Abstract: The present invention relates to an X-ray source for emitting a characteristic X-ray and a fluorescent X-ray analyzing apparatus using the X-ray source. A secondary target is arranged in superposition on a primary target. An electron beam generated by an electron gun enters the primary target, which passes and emits a continuous X-ray. The secondary target transmits and emits a characteristic X-ray excited by the continuous X-ray emitted from the primary target. The primary target and the secondary target are superposed one on the other, so that the continuous X-ray emitted from the primary target efficiently excites the secondary target thereby to efficiently generate the characteristic X-ray.

Abstract: A transmission target of a vacuum container is operable to have a ground potential and an electro-optical system is floated at a positive potential in the vacuum container. An electron beam, which is converged by means of the electro-optical system, is decelerated immediately before the electron beam is incident to the transmission target. The electron beam has energy that is several times of the final set value until the electron beam passes through the electro-optical system, and a divergence action exerted by a spatial electric charge effect is reduced. Color aberration of the electro-optical system is proportional to energy of the electron beam. Thus, if the electron beam is decelerated after the electron beam has passed through the electro-optical system, aberration is reduced in proportion to the degree of deceleration, making it possible to concurrently reduce a focus size.

Abstract: A transmission target of a vacuum container is operable to have a ground potential and an electro-optical system is floated at a positive potential in the vacuum container. An electron beam, which is converged by means of the electro-optical system, is decelerated immediately before the electron beam is incident to the transmission target. The electron beam has energy that is several times of the final set value until the electron beam passes through the electro-optical system, and a divergence action exerted by a spatial electric charge effect is reduced. Color aberration of the electro-optical system is proportional to energy of the electron beam. Thus, if the electron beam is decelerated after the electron beam has passed through the electro-optical system, aberration is reduced in proportion to the degree of deceleration, making it possible to concurrently reduce a focus size.

Abstract: The present invention relates to an X-ray source for emitting a characteristic X-ray and a fluorescent X-ray analyzing apparatus using the X-ray source. A secondary target is arranged in superposition on a primary target. An electron beam generated by an electron gun enters the primary target, which passes and emits a continuous X-ray. The secondary target transmits and emits a characteristic X-ray excited by the continuous X-ray emitted from the primary target. The primary target and the secondary target are superposed one on the other, so that the continuous X-ray emitted from the primary target efficiently excites the secondary target thereby to efficiently generate the characteristic X-ray.

Abstract: An underwater laser processing method is carried out by irradiating, through a laser beam irradiation apparatus, a laser beam having a high output, a short pulse and a visible wavelength to a surface of a structure immersed in a water to improve residual stress of a material of the surface of the structure and remove a crack or a CRUD thereof. The laser beam irradiation apparatus comprises a pulse laser device suspended into a water in which a metal material is accommodated from an upper side thereof for irradiating a laser beam having a visible wavelength to a processing position, a beam strength adjusting device for adjusting an output per 1 pulse of a laser beam generated by the pulse laser device and a mechanism for adjusting a spot diameter and a multiplexing ratio of an irradiated beam.

Abstract: The present invention is to clear the difficulty in determining the progress of the decomposition reaction of PCBs carried out by a conventional device for decomposing PCBs, and to provide a system for treating PCBs to render them harmless, capable of continuously determining the progress of the decomposition reaction of PCBs at real time by using a predetermined amount of a reaction solution taken out while the decomposition reaction of the PCBs is proceeding.

Abstract: An underwater laser processing method is carried out by irradiating, through a laser beam irradiation apparatus, a laser beam having a high output, a short pulse and a visible wavelength to a surface of a structure immersed in a water to improve residual stress of a material of the surface of the structure and remove a crack or a CRUD thereof. The laser beam irradiation apparatus comprises a pulse laser device suspended into a water in which a metal material is accommodated from an upper side thereof for irradiating a laser beam having a visible wavelength to a processing position, a beam strength adjusting device for adjusting an output per 1 pulse of a laser beam generated by the pulse laser device and a mechanism for adjusting a spot diameter and a multiplexing ratio of an irradiated beam.

Abstract: A metal vapor laser apparatus has a gas supply device. The device supplies at least two kinds of gases to a container of the laser apparatus controlled individually. One of the gases is selected from the group of the molecular gas such as hydrogen gas, the other is selected from the group of rare gas such as neon gas. By adjusting the mixture ratio of these gases, the laser beam output is obtained efficiently. The molecular gas should be supplied when a metal lump, such as copper, arranged in the container is melting.