Patents by Inventor Nobutaka Numagawa

Nobutaka Numagawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma treatment apparatus and method
    Patent number: 11538664
    Abstract: A substrate is held in a substrate holder and accommodated in a treatment chamber. A positive electrode panel is arranged opposite to a surface of the substrate. Process gas is sent from a blower panel, toward the positive electrode panel and the substrate. A positive electrode of a high-frequency power source is connected to the positive electrode panel, and a negative electrode of the high-frequency power source is connected to the blower panel, to apply a high-frequency voltage. The process gas passes between the positive electrode panel and the blower panel which is the negative electrode, so that plasma is generated. The generated plasma removes contaminants on the surface of the substrate.
    Type: Grant
    Filed: November 28, 2018
    Date of Patent: December 27, 2022
    Assignee: JCU CORPORATION
    Inventors: Keisuke Asano, Kenichi Yamada, Tomohiro Kawasaki, Nobutaka Numagawa
  • PLASMA TREATMENT APPARATUS AND METHOD
    Publication number: 20190096637
    Abstract: A substrate is held in a substrate holder and accommodated in a treatment chamber. A positive electrode panel is arranged opposite to a surface of the substrate. Process gas is sent from a blower panel, toward the positive electrode panel and the substrate. A positive electrode of a high-frequency power source is connected to the positive electrode panel, and a negative electrode of the high-frequency power source is connected to the blower panel, to apply a high-frequency voltage. The process gas passes between the positive electrode panel and the blower panel which is the negative electrode, so that plasma is generated. The generated plasma removes contaminants on the surface of the substrate.
    Type: Application
    Filed: November 28, 2018
    Publication date: March 28, 2019
    Inventors: Keisuke Asano, Kenichi Yamada, Tomohiro Kawasaki, Nobutaka Numagawa