Patents by Inventor Nobutoshi Ebashi

Nobutoshi Ebashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for ashing a photoresist resin film on a semiconductor wafer and an asher
    Patent number: 5677113
    Abstract: The object of the invention is to provide an ashing method and an asher in order to avoid damage to semiconductor components occurring during ashing of a photoresist resin film by active oxygen plasma and to avoid a long treatment time occurring in an ashing method using a low pressure mercury discharge lamp. According to the invention, this object is achieved by a method and an apparatus for ashing a photoresist resin film. In the method, a wafer provided with a photoresist resin film is placed in an ozone-containing atmosphere. An activated oxygen is produced through the radiation light of a discharge lamp, which emits a continuous spectrum in a wavelength range of 200 to 300 nm. The photoresist resin film is ashed by the activated oxygen.
    Type: Grant
    Filed: May 8, 1995
    Date of Patent: October 14, 1997
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventors: Shinji Suzuki, Kyohei Seki, Nobutoshi Ebashi, Tetsuji Arai