Patents by Inventor Nobutake Hirai

Nobutake Hirai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9452236
    Abstract: Disclosed herein is a plasma generating apparatus capable of sufficiently performing a deodorization function and a sterilization function by increasing a generation amount of ions or radicals while suppressing generation of ozone. The plasma generating apparatus has a pair of electrodes (21 and 22) provided with dielectric films (21a and 22a) and serves to apply a predetermined voltage between the electrodes (21 and 22) to discharge plasma, fluid circulation holes (21b and 22b) are respectively provided at corresponding positions of the respective electrodes (21 and 22) and pass through the electrodes, and plasma is generated only in opening end portions (21x and 22x) forming the fluid circulation holes (21b and 22b) between the pair of electrodes (21 and 22).
    Type: Grant
    Filed: December 7, 2012
    Date of Patent: September 27, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Makoto Miyamoto, Kazutoshi Takenoshita, Yukika Yamada, Yoshitaka Terao, Nobutake Hirai
  • Publication number: 20150125356
    Abstract: Disclosed herein is a plasma generating apparatus capable of sufficiently performing a deodorization function and a sterilization function by increasing a generation amount of ions or radicals while suppressing generation of ozone. The plasma generating apparatus has a pair of electrodes (21 and 22) provided with dielectric films (21a and 22a) and serves to apply a predetermined voltage between the electrodes (21 and 22) to discharge plasma, fluid circulation holes (21b and 22b) are respectively provided at corresponding positions of the respective electrodes (21 and 22) and pass through the electrodes, and plasma is generated only in opening end portions (21x and 22x) forming the fluid circulation holes (21b and 22b) between the pair of electrodes (21 and 22).
    Type: Application
    Filed: December 7, 2012
    Publication date: May 7, 2015
    Inventors: Makoto Miyamoto, Kazutoshi Takenoshita, Yukika Yamada, Yoshitaka Terao, Nobutake Hirai
  • Publication number: 20140306597
    Abstract: Disclosed herein is a plasma generating apparatus having excellent sterilization performance and deodorization performance together with high safety. The plasma generating apparatus includes a pair of electrodes formed with a dielectric film on at least one side of facing surfaces thereof, and serves to apply a predetermined voltage between the electrodes to discharge plasma, wherein the dielectric film has a relative dielectric constant of 20 to 200.
    Type: Application
    Filed: November 22, 2012
    Publication date: October 16, 2014
    Inventors: Yukika Yamada, Makoto Miyamoto, Kazutoshi Takenoshita, Yoshitaka Terao, Nobutake Hirai
  • Patent number: 6432857
    Abstract: The present invention provides a dielectric ceramic composition, a capacitor using the composition and the producing method, of having a lower dielectric loss and a stable characteristics in high frequency bandwidth, and enabling to use a base metal or a carbon-based material as an electrode material by allowing sintering at a low temperature, thereby resulting in lower cost. The dielectric ceramic composition according to present invention, is characterized in comprising a main component of formula SrxMg1-x(XryTi1-y) O3 (where 0.8≦x≦1; 0.9≦y≦1) to which MnO2 of 0.05-15 wt %, at least one of 0.001-5 wt % selected from the group consisting of Bi2O3, PbO and Sb2O3 and a glass component of 0.5-15 wt % are added based on the weight of the main component.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: August 13, 2002
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Jong Hee Kim, Shigehiro Fujino, Nobutake Hirai
  • Patent number: 6429163
    Abstract: The present invention provides a dielectric ceramic composition, a capacitor using the composition and the producing method, of having a lower dielectric loss and a stable characteristics in high frequency bandwidth, and enabling to use a base metal or a carbon-based material as an electrode material by allowing sintering at a low temperate, thereby resulting in lower cost. The dielectric ceramic composition according to present invention, is characterized in comprising a main component of formula SrxBa1−x(ZryTi1−y) O3 (where 0.8≦x≦1; 0.9≦y≦1) to which MnO2 of 0.05-15 wt %, at least one of 0.001-5 wt % selected from the group consisting of Bi2O3PbO and Sb2O3 and a glass component of 0.5-15 wt % are added based on the weight of the main component.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: August 6, 2002
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Jong Hee Kim, Shigehiro Fujino, Nobutake Hirai
  • Patent number: 6387835
    Abstract: The dielectric ceramic composition according to present invention, is characterized in comprising a component of formula SrxCa1−x(ZryTi1−y)03 (where 0.7≦x≦1; 0.9≦y≦1) to which MnO2 of 0.05-20 wt %, at least one of 0.001-5 wt % selected from tie group consisting of Bi2O3, PbO and Sb2O3 and a glass component of 0.5-10 wt % are added based on the weight of the main component.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: May 14, 2002
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Jong Hee Kim, Shigehiro Fujino, Nobutake Hirai
  • Publication number: 20020016246
    Abstract: The present invention provides a dielectric ceramic composition, a capacitor using the composition and the producing method, of having a lower dielectric loss and a stable characteristics in high frequency bandwidth, and enabling to use a base metal or a carbon-based material as an electrode material by allowing sintering at a low temperate, thereby resulting in lower cost.
    Type: Application
    Filed: March 30, 2001
    Publication date: February 7, 2002
    Inventors: Jong Hee Kim, Shigehiro Fujino, Nobutake Hirai
  • Publication number: 20020002108
    Abstract: The present invention provides a dielectric ceramic composition, a capacitor using the composition and the producing method, of having a lower dielectric loss and a stable characteristics in high frequency bandwidth, and enabling to use a base metal or a carbon-based material as an electrode material by allowing sintering at a low temperature, thereby resulting in lower cost.
    Type: Application
    Filed: March 30, 2001
    Publication date: January 3, 2002
    Inventors: Jong Hee Kim, Shigehiro Fujino, Nobutake Hirai
  • Publication number: 20010056028
    Abstract: The present invention provides a dielectric ceramic composition, a capacitor using the composition and the producing method, of having a lower dielectric loss and a stable characteristics in high frequency bandwidth, and enabling to use a base metal or a carbon-based material as an electrode material by allowing sintering at a low temperature, thereby resulting in lower cost.
    Type: Application
    Filed: March 30, 2001
    Publication date: December 27, 2001
    Inventors: Jong Hee Kim, Shigehiro Fujino, Nobutake Hirai