Patents by Inventor Nobusuke Tachibana

Nobusuke Tachibana has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9466475
    Abstract: An ashing device that prevents the ashing rate from changing over time. The ashing device ashes organic material on a substrate including an exposed metal in a processing chamber. The ashing device includes a path, which is formed in the processing chamber and through which active species supplied to the processing chamber pass. The path is defined by a surface on which the metal scattered from the substrate by the active species is collectible, with the surface being formed so as to expose a metal that is of the same kind.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: October 11, 2016
    Assignee: ULVAC, INC.
    Inventors: Masahisa Ueda, Takashi Kurimoto, Kyuzo Nakamura, Koukou Suu, Toshiya Yogo, Kazushige Komatsu, Nobusuke Tachibana
  • Publication number: 20150013715
    Abstract: An ashing device that prevents the ashing rate from changing over time. The ashing device ashes organic material on a substrate including an exposed metal in a processing chamber. The ashing device includes a path, which is formed in the processing chamber and through which active species supplied to the processing chamber pass. The path is defined by a surface on which the metal scattered from the substrate by the active species is collectible, with the surface being formed so as to expose a metal that is of the same kind.
    Type: Application
    Filed: September 26, 2014
    Publication date: January 15, 2015
    Inventors: Masahisa Ueda, Takashi Kurimoto, Kyuzo Nakamura, Koukou Suu, Toshiya Yogo, Kazushige Komatsu, Nobusuke Tachibana
  • Publication number: 20100193131
    Abstract: An ashing device that prevents the ashing rate from changing over time. The ashing device ashes organic material on a substrate including an exposed metal in a processing chamber. The ashing device includes a path, which is formed in the processing chamber and through which active species supplied to the processing chamber pass. The path is defined by a surface on which the metal scattered from the substrate by the active species is collectible, with the surface being formed so as to expose a metal that is of the same kind.
    Type: Application
    Filed: October 29, 2008
    Publication date: August 5, 2010
    Applicant: ULVAC, INC.
    Inventors: Masahisa Ueda, Takashi Kurimoto, Kyuzo Nakamura, Koukou Suu, Toshiya Yogo, Kazushige Komatsu, Nobusuke Tachibana