Patents by Inventor Nobuyoshi Koshida
Nobuyoshi Koshida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8653519Abstract: The electronic device includes a substrate, a first electrode formed over a surface of the substrate, a second electrode located on an opposite side of the first electrode from the substrate so as to face the first electrode, and a functional layer interposed between the first electrode and second electrode and formed by means of anodizing a first polycrystalline semiconductor layer in an electrolysis solution so as to contain a plurality of semiconductor nanocrystals. The electronic device further includes a second polycrystalline semiconductor layer interposed between the first electrode and the functional layer so as to be in close contact with the functional layer. The second polycrystalline semiconductor layer has an anodic oxidization rate in the electrolysis solution lower than that of the first polycrystalline semiconductor layer so as to function as a stop layer for exclusively anodizing the first polycrystalline semiconductor layer.Type: GrantFiled: March 31, 2011Date of Patent: February 18, 2014Assignee: Panasonic CorporationInventors: Tsutomu Ichihara, Kenji Tsubaki, Masao Kubo, Nobuyoshi Koshida
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Publication number: 20130032801Abstract: The electronic device includes a substrate, a first electrode formed over a surface of the substrate, a second electrode located on an opposite side of the first electrode from the substrate so as to face the first electrode, and a functional layer interposed between the first electrode and second electrode and formed by means of anodizing a first polycrystalline semiconductor layer in an electrolysis solution so as to contain a plurality of semiconductor nanocrystals. The electronic device further includes a second polycrystalline semiconductor layer interposed between the first electrode and the functional layer so as to be in close contact with the functional layer. The second polycrystalline semiconductor layer has an anodic oxidization rate in the electrolysis solution lower than that of the first polycrystalline semiconductor layer so as to function as a stop layer for exclusively anodizing the first polycrystalline semiconductor layer.Type: ApplicationFiled: March 31, 2011Publication date: February 7, 2013Applicant: PANASONIC CORPORATIONInventors: Tsutomu Ichihara, Kenji Tsubaki, Masao Kubo, Nobuyoshi Koshida
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Patent number: 8130593Abstract: A pressure wave generator (1) includes a thermally conductive substrate (2), a heat insulating layer (3) formed on one main surface of the substrate (2), an insulator layer (5) formed on the heat insulating layer (3), and a heat generator (4) formed on the insulator layer (5) to generate heat when a current containing an alternating component is applied thereto. The heat insulating layer (3) is formed containing at least one of silicon nitride (Si3N4), silicon dioxide (SiO2), aluminum oxide (Al2O3), magnesium oxide (MgO), diamond crystalline carbon (C), aluminum nitride (AlN), and silicon carbide (SiC). The heat generator (4) is formed containing, for example, gold (Au) or tungsten (W).Type: GrantFiled: December 17, 2007Date of Patent: March 6, 2012Assignees: Tokyo Electron Limited, National University Corporation, Tokyo University of Agriculture and TechnologyInventors: Masato Hayashi, Masami Yakabe, Nobuyoshi Koshida
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Publication number: 20110204290Abstract: Provided is a silicon-based blue phosphorescent material having a longer luminescence lifetime, a high luminescence intensity, and excellent long-term stability and reproducibility. A method for producing a silicon-based blue-green phosphorescent material controllable by an excitation wavelength, which comprises a first step of anodizing the surface of silicon to prepare a nanocrystal silicon or a nanostructure silicon, a second step of processing the nanocrystal silicon or the nanostructure silicon prepared in the first step for rapid thermal oxidation, and a third step of processing the nanocrystal silicon or nanostructure silicon having been processed for rapid thermal oxidation in the second step, for high-pressure water vapor annealing.Type: ApplicationFiled: August 26, 2009Publication date: August 25, 2011Inventors: Nobuyoshi Koshida, Bernard Gelloz
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Publication number: 20100193362Abstract: In a state where a silicon base material (1) is used as an anode, a fine platinum member (2) is used as a cathode, and an electrolyte solution (4) is arranged between the anode and the cathode, anodic oxidation is performed in constant current mode under the conditions where porous formation mode and electrolytic polishing mode coexist. The platinum member (2) is fitted in the silicon base material (1) with silicon elution, and processes such as hole making, cutting, single-side pressing are performed. Since the silicon base material can be processed at a room temperature with small energy, the crystal quality of the processing surface is not deteriorated. Thus, efficient and highly accurate processing can be performed without using a mechanical method, which consumes much material in conventional processes such as cutting of solar cell silicon base material, and without using laser whose energy unit cost is high, and furthermore, without leaving a crystal damage on a processed surface.Type: ApplicationFiled: May 9, 2008Publication date: August 5, 2010Inventors: Terunori Warabisako, Toshikazu Shimada, Nobuyoshi Koshida, Bernard Gelloz, Keiichi Kanehori
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Publication number: 20100025145Abstract: A pressure wave generator (1) includes a thermally conductive substrate (2), a heat insulating layer (3) formed on one main surface of the substrate (2), an insulator layer (5) formed on the heat insulating layer (3), and a heat generator (4) formed on the insulator layer (5) to generate heat when a current containing an alternating component is applied thereto. The heat insulating layer (3) is formed containing at least one of silicon nitride (Si3N4), silicon dioxide (SiO2), aluminum oxide (Al2O3), magnesium oxide (MgO), diamond crystalline carbon (C), aluminum nitride (AlN), and silicon carbide (SiC). The heat generator (4) is formed containing, for example, gold (Au) or tungsten (W).Type: ApplicationFiled: December 17, 2007Publication date: February 4, 2010Applicants: TOKYO ELECTRON LIMITED, NATIONAL UNIVERSITY CORPORATION, TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGYInventors: Masato Hayashi, Masami Yakabe, Nobuyoshi Koshida
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Patent number: 7515851Abstract: Provided are an electron emitter continuously emitting electrons stably even in the atmosphere, a charger using the electron emitter, and a charging method using the charger. The electron emitter includes a electron emitting element consisting of a first electrode, a second electrode, and a semiconductor layer formed therebetween, and a power supply for alternately applying a positive voltage enabling electron emission and a negative voltage having a polarity opposite to the positive voltage. At least a part of the surface on the first electrode side of the semiconductor layer is formed of a porous semiconductor layer. Electrons captured in the porous semiconductor layer in the course of electron emission with application of a positive voltage disturb electron emission from the electron emitting element. Such electrons, however, are removed by application of a negative voltage.Type: GrantFiled: April 28, 2004Date of Patent: April 7, 2009Assignees: Sharp Kabushiki Kaisha, Nobuyoshi KoshidaInventors: Hiroyuki Hirakawa, Tadashi Iwamatsu, Nobuyoshi Koshida
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Publication number: 20090078928Abstract: A light-emitting device has a structure in which a semiconductor or a conductive substrate having a bottom electrode, a layer for generating hot electrons, quasi-ballistic electrons or ballistic electrons, a luminous layer, and a semitransparent surface electrode are deposited, or a structure in which a holes supply layer is provided between the luminous layer and the semitransparent surface electrode having the same structure. The light-emitting device realizes highly efficient light emission in a range from infrared rays to ultraviolet ray with smaller driving current than that of conventional injection-type or intrinsic EL devices.Type: ApplicationFiled: July 27, 2004Publication date: March 26, 2009Inventors: Nobuyoshi Koshida, Akira Kojima
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Publication number: 20090027758Abstract: A reversible coloring and deccoloring solid-state device includes a solid-state electrolyte film and a coloring and decoloring film which colors or decolors the coloring and decoloring film reversibly by applying an electric field. A barrier thin film is inserted between the solid-state electrolyte film and the coloring and decoloring film. The barrier thin film comprises at least one layer which is formed by a material having a band gap energy, functions as a barrier for the carrier movement, and has a thickness of 7 nm to 7±2 nm which does not prevent ion conduction. The coloring and decoloring speed is 0.1 seconds to 0.3 seconds by a voltage driving.Type: ApplicationFiled: March 20, 2006Publication date: January 29, 2009Applicant: NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGYInventors: Nobuyoshi Koshida, Hideo Yoshimura
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Patent number: 7307379Abstract: An electron emitting element is of a structure in which a semiconductor layer is formed between an upper electrode and a lower electrode, wherein an organic compound adsorption layer is formed on a semiconductor surface of the semiconductor layer by causing the organic compound to be adsorbed on the semiconductor surface. Herein, the semiconductor layer can be made of silicon or polysilicon and partly or as a whole porous. The absorbed organic compound can be a non-cyclic hydrocarbon, a compound obtained by coupling at least an aldehyde group to a non-cyclic hydrocarbon, or a non-cyclic hydrocarbon having an unsaturated bond. As a result, there can be provided an electron emitting element capable of stably operating in the atmosphere or in a low vacuum even when being operated in the atmosphere or in the low vacuum and an imaging device using the electron emitting element.Type: GrantFiled: April 13, 2004Date of Patent: December 11, 2007Assignees: Sharp Kabushiki KaishaInventors: Tadashi Iwamatsu, Hiroyuki Hirakawa, Nobuyoshi Koshida
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Patent number: 7306990Abstract: An information memory device capable of reading and writing of information by mechanical operation of a floating gate layer, in which a gate insulation film has a cavity (6), and a floating gate layer (5) having two stable deflection states in the cavity (6), the state stabilized by deflecting toward the channel side of transistor, and the state stabilized by deflecting toward the gate (7) side, writing and reading of information can be made by changing the stable deflection state of the floating gate layer (5) by Coulomb interactive force between the electrons (or positive holes 8) accumulated in the floating gate layer (5) and external electric field, and by reading the channel current change based on the state of the floating gate layer (5).Type: GrantFiled: November 28, 2003Date of Patent: December 11, 2007Assignee: Japan Science & Technology AgencyInventors: Shinya Yamaguchi, Masahiko Ando, Toshikazu Shimada, Natsuki Yokoyama, Shunri Oda, Nobuyoshi Koshida
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Publication number: 20060291905Abstract: Provided are an electron emitter continuously emitting electrons stably even in the atmosphere, a charger using the electron emitter, and a charging method using the charger. The electron emitter includes a electron emitting element consisting of a first electrode, a second electrode, and a semiconductor layer formed therebetween, and a power supply for alternately applying a positive voltage enabling electron emission and a negative voltage having a polarity opposite to the positive voltage. At least a part of the surface on the first electrode side of the semiconductor layer is formed of a porous semiconductor layer. Electrons captured in the porous semiconductor layer in the course of electron emission with application of a positive voltage disturb electron emission from the electron emitting element. Such electrons, however, are removed by application of a negative voltage.Type: ApplicationFiled: April 28, 2004Publication date: December 28, 2006Inventors: Hiroyuki Hirakawa, Tadashi Iwamatsu, Nobuyoshi Koshida
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Patent number: 7119361Abstract: A porous silicon structure is stabilized by anodically oxidizing the structure and then subjecting it to chemical functionalization to protect non-oxidized surface regions, preferably in the presence of 1-decene under thermal conditions. This process creates a protective organic monolayer on the surface of the structure, rendering it highly stable.Type: GrantFiled: October 25, 2004Date of Patent: October 10, 2006Assignee: National Research CouncilInventors: David John Lockwood, Rabah Boukherroub, Danial D. M. Wayner, Nobuyoshi Koshida
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Publication number: 20060186786Abstract: An electron emitting element is of a structure in which a semiconductor layer is formed between an upper electrode and a lower electrode, wherein an organic compound adsorption layer is formed on a semiconductor surface of the semiconductor layer by causing the organic compound to be adsorbed on the semiconductor surface. Herein, the semiconductor layer can be made of silicon or polysilicon and partly or as a whole porous. The absorbed organic compound can be a non-cyclic hydrocarbon, a compound obtained by coupling at least an aldehyde group to a non-cyclic hydrocarbon, or a non-cyclic hydrocarbon having an unsaturated bond. As a result, there can be provided an electron emitting element capable of stably operating in the atmosphere or in a low vacuum even when being operated in the atmosphere or in the low vacuum and an imaging device using the electron emitting element.Type: ApplicationFiled: April 13, 2004Publication date: August 24, 2006Inventors: Tadashi Iwamatsu, Hiroyuki Hirakawa, Nobuyoshi Koshida
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Patent number: 7091138Abstract: A forming method and a forming apparatus of nanocrystalline silicon structure makes it possible to prepare a nanocrystalline silicon structure at a low temperature to have densely packed silicon crystal grains which are stably terminated and to effectively control the grain size in nanometer scale. A forming method and a forming apparatus of nanocrystalline silicon structure with oxide or nitride termination, carry out a first step of treating a surface of a substrate with hydrogen radical; a second step of depositing silicon crystals having a grain size of 10 nm or less by the thermal reaction of a silicon-containing gas; and a third step of terminating the surface of the silicon crystal with oxygen or nitrogen by using one of oxygen gas, oxygen radical and nitrogen radical.Type: GrantFiled: August 27, 2004Date of Patent: August 15, 2006Assignees: Anelva CorporationInventors: Yoichiro Numasawa, Nobuyoshi Koshida
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Patent number: 7053422Abstract: The present invention provides a solid state light-emissive display apparatus of high brightness and efficiency, high reliability, and of thin type, and method of manufacturing the same at low cost. Said apparatus has the luminous thin film made up by laminating or mixing crystal fine particle coated with insulator (5) of nm size and fluorescent fine particles (7) of nm size, and the lower electrode and the transparent upper electrode sandwiching said luminous thin film, wherein the electrons injected from said lower electrode are accelerated in the crystal fine particle coated with insulator layer (6) not being scattered by phonons to become high energy ballistic electrons, and form excitons (13) by colliding excitation of fluorescent fine particles. Since said fluorescent fine particles are of nm size, the exciton concentration is high, and luminescence intensity by extinction of excitons is also high.Type: GrantFiled: September 30, 2002Date of Patent: May 30, 2006Assignee: Japan Science and Technology AgencyInventors: Masahiko Ando, Toshikazu Shimada, Masatoshi Shiiki, Shunri Oda, Nobuyoshi Koshida
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Publication number: 20060051920Abstract: An information memory device capable of reading and writing of information by mechanical operation of a floating gate layer, in which a gate insulation film has a cavity (6), and a floating gate layer (5) having two stable deflection states in the cavity (6), the state stabilized by deflecting toward the channel side of transistor, and the state stabilized by deflecting toward the gate (7) side, writing and reading of information can be made by changing the stable deflection state of the floating gate layer (5) by Coulomb interactive force between the electrons (or positive holes 8) accumulated in the floating gate layer (5) and external electric field, and by reading the channel current change based on the state of the floating gate layer (5).Type: ApplicationFiled: November 28, 2003Publication date: March 9, 2006Inventors: Shinya Yamaguchi, Masahiko Ando, Toshikazu Shimada, Natsuki Yokoyama, Shunri Oda, Nobuyoshi Koshida
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Publication number: 20050201575Abstract: A thermally induced sound wave generating device comprising a thermally conductive substrate, a head insulation layer formed on one surface of the substrate, and a heating element thin film formed on the heat insulation layer and in the form of an electrically driven metal film, and wherein when the heat conductivity of the thermally conductive substrate is set as ?s and its heat capacity is set as Cs, and the thermal conductivity of the beat insulation layer is set as ?I and its heat capacity is set as CI, relation of 1/100??ICI/?SCS and ?SCS?100×106 is realized. This is a new technical means capable of greatly improving the function of a pressure generating device based on thermal induction.Type: ApplicationFiled: February 27, 2004Publication date: September 15, 2005Inventors: Nobuyoshi Koshida, Kenji Tsubaki
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Patent number: 6939728Abstract: A high emission electron emitter and a method of fabricating a high emission electron emitter are disclosed. A high emission electron emitter includes an electron injection layer, an active layer of high porosity porous silicon material in contact with the electron injection layer, a contact layer of low porosity porous silicon material in contact with the active layer and including an interface surface with a heavily doped region, and an optional top electrode in contact with the contact layer. The contact layer reduces contact resistance between the active layer and the top electrode and the heavily doped region reduces resistivity of the contact layer thereby increasing electron emission efficiency and stable electron emission from the top electrode. The electron injection layer is made from an electrically conductive material such as n+ semiconductor, n+ single crystal silicon, a metal, a silicide, or a nitride.Type: GrantFiled: May 15, 2003Date of Patent: September 6, 2005Assignee: Hewlett-Packard Development Company, L.P.Inventors: Xia Sheng, Nobuyoshi Koshida, Huei-Pei Kuo
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Patent number: 6940087Abstract: Disclosed is an electron source 10 including an electron source element 10a formed on the side of one surface of an insulative substrate 1. The electron source element 10a includes a lower electrode 2, a composite nanocrystal layer 6 and a surface electrode 7. The composite nanocrystal layer 6 includes a plurality of polycrystalline silicon grains 51, a thin silicon oxide film 52 formed over the surface of each of the grains 51, a number of nanocrystalline silicons 63 residing between the adjacent grains 51, and a silicon oxide film 64 formed over the surface of each of the nanocrystalline silicons 63. The silicon oxide film 64 is an insulating film having a thickness less than the crystal grain size of the nanocrystalline silicon 63. The surface electrode 7 is formed of a carbon thin film 7a laminated on the composite nanocrystal layer 6 while being in contact therewith, and a metal thin film 7b laminated on the carbon thin film 7a.Type: GrantFiled: March 7, 2003Date of Patent: September 6, 2005Assignees: Matsushita Electric Works, Ltd.Inventors: Takuya Komoda, Nobuyoshi Koshida, Tsutomu Ichihara