Patents by Inventor Nobuyoshi Koshida

Nobuyoshi Koshida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8653519
    Abstract: The electronic device includes a substrate, a first electrode formed over a surface of the substrate, a second electrode located on an opposite side of the first electrode from the substrate so as to face the first electrode, and a functional layer interposed between the first electrode and second electrode and formed by means of anodizing a first polycrystalline semiconductor layer in an electrolysis solution so as to contain a plurality of semiconductor nanocrystals. The electronic device further includes a second polycrystalline semiconductor layer interposed between the first electrode and the functional layer so as to be in close contact with the functional layer. The second polycrystalline semiconductor layer has an anodic oxidization rate in the electrolysis solution lower than that of the first polycrystalline semiconductor layer so as to function as a stop layer for exclusively anodizing the first polycrystalline semiconductor layer.
    Type: Grant
    Filed: March 31, 2011
    Date of Patent: February 18, 2014
    Assignee: Panasonic Corporation
    Inventors: Tsutomu Ichihara, Kenji Tsubaki, Masao Kubo, Nobuyoshi Koshida
  • Publication number: 20130032801
    Abstract: The electronic device includes a substrate, a first electrode formed over a surface of the substrate, a second electrode located on an opposite side of the first electrode from the substrate so as to face the first electrode, and a functional layer interposed between the first electrode and second electrode and formed by means of anodizing a first polycrystalline semiconductor layer in an electrolysis solution so as to contain a plurality of semiconductor nanocrystals. The electronic device further includes a second polycrystalline semiconductor layer interposed between the first electrode and the functional layer so as to be in close contact with the functional layer. The second polycrystalline semiconductor layer has an anodic oxidization rate in the electrolysis solution lower than that of the first polycrystalline semiconductor layer so as to function as a stop layer for exclusively anodizing the first polycrystalline semiconductor layer.
    Type: Application
    Filed: March 31, 2011
    Publication date: February 7, 2013
    Applicant: PANASONIC CORPORATION
    Inventors: Tsutomu Ichihara, Kenji Tsubaki, Masao Kubo, Nobuyoshi Koshida
  • Patent number: 8130593
    Abstract: A pressure wave generator (1) includes a thermally conductive substrate (2), a heat insulating layer (3) formed on one main surface of the substrate (2), an insulator layer (5) formed on the heat insulating layer (3), and a heat generator (4) formed on the insulator layer (5) to generate heat when a current containing an alternating component is applied thereto. The heat insulating layer (3) is formed containing at least one of silicon nitride (Si3N4), silicon dioxide (SiO2), aluminum oxide (Al2O3), magnesium oxide (MgO), diamond crystalline carbon (C), aluminum nitride (AlN), and silicon carbide (SiC). The heat generator (4) is formed containing, for example, gold (Au) or tungsten (W).
    Type: Grant
    Filed: December 17, 2007
    Date of Patent: March 6, 2012
    Assignees: Tokyo Electron Limited, National University Corporation, Tokyo University of Agriculture and Technology
    Inventors: Masato Hayashi, Masami Yakabe, Nobuyoshi Koshida
  • Publication number: 20110204290
    Abstract: Provided is a silicon-based blue phosphorescent material having a longer luminescence lifetime, a high luminescence intensity, and excellent long-term stability and reproducibility. A method for producing a silicon-based blue-green phosphorescent material controllable by an excitation wavelength, which comprises a first step of anodizing the surface of silicon to prepare a nanocrystal silicon or a nanostructure silicon, a second step of processing the nanocrystal silicon or the nanostructure silicon prepared in the first step for rapid thermal oxidation, and a third step of processing the nanocrystal silicon or nanostructure silicon having been processed for rapid thermal oxidation in the second step, for high-pressure water vapor annealing.
    Type: Application
    Filed: August 26, 2009
    Publication date: August 25, 2011
    Inventors: Nobuyoshi Koshida, Bernard Gelloz
  • Publication number: 20100193362
    Abstract: In a state where a silicon base material (1) is used as an anode, a fine platinum member (2) is used as a cathode, and an electrolyte solution (4) is arranged between the anode and the cathode, anodic oxidation is performed in constant current mode under the conditions where porous formation mode and electrolytic polishing mode coexist. The platinum member (2) is fitted in the silicon base material (1) with silicon elution, and processes such as hole making, cutting, single-side pressing are performed. Since the silicon base material can be processed at a room temperature with small energy, the crystal quality of the processing surface is not deteriorated. Thus, efficient and highly accurate processing can be performed without using a mechanical method, which consumes much material in conventional processes such as cutting of solar cell silicon base material, and without using laser whose energy unit cost is high, and furthermore, without leaving a crystal damage on a processed surface.
    Type: Application
    Filed: May 9, 2008
    Publication date: August 5, 2010
    Inventors: Terunori Warabisako, Toshikazu Shimada, Nobuyoshi Koshida, Bernard Gelloz, Keiichi Kanehori
  • Publication number: 20100025145
    Abstract: A pressure wave generator (1) includes a thermally conductive substrate (2), a heat insulating layer (3) formed on one main surface of the substrate (2), an insulator layer (5) formed on the heat insulating layer (3), and a heat generator (4) formed on the insulator layer (5) to generate heat when a current containing an alternating component is applied thereto. The heat insulating layer (3) is formed containing at least one of silicon nitride (Si3N4), silicon dioxide (SiO2), aluminum oxide (Al2O3), magnesium oxide (MgO), diamond crystalline carbon (C), aluminum nitride (AlN), and silicon carbide (SiC). The heat generator (4) is formed containing, for example, gold (Au) or tungsten (W).
    Type: Application
    Filed: December 17, 2007
    Publication date: February 4, 2010
    Applicants: TOKYO ELECTRON LIMITED, NATIONAL UNIVERSITY CORPORATION, TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY
    Inventors: Masato Hayashi, Masami Yakabe, Nobuyoshi Koshida
  • Patent number: 7515851
    Abstract: Provided are an electron emitter continuously emitting electrons stably even in the atmosphere, a charger using the electron emitter, and a charging method using the charger. The electron emitter includes a electron emitting element consisting of a first electrode, a second electrode, and a semiconductor layer formed therebetween, and a power supply for alternately applying a positive voltage enabling electron emission and a negative voltage having a polarity opposite to the positive voltage. At least a part of the surface on the first electrode side of the semiconductor layer is formed of a porous semiconductor layer. Electrons captured in the porous semiconductor layer in the course of electron emission with application of a positive voltage disturb electron emission from the electron emitting element. Such electrons, however, are removed by application of a negative voltage.
    Type: Grant
    Filed: April 28, 2004
    Date of Patent: April 7, 2009
    Assignees: Sharp Kabushiki Kaisha, Nobuyoshi Koshida
    Inventors: Hiroyuki Hirakawa, Tadashi Iwamatsu, Nobuyoshi Koshida
  • Publication number: 20090078928
    Abstract: A light-emitting device has a structure in which a semiconductor or a conductive substrate having a bottom electrode, a layer for generating hot electrons, quasi-ballistic electrons or ballistic electrons, a luminous layer, and a semitransparent surface electrode are deposited, or a structure in which a holes supply layer is provided between the luminous layer and the semitransparent surface electrode having the same structure. The light-emitting device realizes highly efficient light emission in a range from infrared rays to ultraviolet ray with smaller driving current than that of conventional injection-type or intrinsic EL devices.
    Type: Application
    Filed: July 27, 2004
    Publication date: March 26, 2009
    Inventors: Nobuyoshi Koshida, Akira Kojima
  • Publication number: 20090027758
    Abstract: A reversible coloring and deccoloring solid-state device includes a solid-state electrolyte film and a coloring and decoloring film which colors or decolors the coloring and decoloring film reversibly by applying an electric field. A barrier thin film is inserted between the solid-state electrolyte film and the coloring and decoloring film. The barrier thin film comprises at least one layer which is formed by a material having a band gap energy, functions as a barrier for the carrier movement, and has a thickness of 7 nm to 7±2 nm which does not prevent ion conduction. The coloring and decoloring speed is 0.1 seconds to 0.3 seconds by a voltage driving.
    Type: Application
    Filed: March 20, 2006
    Publication date: January 29, 2009
    Applicant: NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY
    Inventors: Nobuyoshi Koshida, Hideo Yoshimura
  • Patent number: 7307379
    Abstract: An electron emitting element is of a structure in which a semiconductor layer is formed between an upper electrode and a lower electrode, wherein an organic compound adsorption layer is formed on a semiconductor surface of the semiconductor layer by causing the organic compound to be adsorbed on the semiconductor surface. Herein, the semiconductor layer can be made of silicon or polysilicon and partly or as a whole porous. The absorbed organic compound can be a non-cyclic hydrocarbon, a compound obtained by coupling at least an aldehyde group to a non-cyclic hydrocarbon, or a non-cyclic hydrocarbon having an unsaturated bond. As a result, there can be provided an electron emitting element capable of stably operating in the atmosphere or in a low vacuum even when being operated in the atmosphere or in the low vacuum and an imaging device using the electron emitting element.
    Type: Grant
    Filed: April 13, 2004
    Date of Patent: December 11, 2007
    Assignees: Sharp Kabushiki Kaisha
    Inventors: Tadashi Iwamatsu, Hiroyuki Hirakawa, Nobuyoshi Koshida
  • Patent number: 7306990
    Abstract: An information memory device capable of reading and writing of information by mechanical operation of a floating gate layer, in which a gate insulation film has a cavity (6), and a floating gate layer (5) having two stable deflection states in the cavity (6), the state stabilized by deflecting toward the channel side of transistor, and the state stabilized by deflecting toward the gate (7) side, writing and reading of information can be made by changing the stable deflection state of the floating gate layer (5) by Coulomb interactive force between the electrons (or positive holes 8) accumulated in the floating gate layer (5) and external electric field, and by reading the channel current change based on the state of the floating gate layer (5).
    Type: Grant
    Filed: November 28, 2003
    Date of Patent: December 11, 2007
    Assignee: Japan Science & Technology Agency
    Inventors: Shinya Yamaguchi, Masahiko Ando, Toshikazu Shimada, Natsuki Yokoyama, Shunri Oda, Nobuyoshi Koshida
  • Publication number: 20060291905
    Abstract: Provided are an electron emitter continuously emitting electrons stably even in the atmosphere, a charger using the electron emitter, and a charging method using the charger. The electron emitter includes a electron emitting element consisting of a first electrode, a second electrode, and a semiconductor layer formed therebetween, and a power supply for alternately applying a positive voltage enabling electron emission and a negative voltage having a polarity opposite to the positive voltage. At least a part of the surface on the first electrode side of the semiconductor layer is formed of a porous semiconductor layer. Electrons captured in the porous semiconductor layer in the course of electron emission with application of a positive voltage disturb electron emission from the electron emitting element. Such electrons, however, are removed by application of a negative voltage.
    Type: Application
    Filed: April 28, 2004
    Publication date: December 28, 2006
    Inventors: Hiroyuki Hirakawa, Tadashi Iwamatsu, Nobuyoshi Koshida
  • Patent number: 7119361
    Abstract: A porous silicon structure is stabilized by anodically oxidizing the structure and then subjecting it to chemical functionalization to protect non-oxidized surface regions, preferably in the presence of 1-decene under thermal conditions. This process creates a protective organic monolayer on the surface of the structure, rendering it highly stable.
    Type: Grant
    Filed: October 25, 2004
    Date of Patent: October 10, 2006
    Assignee: National Research Council
    Inventors: David John Lockwood, Rabah Boukherroub, Danial D. M. Wayner, Nobuyoshi Koshida
  • Publication number: 20060186786
    Abstract: An electron emitting element is of a structure in which a semiconductor layer is formed between an upper electrode and a lower electrode, wherein an organic compound adsorption layer is formed on a semiconductor surface of the semiconductor layer by causing the organic compound to be adsorbed on the semiconductor surface. Herein, the semiconductor layer can be made of silicon or polysilicon and partly or as a whole porous. The absorbed organic compound can be a non-cyclic hydrocarbon, a compound obtained by coupling at least an aldehyde group to a non-cyclic hydrocarbon, or a non-cyclic hydrocarbon having an unsaturated bond. As a result, there can be provided an electron emitting element capable of stably operating in the atmosphere or in a low vacuum even when being operated in the atmosphere or in the low vacuum and an imaging device using the electron emitting element.
    Type: Application
    Filed: April 13, 2004
    Publication date: August 24, 2006
    Inventors: Tadashi Iwamatsu, Hiroyuki Hirakawa, Nobuyoshi Koshida
  • Patent number: 7091138
    Abstract: A forming method and a forming apparatus of nanocrystalline silicon structure makes it possible to prepare a nanocrystalline silicon structure at a low temperature to have densely packed silicon crystal grains which are stably terminated and to effectively control the grain size in nanometer scale. A forming method and a forming apparatus of nanocrystalline silicon structure with oxide or nitride termination, carry out a first step of treating a surface of a substrate with hydrogen radical; a second step of depositing silicon crystals having a grain size of 10 nm or less by the thermal reaction of a silicon-containing gas; and a third step of terminating the surface of the silicon crystal with oxygen or nitrogen by using one of oxygen gas, oxygen radical and nitrogen radical.
    Type: Grant
    Filed: August 27, 2004
    Date of Patent: August 15, 2006
    Assignees: Anelva Corporation
    Inventors: Yoichiro Numasawa, Nobuyoshi Koshida
  • Patent number: 7053422
    Abstract: The present invention provides a solid state light-emissive display apparatus of high brightness and efficiency, high reliability, and of thin type, and method of manufacturing the same at low cost. Said apparatus has the luminous thin film made up by laminating or mixing crystal fine particle coated with insulator (5) of nm size and fluorescent fine particles (7) of nm size, and the lower electrode and the transparent upper electrode sandwiching said luminous thin film, wherein the electrons injected from said lower electrode are accelerated in the crystal fine particle coated with insulator layer (6) not being scattered by phonons to become high energy ballistic electrons, and form excitons (13) by colliding excitation of fluorescent fine particles. Since said fluorescent fine particles are of nm size, the exciton concentration is high, and luminescence intensity by extinction of excitons is also high.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: May 30, 2006
    Assignee: Japan Science and Technology Agency
    Inventors: Masahiko Ando, Toshikazu Shimada, Masatoshi Shiiki, Shunri Oda, Nobuyoshi Koshida
  • Publication number: 20060051920
    Abstract: An information memory device capable of reading and writing of information by mechanical operation of a floating gate layer, in which a gate insulation film has a cavity (6), and a floating gate layer (5) having two stable deflection states in the cavity (6), the state stabilized by deflecting toward the channel side of transistor, and the state stabilized by deflecting toward the gate (7) side, writing and reading of information can be made by changing the stable deflection state of the floating gate layer (5) by Coulomb interactive force between the electrons (or positive holes 8) accumulated in the floating gate layer (5) and external electric field, and by reading the channel current change based on the state of the floating gate layer (5).
    Type: Application
    Filed: November 28, 2003
    Publication date: March 9, 2006
    Inventors: Shinya Yamaguchi, Masahiko Ando, Toshikazu Shimada, Natsuki Yokoyama, Shunri Oda, Nobuyoshi Koshida
  • Publication number: 20050201575
    Abstract: A thermally induced sound wave generating device comprising a thermally conductive substrate, a head insulation layer formed on one surface of the substrate, and a heating element thin film formed on the heat insulation layer and in the form of an electrically driven metal film, and wherein when the heat conductivity of the thermally conductive substrate is set as ?s and its heat capacity is set as Cs, and the thermal conductivity of the beat insulation layer is set as ?I and its heat capacity is set as CI, relation of 1/100??ICI/?SCS and ?SCS?100×106 is realized. This is a new technical means capable of greatly improving the function of a pressure generating device based on thermal induction.
    Type: Application
    Filed: February 27, 2004
    Publication date: September 15, 2005
    Inventors: Nobuyoshi Koshida, Kenji Tsubaki
  • Patent number: 6939728
    Abstract: A high emission electron emitter and a method of fabricating a high emission electron emitter are disclosed. A high emission electron emitter includes an electron injection layer, an active layer of high porosity porous silicon material in contact with the electron injection layer, a contact layer of low porosity porous silicon material in contact with the active layer and including an interface surface with a heavily doped region, and an optional top electrode in contact with the contact layer. The contact layer reduces contact resistance between the active layer and the top electrode and the heavily doped region reduces resistivity of the contact layer thereby increasing electron emission efficiency and stable electron emission from the top electrode. The electron injection layer is made from an electrically conductive material such as n+ semiconductor, n+ single crystal silicon, a metal, a silicide, or a nitride.
    Type: Grant
    Filed: May 15, 2003
    Date of Patent: September 6, 2005
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Xia Sheng, Nobuyoshi Koshida, Huei-Pei Kuo
  • Patent number: 6940087
    Abstract: Disclosed is an electron source 10 including an electron source element 10a formed on the side of one surface of an insulative substrate 1. The electron source element 10a includes a lower electrode 2, a composite nanocrystal layer 6 and a surface electrode 7. The composite nanocrystal layer 6 includes a plurality of polycrystalline silicon grains 51, a thin silicon oxide film 52 formed over the surface of each of the grains 51, a number of nanocrystalline silicons 63 residing between the adjacent grains 51, and a silicon oxide film 64 formed over the surface of each of the nanocrystalline silicons 63. The silicon oxide film 64 is an insulating film having a thickness less than the crystal grain size of the nanocrystalline silicon 63. The surface electrode 7 is formed of a carbon thin film 7a laminated on the composite nanocrystal layer 6 while being in contact therewith, and a metal thin film 7b laminated on the carbon thin film 7a.
    Type: Grant
    Filed: March 7, 2003
    Date of Patent: September 6, 2005
    Assignees: Matsushita Electric Works, Ltd.
    Inventors: Takuya Komoda, Nobuyoshi Koshida, Tsutomu Ichihara