Patents by Inventor Nobuyuki Fukui
Nobuyuki Fukui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240321562Abstract: A plasma processing method includes: (a) providing a substrate on a substrate support in a chamber; (b) supplying a coolant to control a temperature of the substrate support; (c) supplying a processing gas into the chamber; and (d) in a state where (b) is being performed, generating plasma from the processing gas in the chamber by a source RF signal, and supplying a bias signal to etch the carbon-containing film. In (d), the coolant of (b) is set such that the substrate or the substrate support reaches a target temperature of ?70° C. to 100° C. during plasma etching, the source RF signal in (d) is an RF signal having a power of 2 kW or more, and the bias signal in (d) is a bias RF signal having a power of 2 kW or more or a bias DC signal including a voltage pulse of 2 kV or more.Type: ApplicationFiled: May 31, 2024Publication date: September 26, 2024Applicant: Tokyo Electron LimitedInventors: Koki MUKAIYAMA, Maju TOMURA, Yoshihide KIHARA, Nobuyuki FUKUI
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Publication number: 20240038494Abstract: An etching method includes: steps a), b), c), and d). Step a) provides a substrate having an underlying layer and an etching target film formed on the underlying layer, on a stage. Step b) generates plasma from a processing gas. Step c) supplies a bias power having a first frequency to the stage to etch the etching target film, thereby forming a recess. Step d) changes a frequency of the bias power to a second frequency different from the first frequency according to an aspect ratio of the recess after step c), to further etch the etching target film. After a generation of the plasma, the etching target film is continuously etched during a time period until the underlying layer is exposed.Type: ApplicationFiled: August 27, 2021Publication date: February 1, 2024Applicant: Tokyo Electron LimitedInventors: Maju TOMURA, Ryutaro SUDA, Nobuyuki FUKUI
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Publication number: 20240006152Abstract: A method for etching a substrate includes: (a) providing a substrate processing apparatus including a processing chamber that forms a processing space, a substrate support provided inside the processing chamber to hold a substrate, and a power supply that supplies a bias power to at least the substrate support; (b) providing the substrate on the substrate support, the substrate including an underlying layer and an organic material layer on the underlying layer; (c) generating plasma in the processing chamber; and (d) repeating a predetermined cycle including an ON time during which the bias power is supplied to the substrate support and an OFF time during which the bias power is not supplied to the substrate support. The OFF time is 10 msec or longer.Type: ApplicationFiled: September 14, 2023Publication date: January 4, 2024Applicant: Tokyo Electron LimitedInventors: Maju TOMURA, Nobuyuki FUKUI, Yoshihide KIHARA
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Publication number: 20200094228Abstract: There is provided a catalyst with low-temperature activity, high selectivity, high poisoning resistance and high durability, as well as a method for producing it. A cluster-supporting catalyst having a silicon carbide carrier and precious metal clusters supported on the silicon carbide carrier, and a method for producing the cluster-supporting catalyst that includes sputtering with a precious metal target to generate precious metal clusters, and impacting the generated precious metal clusters on the surface of the silicon carbide carrier to support them on it.Type: ApplicationFiled: September 19, 2019Publication date: March 26, 2020Applicants: TOYOTA JIDOSHA KABUSHIKI KAISHA, GENESIS RESEARCH INSTITUTEInventors: Hisato YASUMATSU, Nobuyuki FUKUI, Toshiaki TANAKA, Seitoku ITO, Jun HASEGAWA
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Patent number: 7885496Abstract: Disclosed herein is a light receiving apparatus, including: a light receiving section including a light receiving element; a transparent part; and a light guiding part inserted in the groove; the groove having, on the front face side, a side face formed as an arcuately curved face convex toward the front face side and having the same shape in any cross section perpendicular to the front face and also to the depthwise direction of the groove; the light guiding part having a side face opposing to the side face of the groove on the front face side and formed as an arcuately curved face which is convex toward the front face side in a state wherein the light guiding part is inserted in the groove and which has the same shape in any cross section perpendicular to the front face and also to the depthwise direction of the groove.Type: GrantFiled: December 24, 2008Date of Patent: February 8, 2011Assignee: Sony CorporationInventors: Nobuyuki Fukui, Yutaka Ogasawara, Hideaki Kurachi, Yoshiyuki Nida
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Publication number: 20090166537Abstract: Disclosed herein is a light receiving apparatus, including: a light receiving section including a light receiving element; a transparent part; and a light guiding part inserted in the groove; the groove having, on the front face side, a side face formed as an arcuately curved face convex toward the front face side and having the same shape in any cross section perpendicular to the front face and also to the depthwise direction of the groove; the light guiding part having a side face opposing to the side face of the groove on the front face side and formed as an arcuately curved face which is convex toward the front face side in a state wherein the light guiding part is inserted in the groove and which has the same shape in any cross section perpendicular to the front face and also to the depthwise direction of the groove.Type: ApplicationFiled: December 24, 2008Publication date: July 2, 2009Applicant: Sony CorporationInventors: Nobuyuki FUKUI, Yutaka Ogasawara, Hideaki Kurachi, Yoshiyuki Nida
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Publication number: 20090110769Abstract: It is an object of the present invention to provide fermented beverages that give no sweetness in aftertaste and which have less off-flavors by a technique that will not affect the principal taste and aroma characteristics and which is highly acceptable to consumers. To attain this object, the proportion of trisaccharides in the assimilable sugars in the fermentation raw material solution or fermenting solution is adjusted, such that the yet-to-be assimilated sugars which remain in the fermenting step will not consist mainly of trisaccharides. Specifically, fermentation is performed while the proportion of trisaccharides in assimilable sugars in the fermentation raw material solution is adjusted to be no more than 25 wt %.Type: ApplicationFiled: November 28, 2005Publication date: April 30, 2009Applicant: SUNTORY LIMITEDInventors: Atsushi Fujita, Hiroto Kondo, Nobuyuki Fukui, Yuji Nishida
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Publication number: 20080032386Abstract: The present invention relates to a stabilized proline transporter Put4 obtained by gene mutation and a gene encoding the same, as well as a Saccharomyces yeast strain which is obtained by yeast transformation with the gene and is capable of efficiently using proline in a source material such as wort. The stabilized mutated proline transporter Put4 can be used to achieve efficient use of nitrogen sources such as poorly assimilable proline contained in source materials (e.g., wort) for alcohol beverages. Fermentation using yeast capable of taking up a wide variety and large amounts of nitrogen sources facilitates carbon source assimilation and allows improvement of productivity for alcohol beverages. Moreover, the use of poorly assimilable nitrogen sources leads to resource savings and enables environmentally friendly production of alcohol beverages.Type: ApplicationFiled: June 17, 2005Publication date: February 7, 2008Inventors: Fumihiko Omura, Nobuyuki Fukui, Hiroto Kondo
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Patent number: 7052724Abstract: A novel technique is provided for drying a yeast for brewing and a method of producing alcoholic beverages by using the yeast. It is intended to provide a method of producing a dry yeast which has the optimum fermentability when directly used in fermentation and gives an appropriate flavor without needing prepropagation, and a method of producing alcoholic beverages by using the yeast. A method comprising incorporating a stabilizer such as trehalose into a yeast which has been recovered from the fermentation step, and, if desired, further incorporating glycerol into the yeast to thereby lower the water activity in the cells, and then dehydrating/drying the yeast while sustaining a high viable cell ratio and favorable fermentability; and alcoholic beverages produced by using the yeast.Type: GrantFiled: January 31, 2002Date of Patent: May 30, 2006Assignee: Suntory LimitedInventors: Katsumi Oshita, Nobuyuki Fukui, Hideko Yomo, Yusuke Umezawa
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Publication number: 20060051459Abstract: It is a common concern among beverages to avoid or prevent off-flavors (unpleasant smells) from developing during a yeast-based fermentation step. The present invention relates to low-alcohol beverages produced through a fermentation stopping process and provides a method for producing fermented beverages with less off-flavor and with an excellent aroma. The L-methionine concentration and the free amino nitrogen level (FAN level) in wort are adjusted to reduce the hydrogen sulfide concentration and the T-VDK concentration, thus enabling the production of fermented beverages with less off-flavor, i.e., sulfur and diacetyl smells.Type: ApplicationFiled: November 7, 2003Publication date: March 9, 2006Inventors: Yuji Nishida, Taichi Maruhashi, Hiroki Fujita, Nobuyuki Fukui
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Publication number: 20040018274Abstract: A novel technique is provided for drying a yeast for brewing and a method of producing alcoholic beverages by using the yeast. It is intended to provide a method of producing a dry yeast which has the optimum fermentability when directly used in fermentation and gives an appropriate flavor without needing prepropagation, and a method of producing alcoholic beverages by using the yeast.Type: ApplicationFiled: December 30, 2002Publication date: January 29, 2004Inventors: Katsumi Oshita, Nobuyuki Fukui, Hideko Yomo, Yusuke Umezawa
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Patent number: 5602610Abstract: When a driving member is rotated counterclockwise by a single motor with a pair of sectors biased in the closing direction by a biasing spring, a first driving pin causes an operating lever to rotate clockwise. The pair of sectors pivot in opposite directions to each other in association with the driving lever to reach a first position where the sectors are fully open without overlapping the lens opening. When the driving member is rotated clockwise, a second driving pin also causes the operating lever to rotate clockwise. The pair of sectors pivot in opposite directions to each other to reach a second position, that is, a half-open position where an opening smaller than the lens opening is obtained. At this time, The second driving pin abuts on a part of one sector to restrain the displacement of the driving member. Accordingly, the driving member is prevented from overrunning, and no hunting occurs.Type: GrantFiled: December 28, 1994Date of Patent: February 11, 1997Assignee: Seiko Precision Inc.Inventors: Kazuo Akimoto, Miyoshi Tanikawa, Nobuyuki Fukui
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Patent number: 5546149Abstract: A focal plane shutter for a camera comprises opening and closing blade units operable to open and close a shutter opening of the camera. Each blade unit has a leading blade and trailing blades in superposed relation to the leading blade. The leading blade and the trailing blades are supported by arm members through hollow pivot pins. The hollow pivot pins supporting the leading blade of each blade unit are covered by the trailing blades. Due to the use of hollow pivot pins, the overall weight and driving force of the blade units are effectively reduced to thereby make the shutter free of operational impact without light leakage.Type: GrantFiled: May 27, 1994Date of Patent: August 13, 1996Assignee: Seiko Precision Inc.Inventors: Ichiro Nemoto, Hiroyuki Izumi, Nobuyuki Fukui, Kunioki Takahashi
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Patent number: D489322Type: GrantFiled: July 14, 2003Date of Patent: May 4, 2004Assignee: Sony CorporationInventors: Kunihito Sawai, Nobuyuki Fukui
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Patent number: D430538Type: GrantFiled: June 8, 1999Date of Patent: September 5, 2000Assignee: Sony CorporationInventors: Kozo Kawakita, Takeshi Yamagishi, Tsutomu Tsuchiya, Toru Imai, Nobuyuki Fukui
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Patent number: D430846Type: GrantFiled: February 7, 2000Date of Patent: September 12, 2000Assignee: Sony CorporationInventors: Kozo Kawakita, Takeshi Yamagishi, Tsutomu Tsuchiya, Toru Imai, Nobuyuki Fukui