Abstract: Automatic photomask or reticle washing and cleaning system comprises a foreign particle inspecting unit for inspecting whether or not foreign particles are attached to the surfaces of substrates; a washing and cleaning unit for washing and cleaning the surfaces of substrates with a cleaning liquid, thereby removing foreign particles and transfer means for withdrawing a substrate from a case, transferring the withdrawn substrate to the washing and cleaning unit, thereafter transferring the washed and cleaned substrate to the foreign particle inspecting unit and finally inserting the inspected substrate into the case again.

Abstract: An apparatus for detecting foreign matter present on a planar substrate comprises apparatus for scanning the surface of the substrate with an oblique incident light beam, apparatus for photo-electrically detecting the scattered light generator in the trajectory of the light beam scanning on the substrate, and apparatus for eliminating stray light unnecessary for the foreign matter detection.

Abstract: A container for a piece of substrate such as reticle, mask or wafer is disclosed. The container comprises a housing body having an opening for receiving a substrate, a door for closing and opening said opening of the housing body and means for fixing the received substrate to the container. Said fixing means includes a contact member movable to fix the substrate in the position and a member for moving the contact member in link with the motion of the door.