Patents by Inventor Nobuyuki Hishinuma
Nobuyuki Hishinuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11116856Abstract: A hand dryer with a housing in which a cavity accessible from outside through a housing opening is formed for accommodating hands to be dried by means of an airflow, and with a device for generating the airflow, as well as a device for generating UV radiation comprising at least one lamp that emits light in the ultraviolet wavelength range, which is arranged in the housing in such a manner that it emits UV radiation into the cavity. The device for generating UV radiation is designed in such a manner that the UV radiation emitted into the cavity with a wavelength in the range from 228 to 380 nm has a maximum intensity of 20% of the intensity of the UV radiation emitted into the cavity with a wavelength in the range from 200 to 380 nm.Type: GrantFiled: October 16, 2018Date of Patent: September 14, 2021Assignee: BLV LICHT- UND VAKUUMTECHNIK GMBHInventors: Nobuyuki Hishinuma, Yasuhiko Wakahata
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Patent number: 10596285Abstract: Provided is a sterilization method capable of performing a sterilization treatment with high sterilization efficiency using ozone produced from an air regardless of the humidity of the air as an ozone raw material gas. In the sterilization method, the air as an ozone raw material gas is irradiated with light for producing ozone which does not include light with a wavelength region where the light decomposes ozone and which has a wavelength of not more than 200 nm to obtain an ozone-containing air, and an object to be sterilized is exposed to the ozone-containing air to sterilize the object. In the sterilization method, the relative humidity of the ozone raw material gas is not more than 60% RH.Type: GrantFiled: December 29, 2016Date of Patent: March 24, 2020Assignee: Ushio Denki Kabushiki KaishaInventors: Keisuke Naito, Nobuyuki Hishinuma, Shinji Suzuki
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Patent number: 10377628Abstract: An energy carrier system is provided that produces ammonia with high efficiency and that further produces hydrogen as final product and uses the hydrogen as energy. An energy storage transportation method is further provided that is carried out by using energy carrier system. The energy carrier system includes nitric acid production device, an ammonia production device, and hydrogen production device. The nitric acid production device includes a photo-reactor, a gas supply unit that supplies photo-reactor with gas to be treated containing a nitrogen oxide, water, and oxygen, and light source disposed in the photo-reactor. The light source radiates light including ultraviolet of a wavelength shorter than 175 nm. The energy storage transportation method includes nitric acid production step of producing nitric acid from a nitrogen oxide, ammonia production step of producing ammonia through reduction of nitric acid, and hydrogen production step of producing hydrogen through decomposition of the ammonia.Type: GrantFiled: January 28, 2016Date of Patent: August 13, 2019Assignees: SAWAFUJI ELECTRIC CO., LTD., GIFU UNIVERSITYInventors: Shinji Kambara, Nobuyuki Hishinuma, Tomonori Miura
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Publication number: 20190117802Abstract: A hand dryer with a housing in which a cavity accessible from outside through a housing opening is formed for accommodating hands to be dried by means of an airflow, and with a device for generating the airflow, as well as a device for generating UV radiation comprising at least one lamp that emits light in the ultraviolet wavelength range, which is arranged in the housing in such a manner that it emits UV radiation into the cavity. The device for generating UV radiation is designed in such a manner that the UV radiation emitted into the cavity with a wavelength in the range from 228 to 380 nm has a maximum intensity of 20% of the intensity of the UV radiation emitted into the cavity with a wavelength in the range from 200 to 380 nm.Type: ApplicationFiled: October 16, 2018Publication date: April 25, 2019Inventors: Nobuyuki HISHINUMA, Yasuhiko WAKAHATA
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Patent number: 10207926Abstract: The present invention has as its object the provision of an ozone generator that can generate ozone with high efficiency. The ozone generator of the present invention includes: source gas supply means for supplying a source gas containing oxygen; a gas flow channel forming member for forming a gas flow channel through which the source gas from the source gas supply means flows; and an ultraviolet light source for emitting ultraviolet light, the ultraviolet light source being disposed in the gas flow channel. The ozone generator irradiates the source gas flowing through the gas flow channel with the ultraviolet light from the ultraviolet light source to cause the oxygen in the source gas to absorb the ultraviolet light and thereby generate ozone. The ultraviolet light source comprises an excimer lamp for emitting ultraviolet light with a wavelength of not more than 200 nm. A flow rate of the source gas in a region where the ultraviolet light source is disposed in the gas flow channel is not lower than 0.1 m/s.Type: GrantFiled: August 8, 2016Date of Patent: February 19, 2019Assignee: Ushio Denki Kabushiki KaishaInventors: Keisuke Naito, Nobuyuki Hishinuma, Shinji Suzuki
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Publication number: 20180230011Abstract: The present invention has as its object the provision of an ozone generator that can generate ozone with high efficiency. The ozone generator of the present invention includes: source gas supply means for supplying a source gas containing oxygen; a gas flow channel forming member for forming a gas flow channel through which the source gas from the source gas supply means flows; and an ultraviolet light source for emitting ultraviolet light, the ultraviolet light source being disposed in the gas flow channel. The ozone generator irradiates the source gas flowing through the gas flow channel with the ultraviolet light from the ultraviolet light source to cause the oxygen in the source gas to absorb the ultraviolet light and thereby generate ozone. The ultraviolet light source comprises an excimer lamp for emitting ultraviolet light with a wavelength of not more than 200 nm. A flow rate of the source gas in a region where the ultraviolet light source is disposed in the gas flow channel is not lower than 0.1 m/s.Type: ApplicationFiled: August 8, 2016Publication date: August 16, 2018Applicant: Ushio Denki Kabushiki KaishaInventors: Keisuke NAITO, Nobuyuki HISHINUMA, Shinji SUZUKI
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Publication number: 20180185531Abstract: Provided is a sterilization method capable of performing a sterilization treatment with high sterilization efficiency using ozone produced from an air regardless of the humidity of the air as an ozone raw material gas. In the sterilization method, the air as an ozone raw material gas is irradiated with light for producing ozone which does not include light with a wavelength region where the light decomposes ozone and which has a wavelength of not more than 200 nm to obtain an ozone-containing air, and an object to be sterilized is exposed to the ozone-containing air to sterilize the object. In the sterilization method, the relative humidity of the ozone raw material gas is not more than 60% RH.Type: ApplicationFiled: December 29, 2016Publication date: July 5, 2018Applicant: Ushio Denki Kabushiki KaishaInventors: Keisuke NAITO, Nobuyuki HISHINUMA, Shinji SUZUKI
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Patent number: 9159545Abstract: A first excimer lamp includes: a quartz glass-made light-emitting tube containing an excimer emission gas sealed therein; and a pair of electrodes for generating dielectric barrier discharge. One of the pair of electrodes is disposed in the inner space of the light-emitting tube so as to extend in the direction of a tube axis of the light-emitting tube, and the other one of the pair of electrodes is embedded in the tube wall of the light-emitting tube so as to extend in the direction of the tube axis of the light-emitting tube. The one electrode is electrically connected to a conductive foil hermetically embedded in an end portion of the light-emitting tube.Type: GrantFiled: November 29, 2012Date of Patent: October 13, 2015Assignee: USHIO DENKI KABUSHIKI KAISHAInventors: Nobuyuki Hishinuma, Yukiharu Tagawa, Junya Asayama, Koichi Takegoshi, Kosuke Yamada
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Publication number: 20150035429Abstract: A first excimer lamp includes: a quartz glass-made light-emitting tube containing an excimer emission gas sealed therein; and a pair of electrodes for generating dielectric barrier discharge. One of the pair of electrodes is disposed in the inner space of the light-emitting tube so as to extend in the direction of a tube axis of the light-emitting tube, and the other one of the pair of electrodes is embedded in the tube wall of the light-emitting tube so as to extend in the direction of the tube axis of the light-emitting tube. The one electrode is electrically connected to a conductive foil hermetically embedded in an end portion of the light-emitting tube.Type: ApplicationFiled: November 29, 2012Publication date: February 5, 2015Applicant: USHIO DENKI KABUSHIKI KAISHAInventors: Nobuyuki Hishinuma, Yukiharu Tagawa, Junya Asayama, Koichi Takegoshi, Kosuke Yamada
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Patent number: 7935266Abstract: A substrate supporting film to be etched is held on a rotating stage. Ultraviolet light having a wavelength of 200 nm or shorter radiated from first lamps irradiates the film in air, thereby removing an organic coatings from the film and making the surface of the film hydrophilic. A chemical solution is applied to the hydrophilic film while rotating the substrate. Ultraviolet light having a wavelength longer than 200 nm is radiated from second lamps and onto the film through the chemical solution.Type: GrantFiled: December 27, 2007Date of Patent: May 3, 2011Assignees: Renesas Electronics Corporation, Ushio Denki Kabushiki KaishaInventors: Satoshi Kume, Nobuyuki Hishinuma, Hiroshi Sugahara
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Publication number: 20080113518Abstract: A substrate supporting film to be etched is held on a rotating stage. Ultraviolet light having a wavelength of 200 nm or shorter radiated from first lamps irradiates the film in air, thereby removing an organic coatings from the film and making the surface of the film hydrophilic. A chemical solution is applied to the hydrophilic film while rotating the substrate. Ultraviolet light having a wavelength longer than 200 nm is radiated from second lamps and onto the film through the chemical solution.Type: ApplicationFiled: December 27, 2007Publication date: May 15, 2008Applicants: RENESAS TECHNOLOGY CORP., USHIO DENKI KABUSHIKI KAISHAInventors: Satoshi Kume, Nobuyuki Hishinuma, Hiroshi Sugahara
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Publication number: 20050205521Abstract: A wet etching apparatus comprises a stage for fixing a substrate having a major surface covered with a film to be etched, a rotation mechanism for rotating the stage, a rotation controller for controlling rotation operation by the rotation mechanism, an ultraviolet irradiation unit having a light source for irradiating a portion of the major surface of the substrate with ultraviolet radiation, and an etching solution supply unit for supplying etching solution to the major surface of the substrate. The entire surface of the substrate can be irradiated with the ultraviolet radiation by a rotation of the stage.Type: ApplicationFiled: January 21, 2005Publication date: September 22, 2005Applicants: Semiconductor Leading Edge Technologies, Inc., Ushio Denki Kabushiki KaishaInventors: Satsohi Kume, Hiroshi Sugahara, Nobuyuki Hishinuma
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Publication number: 20050186125Abstract: According to the present invention, in a treatment apparatus, catalyst is used in order to dissolve molecular gas containing hydrogen atoms or oxygen atoms, and an object is treated by gas produced by the catalyst. The treatment apparatus comprises a catalyst irradiation unit, wherein the catalyst is irradiated, by the catalyst irradiation unit, with light having a wave number larger than work function of the catalyst expressed in wave number.Type: ApplicationFiled: February 18, 2005Publication date: August 25, 2005Inventors: Hiromitsu Matsuno, Taku Sumitomo, Nobuyuki Hishinuma
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Publication number: 20040209194Abstract: A substrate supporting film to be etched is held on a rotating stage. Ultraviolet light having a wavelength of 200 nm or shorter radiated from first lamps irradiates the film in air, thereby removing organic coatings from the film and making the surface of the film hydrophilic. A chemical solution applied to the hydrophilic film while rotating the substrate. Ultraviolet light having a wavelength longer than 200 nm is radiated from second lamps and onto the film through the chemical solution.Type: ApplicationFiled: March 11, 2004Publication date: October 21, 2004Applicants: Semiconductor Leading Edge Technologies, Inc., Ushio Denki Kabushiki KaishaInventors: Satoshi Kume, Nobuyuki Hishinuma, Hiroshi Sugahara
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Patent number: 6787787Abstract: An ultraviolet illumination equipment including a receptacle with a window, a dielectric-barrier discharge lamp located within the receptacle for emitting ultraviolet radiation through the window, and a heater for heating the window to at least 100° C.Type: GrantFiled: May 16, 2000Date of Patent: September 7, 2004Assignee: Ushiodenki Kabushiki KaishaInventors: Nobuyuki Hishinuma, Hiroshi Sugawara, Fumitosho Takemoto, Hiroaki Tokai, Jun Murase
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Patent number: 6657367Abstract: A dielectric barrier discharge lamp device which allows ultraviolet rays to be uniformly radiated onto a workpiece having a large surface area and which can be easily adapted to the size of workpiece. In the dielectric barrier, at least one dielectric barrier discharge lamp is arranged in a hermetically sealed casing which has a hollow longitudinally extending main part that is closed at both ends by end parts, at least a portion of the main part of the casing defining a window allowing light radiated from the at least one dielectric barrier discharge lamp to pass therethrough onto the workpiece. At least one end part of the casing is provided with a passage allowing inert gas to be introduced into the casing, and at least one end part of the casing is adapted to allow loading or unloading of the at least one dielectric barrier discharge lamp. A plurality of casings are arranged side by side with their windows facing the workpiece to be irradiated.Type: GrantFiled: November 2, 2000Date of Patent: December 2, 2003Assignee: Ushiodenki Kabushiki KaishaInventors: Satoru Fukuda, Nobuyuki Hishinuma, Shinji Sugioka
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Publication number: 20030215751Abstract: A resist removal method and device therefor are provided that are excellent from the point of view of washing costs and environmental preservation and that also offer extremely high removal performance, and this method of resist removal using functional water according to the present invention includes the following steps:Type: ApplicationFiled: May 20, 2003Publication date: November 20, 2003Applicant: Ushio Denki Kabushiki KaisyaInventors: Kiyoshi Otake, Nobuyuki Hishinuma
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Patent number: 6624428Abstract: To advantageously eliminate the disadvantage of attenuation of the radiant light from dielectric barrier discharge lamps by a UV transmission component, a treatment device using dielectric barrier discharge lamps is provided with a lamp chamber in which dielectric barrier discharge lamps are located and in which there is an inert gas atmosphere; a treatment chamber, in which an article to be treated is located, is provided with a treatment gas atmosphere, and a UV transmission component by which the lamp chamber and the treatment chamber are separated from one another. In each of the lamp chamber and the treatment chamber there are devices for determining the gas pressure within the respective chamber, a supply arrangement for delivering gas to the inside the respective chamber and an arrangement for discharging gas from the respective chamber.Type: GrantFiled: November 13, 2002Date of Patent: September 23, 2003Assignee: Ushiodenki Kabushiki KaishaInventor: Nobuyuki Hishinuma
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Patent number: 6570301Abstract: A dielectric-barrier discharge lamp device that can reliably prevent leakage of the coolant fluid used to cool the dielectric-barrier discharge lamp, and that can reliably cool the dielectric-barrier discharge lamp, is achieved by the dielectric-barrier discharge lamp device having a dielectric-barrier discharge lamp (1) with a hollow-cylinder-shaped discharge space (P) formed by an outer tube (3) that is roughly cylindrical in external shape and a co-axial inner tube (2), in which the inner tube (2) has a cylindrical tube extension (2A) that extends outward from the discharge space (4), and in which the outer periphery of the end (2A1) of the tube extension (2A) is held tightly by a coupler fitting (8) connected to a guide tube (11) through which a coolant fluid flows.Type: GrantFiled: March 30, 2000Date of Patent: May 27, 2003Assignee: Ushiodenki Kabushiki KaishaInventors: Nobuyuki Hishinuma, Shinji Sugioka, Satoru Fukuda
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Publication number: 20030094909Abstract: To advantageously eliminate the disadvantage of attenuation of the radiant light from dielectric barrier discharge lamps by a UV transmission component, a treatment device using dielectric barrier discharge lamps is provided with a lamp chamber in which dielectric barrier discharge lamps are located and in which there is an inert gas atmosphere; a treatment chamber, in which an article to be treated is located, is provided with a treatment gas atmosphere, and a UV transmission component by which the lamp chamber and the treatment chamber are separated from one another. In each of the lamp chamber and the treatment chamber there are devices for determining the gas pressure within the respective chamber, a supply arrangement for delivering gas to the inside the respective chamber and an arrangement for discharging gas from the respective chamber.Type: ApplicationFiled: November 13, 2002Publication date: May 22, 2003Applicant: Ushiodenki Kabushiki KaishaInventor: Nobuyuki Hishinuma