Abstract: An ultrasonic cleaning method in which ultrasonic cleaning of a contamination attached to a surface of an object to be cleaned is performed by directing toward the object to be cleaned, a cleaning liquid to which ultrasonic waves are applied by alternately focusing first ultrasonic waves having a frequency of 1 to 10 MHz and second ultrasonic waves having a frequency equal to or lower than ½ of that of the first ultrasonic waves. A focus position adjustment device is used to adjust the distance of the focus position relative to the surface of the object to be cleaned, and a moving device is used to movie at least one of the ultrasonic wave generation device and a support base for the object so that the effect of the ultrasonic waves generated by the ultrasonic wave generation device on the surface of the object to be cleaned is uniform.

Abstract: This apparatus for manufacturing semiconductor substrates has support disks and holding units holding semiconductor substrates on the support disks. The holding unit has a stopper which is formed of a conductive material and holds the brim of the semiconductor substrate, a stopper holder which supports the stopper at the outer circumferential portion thereof, a retaining member which retains the stopper to the support disk, and a heating unit which heats the stopper.

Abstract: An ultrasonic cleaning apparatus which performs ultrasonic cleaning of a contamination attached to a surface of an object to be cleaned, by using a cleaning liquid to which ultrasonic waves are applied has a cleaning bath pooling the cleaning liquid, a support base on which the object to be cleaned is supported in the cleaning liquid, ultrasonic wave generation device for alternately focusing first ultrasonic waves having a frequency of 1 to 10 MHz and second ultrasonic waves having a frequency equal to or lower than ½ of that of the first ultrasonic waves toward the object to be cleaned, a focus position adjustment device of adjusting the distance between a focus position for the focus and the surface of the object to be cleaned, and moving device of moving at least any one of the ultrasonic wave generation device and the support base so that the effect on the surface of the object to be cleaned of the ultrasonic waves generated by the ultrasonic wave generation device is uniform.

Abstract: This apparatus for manufacturing semiconductor substrates has support disks and holding units holding semiconductor substrates on the support disks. The holding unit has a stopper which is formed of a conductive material and holds the brim of the semiconductor substrate, a stopper holder which supports the stopper at the outer circumferential portion thereof, a retaining member which retains the stopper to the support disk, and a heating unit which heats the stopper.

Abstract: A remote diagnostic system for semiconductor manufacturing equipment which diagnoses user's semiconductor manufacturing equipment connected to a piece of diagnostic equipment which is provided by a third party through a communication network. The diagnostic equipment having at least one diagnostic program which diagnoses said semiconductor manufacturing equipment and a control section which starts the diagnostic program when accessed by a specific user terminal which has been given an access right, and the terminal sends data which is requested by the diagnostic equipment for diagnosis and receives a result of diagnosis from the diagnostic equipment.

Abstract: A remote diagnosing system for semiconductor manufacturing equipment which diagnoses user's semiconductor manufacturing equipment connected to a piece of diagnostic equipment which is provided by a third party through a communication network. The diagnostic equipment having at least one diagnostic program which diagnoses said semiconductor manufacturing equipment and a control section which starts the diagnostic program when accessed by a specific user terminal given an access right, and the terminal sends data which is requested by the diagnostic equipment for diagnosis and receives a result of diagnosis from the diagnostic equipment.

Abstract: A vacuum heating furnace comprises a translucent container for retaining a heated object and a heating light source for heating a heated object retained in the translucent container. The translucent container has on its surface a tapered portion to receive transmitted light totally reflected on the inner surface of the translucent container at an angle smaller than a critical angle.

Abstract: Providing a dry cleaning method capable of removing deposition films which adhere to the inner walls of a semiconductor manufacturing apparatus-that is, removing dust production sources therefrom. To this end, the dry cleaning process is supplemented by a step of removing either ion sputtered matter or products of the internal member materials of the apparatus or chemical compounds of such apparatus internal member materials and of an etching gas, in addition to a step of removing etching reaction products. It thus becomes possible to eliminate dust generation due to pealing off of deposition films with an increase in the number of wafers being processed, which in turn increases the manufacturing yield and working efficiency of the manufacturing apparatus.

Abstract: A vacuum heating furnace comprises a translucent container for retaining a heated object and a heating light source for heating a heated object retained in the translucent container. The translucent container has on its surface a tapered portion to receive transmitted light totally reflected on the inner surface of the translucent container at an angle smaller than a critical angle.

Abstract: A device for holding an object by electrostatic force includes a body made of a dielectric of a low resistivity, such as SiC, and an electrode provided on that surface of the device body facing away from a holder surface, so that a potential difference is produced between the object and the holder surface. A change-over switch for grounding the device body to an earth potential of an ambient environment is provided, so that the dielectric can be rapidly brought into a potential equal to the earth potential.

Abstract: A lubricant supply source is disposed in the vicinity of a sliding or rotary portion of a machine element, and an electrical power source is intermittently driven by a controller, so as to intermittently supply lubricant from the lubricant supply source to the machine element. When required, a sensor for monitoring the operating state of the machine element, and/or a remote controller is used, so that the supply of lubricant is controlled on the basis of the signal of the sensor and/or by means of the remote controller. Consequently, lubricant can be supplied or supplemented to the machine element in accordance with necessity. Therefore, the machine element will be able to stably operate for a long time, even in relative inaccessible places which people cannot inadvertently access.

Abstract: An apparatus for holding or conveying an article to be held or conveyed by a fluid film having, in a holding surface or a delivery surface, fluid injection portions for supplying fluid at a low flow velocity to form the fluid film between the holding or conveying surface and the article to be held or conveyed.

Abstract: A guiding apparatus having a slider supported in a floating manner above a base by means of hydrostatic bearings, a pressurized fluid supplying means for supplying the hydrostatic bearings with a pressurized fluid, and detecting means for detecting the displacement of the slider with respect to a designated coordinate. The pressure of the pressurized fluid from the pressurized fluid supplying means is adjusted in accordance with a signal which is obtained as a result of the comparison between the value representing the reference position of the slider with respect to the base and the value actually measured by the detecting means, thereby adjusting the sizes of the gaps for forming hydrostatic fluid film for the hydrostatic bearings, thereby to correct the position of the slider to the designated position. With this arrangement, the absolute position of the slider is precisely determined without being affected by disturbance factors such as the precision of assembling of the base and the slider.

Abstract: A vibration-controlling bearing for controlling vibration developing in a rotary shaft supported in a housing of a rotary machine including a bearing member of a cylindrical shape interposed between an outer peripheral surface of the rotary shaft and an inner peripheral surface of the housing and spaced apart therefrom by respective gaps. A dynamic pressure is generated between an inner peripheral surface of the bearing member and the outer peripheral surface of the rotary shaft. Communicating ducts are formed in the bearing member for transmitting a portion of the dynamic pressure generated to a gap between the outer peripheral surface of the bearing member and the inner peripheral surface of the housing.

Abstract: A cryogenic liquefied pump system which includes a pump having a drive motor, bearings, a drive shaft, and an impeller adapted to be disposed in a vessel storing a cryogenic liquid. An outer insulating tank is mounted in the vessel and an inner insulating tank is mounted inside the outer insulating tank, with a vacuum layer being interposed between the inner and outer insulating tanks. An inner side of the inner insulated tank, in which the motor and bearings are arranged, is maintained at a room temperature, with a tip portion of the inner insulating tank being formed into an outer case extending into a cryogenic region outside of the outer insulated tank.

Abstract: A turbomolecular pump including a casing stationary blades arranged in a plurality of stages in the casing axially thereof, rotating blades arranged between the stationary blades and located on an outer periphery of a rotor located in a central portion of the casing, and a bearing device journaling the rotor at its high vacuum and end a low vacuum end. A first permanent magnet of the fixed side having a high Curie point and a second permanent magnet of the rotor side located in juxtaposed relation to the first permanent magnet constitute a magnetic bearing of an attraction type for journaling the rotor at its high vacuum end. A pivot type hydrodynamic bearing or active magnetic bearings journal the rotor at its low vacuum end.