuronal cell death. These compounds are useful for agents of prevention and treatment of neuronal neurodegenerative disorders such as Alzheimer's disease, Parkinson's disease, Huntington's chorea and amyotrophic lateral sclerosis, cerebral ischemic injury such as stroke, and peripheral neuropathy in diabetes mellitus.
    Type: Grant
    Filed: May 28, 1998
    Date of Patent: September 28, 1999
    Assignee: Snow Brand Milk Products Co., Ltd.
    Inventors: Susumu Ishiguro, Shinichi Shimada, Motohide Seya, Masayuki Okue, Yuzo Yagi, Nobuo Ogane, Yasunari Saitou
  • Patent number: 5563137
    Abstract: Particular hexahydropyrano [3,2-b] [1,4] benzothiazine derivatives represented by the following general formula (I) or pharmaceutically acceptable acid-addition salts thereof. ##STR1## The compounds can facilitate the metabolic turnover of inositol phospholipids at a hippocampus playing an important part in memory, and improve cerebral function leading the memory. The compounds can be utilized as agents for activating brain metabolism and improving cerebral function.
    Type: Grant
    Filed: March 8, 1995
    Date of Patent: October 8, 1996
    Assignee: Snow Brand Milk Products Co., Ltd.
    Inventors: Susumu Ishiguro, Shinichi Shimada, Motohide Seya, Yuzo Yagi, Naomi Kito, Noboru Kawaguchi, Masamichi Nakakoshi, Kunio Tomitsuka, Shin Nomoto, Masayuki Okue, Nobuo Ogane, Yasunari Saito