Patents by Inventor Nobuo Shimo

Nobuo Shimo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5366766
    Abstract: Introducing a raw material organic substance onto a substrate surface, causing polymerization of the raw material organic substance on the substrate surface and causing deposition of the resultant polymer on the substrate surface, previously forming a pattern on the substrate surface with at least two kinds of substances and/or through surface modification, and selectively forming an organic thin film only on this pattern or only on a portion other than the pattern. By this procedure, it is possible to directly deposit and form a thin pattern of an organic thin film, such as a film having a thickness up to 10 .mu.m.
    Type: Grant
    Filed: March 30, 1992
    Date of Patent: November 22, 1994
    Assignee: Research Development Corporation of Japan
    Inventors: Atsushi Sekiguchi, Nobuo Shimo
  • Patent number: 5207878
    Abstract: A finely divided metal-containing compound can be efficiently prepared by irradiating a mixed vapor phase of an organometallic compound in a concentration to exceed a specified lower limit and a reactant gaseous compound with laser beams having an incident energy density to exceed a specified lower limit. When the reactant gaseous compound in the vapor phase is an oxygen-containing compound, e.g., air, the resultant powdery product is an oxide of the metallic element of the organometallic compound. When the reactant gaseous compound in the vapor phase is a halogen-containing compound, e.g., methyl halides, the resultant powdery product is a halide of the metallic element of the organometallic compound.
    Type: Grant
    Filed: July 10, 1991
    Date of Patent: May 4, 1993
    Assignee: Idemitsu Kosan Company Limited
    Inventors: Nobuo Shimo, Masato Fujita
  • Patent number: 5064517
    Abstract: A finely divided metal-containing compound can be efficiently prepared by irradiating a mixed vapor phase of an organometallic compound in a concentration to exceed a specified lower limit and a reactant gaseous compound with laser beams having an incident energy density to exceed a specified lower limit. When the reactant gaseous compound in the vapor phase is an oxygen-containing compound, e.g., air, the resultant powdery product is an oxide of the metallic element of the organometallic compound. When the reactant gaseous compound in the vapor phase is a halogen-containing compound, e.g., methyl halides, the resultant powdery product is a halide of the metallic element of the organometallic compound.
    Type: Grant
    Filed: January 11, 1990
    Date of Patent: November 12, 1991
    Assignee: Idemitsu Kosan Company Limited
    Inventor: Nobuo Shimo
  • Patent number: 4844736
    Abstract: A compound of a metallic element, e.g., tetramethyl lead, trimethyl bismuth, etc. in a vapor phase can be efficiently decomposed in a chain reaction of a very large apparent quantum yield to form extremely finely divided high-purity particles of the metallic element by the irradiation with actinic rays, e.g., laser beams, when the concentration of the metallic compound in the vapor phase is at least 1.times.10.sup.15 molecules per cm.sup.3 and the energy density of the actinic rays is at least 1.times.10.sup.-3 Joule per cm.sup.2.
    Type: Grant
    Filed: October 29, 1987
    Date of Patent: July 4, 1989
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Nobuo Shimo, Keitaro Yoshihara, Nobuaki Nakashima