Abstract: In a plasma processing apparatus, a table has a wafer support to hold a wafer and a peripheral segment surrounding the wafer support and having through-holes. The peripheral segment has an upper surface lower than that of the wafer support. An outer focus ring is disposed over the peripheral segment and has a recess or a cutout at an inner portion of the outer focus ring, and the recess or cutout has through-holes. An inner focus ring is disposed in the recess or cutout of the outer focus ring. Lift pins respectively extend through the through-holes of the peripheral segment and the through-holes of the recess or cutout of the outer focus ring. Shift mechanisms control shift of the respective lift pins.

Abstract: A steam iron set including a water pump mountable on a steam iron in exchange for a detachable reservoir for containing steam generating water. The water pump forces out water toward the soleplate of the iron to pass the water through a steam generating chamber and a steam channel formed in the soleplate and discharge the water from steam vents formed in the ironing surface. Fur particles or like evaporation deposit, lint, etc. can be removed from the interior of the soleplate by the flow of water to eliminate the likelihood that the flow of the steam will be impeded during ironing.