Patents by Inventor Nobuyuki Hishinuma

Nobuyuki Hishinuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10596285
    Abstract: Provided is a sterilization method capable of performing a sterilization treatment with high sterilization efficiency using ozone produced from an air regardless of the humidity of the air as an ozone raw material gas. In the sterilization method, the air as an ozone raw material gas is irradiated with light for producing ozone which does not include light with a wavelength region where the light decomposes ozone and which has a wavelength of not more than 200 nm to obtain an ozone-containing air, and an object to be sterilized is exposed to the ozone-containing air to sterilize the object. In the sterilization method, the relative humidity of the ozone raw material gas is not more than 60% RH.
    Type: Grant
    Filed: December 29, 2016
    Date of Patent: March 24, 2020
    Assignee: Ushio Denki Kabushiki Kaisha
    Inventors: Keisuke Naito, Nobuyuki Hishinuma, Shinji Suzuki
  • Patent number: 10377628
    Abstract: An energy carrier system is provided that produces ammonia with high efficiency and that further produces hydrogen as final product and uses the hydrogen as energy. An energy storage transportation method is further provided that is carried out by using energy carrier system. The energy carrier system includes nitric acid production device, an ammonia production device, and hydrogen production device. The nitric acid production device includes a photo-reactor, a gas supply unit that supplies photo-reactor with gas to be treated containing a nitrogen oxide, water, and oxygen, and light source disposed in the photo-reactor. The light source radiates light including ultraviolet of a wavelength shorter than 175 nm. The energy storage transportation method includes nitric acid production step of producing nitric acid from a nitrogen oxide, ammonia production step of producing ammonia through reduction of nitric acid, and hydrogen production step of producing hydrogen through decomposition of the ammonia.
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: August 13, 2019
    Assignees: SAWAFUJI ELECTRIC CO., LTD., GIFU UNIVERSITY
    Inventors: Shinji Kambara, Nobuyuki Hishinuma, Tomonori Miura
  • Publication number: 20190117802
    Abstract: A hand dryer with a housing in which a cavity accessible from outside through a housing opening is formed for accommodating hands to be dried by means of an airflow, and with a device for generating the airflow, as well as a device for generating UV radiation comprising at least one lamp that emits light in the ultraviolet wavelength range, which is arranged in the housing in such a manner that it emits UV radiation into the cavity. The device for generating UV radiation is designed in such a manner that the UV radiation emitted into the cavity with a wavelength in the range from 228 to 380 nm has a maximum intensity of 20% of the intensity of the UV radiation emitted into the cavity with a wavelength in the range from 200 to 380 nm.
    Type: Application
    Filed: October 16, 2018
    Publication date: April 25, 2019
    Inventors: Nobuyuki HISHINUMA, Yasuhiko WAKAHATA
  • Patent number: 10207926
    Abstract: The present invention has as its object the provision of an ozone generator that can generate ozone with high efficiency. The ozone generator of the present invention includes: source gas supply means for supplying a source gas containing oxygen; a gas flow channel forming member for forming a gas flow channel through which the source gas from the source gas supply means flows; and an ultraviolet light source for emitting ultraviolet light, the ultraviolet light source being disposed in the gas flow channel. The ozone generator irradiates the source gas flowing through the gas flow channel with the ultraviolet light from the ultraviolet light source to cause the oxygen in the source gas to absorb the ultraviolet light and thereby generate ozone. The ultraviolet light source comprises an excimer lamp for emitting ultraviolet light with a wavelength of not more than 200 nm. A flow rate of the source gas in a region where the ultraviolet light source is disposed in the gas flow channel is not lower than 0.1 m/s.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: February 19, 2019
    Assignee: Ushio Denki Kabushiki Kaisha
    Inventors: Keisuke Naito, Nobuyuki Hishinuma, Shinji Suzuki
  • Publication number: 20180230011
    Abstract: The present invention has as its object the provision of an ozone generator that can generate ozone with high efficiency. The ozone generator of the present invention includes: source gas supply means for supplying a source gas containing oxygen; a gas flow channel forming member for forming a gas flow channel through which the source gas from the source gas supply means flows; and an ultraviolet light source for emitting ultraviolet light, the ultraviolet light source being disposed in the gas flow channel. The ozone generator irradiates the source gas flowing through the gas flow channel with the ultraviolet light from the ultraviolet light source to cause the oxygen in the source gas to absorb the ultraviolet light and thereby generate ozone. The ultraviolet light source comprises an excimer lamp for emitting ultraviolet light with a wavelength of not more than 200 nm. A flow rate of the source gas in a region where the ultraviolet light source is disposed in the gas flow channel is not lower than 0.1 m/s.
    Type: Application
    Filed: August 8, 2016
    Publication date: August 16, 2018
    Applicant: Ushio Denki Kabushiki Kaisha
    Inventors: Keisuke NAITO, Nobuyuki HISHINUMA, Shinji SUZUKI
  • Publication number: 20180185531
    Abstract: Provided is a sterilization method capable of performing a sterilization treatment with high sterilization efficiency using ozone produced from an air regardless of the humidity of the air as an ozone raw material gas. In the sterilization method, the air as an ozone raw material gas is irradiated with light for producing ozone which does not include light with a wavelength region where the light decomposes ozone and which has a wavelength of not more than 200 nm to obtain an ozone-containing air, and an object to be sterilized is exposed to the ozone-containing air to sterilize the object. In the sterilization method, the relative humidity of the ozone raw material gas is not more than 60% RH.
    Type: Application
    Filed: December 29, 2016
    Publication date: July 5, 2018
    Applicant: Ushio Denki Kabushiki Kaisha
    Inventors: Keisuke NAITO, Nobuyuki HISHINUMA, Shinji SUZUKI
  • Patent number: 9159545
    Abstract: A first excimer lamp includes: a quartz glass-made light-emitting tube containing an excimer emission gas sealed therein; and a pair of electrodes for generating dielectric barrier discharge. One of the pair of electrodes is disposed in the inner space of the light-emitting tube so as to extend in the direction of a tube axis of the light-emitting tube, and the other one of the pair of electrodes is embedded in the tube wall of the light-emitting tube so as to extend in the direction of the tube axis of the light-emitting tube. The one electrode is electrically connected to a conductive foil hermetically embedded in an end portion of the light-emitting tube.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: October 13, 2015
    Assignee: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Nobuyuki Hishinuma, Yukiharu Tagawa, Junya Asayama, Koichi Takegoshi, Kosuke Yamada
  • Publication number: 20150035429
    Abstract: A first excimer lamp includes: a quartz glass-made light-emitting tube containing an excimer emission gas sealed therein; and a pair of electrodes for generating dielectric barrier discharge. One of the pair of electrodes is disposed in the inner space of the light-emitting tube so as to extend in the direction of a tube axis of the light-emitting tube, and the other one of the pair of electrodes is embedded in the tube wall of the light-emitting tube so as to extend in the direction of the tube axis of the light-emitting tube. The one electrode is electrically connected to a conductive foil hermetically embedded in an end portion of the light-emitting tube.
    Type: Application
    Filed: November 29, 2012
    Publication date: February 5, 2015
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Nobuyuki Hishinuma, Yukiharu Tagawa, Junya Asayama, Koichi Takegoshi, Kosuke Yamada
  • Patent number: 7935266
    Abstract: A substrate supporting film to be etched is held on a rotating stage. Ultraviolet light having a wavelength of 200 nm or shorter radiated from first lamps irradiates the film in air, thereby removing an organic coatings from the film and making the surface of the film hydrophilic. A chemical solution is applied to the hydrophilic film while rotating the substrate. Ultraviolet light having a wavelength longer than 200 nm is radiated from second lamps and onto the film through the chemical solution.
    Type: Grant
    Filed: December 27, 2007
    Date of Patent: May 3, 2011
    Assignees: Renesas Electronics Corporation, Ushio Denki Kabushiki Kaisha
    Inventors: Satoshi Kume, Nobuyuki Hishinuma, Hiroshi Sugahara
  • Publication number: 20080113518
    Abstract: A substrate supporting film to be etched is held on a rotating stage. Ultraviolet light having a wavelength of 200 nm or shorter radiated from first lamps irradiates the film in air, thereby removing an organic coatings from the film and making the surface of the film hydrophilic. A chemical solution is applied to the hydrophilic film while rotating the substrate. Ultraviolet light having a wavelength longer than 200 nm is radiated from second lamps and onto the film through the chemical solution.
    Type: Application
    Filed: December 27, 2007
    Publication date: May 15, 2008
    Applicants: RENESAS TECHNOLOGY CORP., USHIO DENKI KABUSHIKI KAISHA
    Inventors: Satoshi Kume, Nobuyuki Hishinuma, Hiroshi Sugahara
  • Publication number: 20050205521
    Abstract: A wet etching apparatus comprises a stage for fixing a substrate having a major surface covered with a film to be etched, a rotation mechanism for rotating the stage, a rotation controller for controlling rotation operation by the rotation mechanism, an ultraviolet irradiation unit having a light source for irradiating a portion of the major surface of the substrate with ultraviolet radiation, and an etching solution supply unit for supplying etching solution to the major surface of the substrate. The entire surface of the substrate can be irradiated with the ultraviolet radiation by a rotation of the stage.
    Type: Application
    Filed: January 21, 2005
    Publication date: September 22, 2005
    Applicants: Semiconductor Leading Edge Technologies, Inc., Ushio Denki Kabushiki Kaisha
    Inventors: Satsohi Kume, Hiroshi Sugahara, Nobuyuki Hishinuma
  • Publication number: 20050186125
    Abstract: According to the present invention, in a treatment apparatus, catalyst is used in order to dissolve molecular gas containing hydrogen atoms or oxygen atoms, and an object is treated by gas produced by the catalyst. The treatment apparatus comprises a catalyst irradiation unit, wherein the catalyst is irradiated, by the catalyst irradiation unit, with light having a wave number larger than work function of the catalyst expressed in wave number.
    Type: Application
    Filed: February 18, 2005
    Publication date: August 25, 2005
    Inventors: Hiromitsu Matsuno, Taku Sumitomo, Nobuyuki Hishinuma
  • Publication number: 20040209194
    Abstract: A substrate supporting film to be etched is held on a rotating stage. Ultraviolet light having a wavelength of 200 nm or shorter radiated from first lamps irradiates the film in air, thereby removing organic coatings from the film and making the surface of the film hydrophilic. A chemical solution applied to the hydrophilic film while rotating the substrate. Ultraviolet light having a wavelength longer than 200 nm is radiated from second lamps and onto the film through the chemical solution.
    Type: Application
    Filed: March 11, 2004
    Publication date: October 21, 2004
    Applicants: Semiconductor Leading Edge Technologies, Inc., Ushio Denki Kabushiki Kaisha
    Inventors: Satoshi Kume, Nobuyuki Hishinuma, Hiroshi Sugahara
  • Patent number: 6787787
    Abstract: An ultraviolet illumination equipment including a receptacle with a window, a dielectric-barrier discharge lamp located within the receptacle for emitting ultraviolet radiation through the window, and a heater for heating the window to at least 100° C.
    Type: Grant
    Filed: May 16, 2000
    Date of Patent: September 7, 2004
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventors: Nobuyuki Hishinuma, Hiroshi Sugawara, Fumitosho Takemoto, Hiroaki Tokai, Jun Murase
  • Patent number: 6657367
    Abstract: A dielectric barrier discharge lamp device which allows ultraviolet rays to be uniformly radiated onto a workpiece having a large surface area and which can be easily adapted to the size of workpiece. In the dielectric barrier, at least one dielectric barrier discharge lamp is arranged in a hermetically sealed casing which has a hollow longitudinally extending main part that is closed at both ends by end parts, at least a portion of the main part of the casing defining a window allowing light radiated from the at least one dielectric barrier discharge lamp to pass therethrough onto the workpiece. At least one end part of the casing is provided with a passage allowing inert gas to be introduced into the casing, and at least one end part of the casing is adapted to allow loading or unloading of the at least one dielectric barrier discharge lamp. A plurality of casings are arranged side by side with their windows facing the workpiece to be irradiated.
    Type: Grant
    Filed: November 2, 2000
    Date of Patent: December 2, 2003
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventors: Satoru Fukuda, Nobuyuki Hishinuma, Shinji Sugioka
  • Publication number: 20030215751
    Abstract: A resist removal method and device therefor are provided that are excellent from the point of view of washing costs and environmental preservation and that also offer extremely high removal performance, and this method of resist removal using functional water according to the present invention includes the following steps:
    Type: Application
    Filed: May 20, 2003
    Publication date: November 20, 2003
    Applicant: Ushio Denki Kabushiki Kaisya
    Inventors: Kiyoshi Otake, Nobuyuki Hishinuma
  • Patent number: 6624428
    Abstract: To advantageously eliminate the disadvantage of attenuation of the radiant light from dielectric barrier discharge lamps by a UV transmission component, a treatment device using dielectric barrier discharge lamps is provided with a lamp chamber in which dielectric barrier discharge lamps are located and in which there is an inert gas atmosphere; a treatment chamber, in which an article to be treated is located, is provided with a treatment gas atmosphere, and a UV transmission component by which the lamp chamber and the treatment chamber are separated from one another. In each of the lamp chamber and the treatment chamber there are devices for determining the gas pressure within the respective chamber, a supply arrangement for delivering gas to the inside the respective chamber and an arrangement for discharging gas from the respective chamber.
    Type: Grant
    Filed: November 13, 2002
    Date of Patent: September 23, 2003
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventor: Nobuyuki Hishinuma
  • Patent number: 6570301
    Abstract: A dielectric-barrier discharge lamp device that can reliably prevent leakage of the coolant fluid used to cool the dielectric-barrier discharge lamp, and that can reliably cool the dielectric-barrier discharge lamp, is achieved by the dielectric-barrier discharge lamp device having a dielectric-barrier discharge lamp (1) with a hollow-cylinder-shaped discharge space (P) formed by an outer tube (3) that is roughly cylindrical in external shape and a co-axial inner tube (2), in which the inner tube (2) has a cylindrical tube extension (2A) that extends outward from the discharge space (4), and in which the outer periphery of the end (2A1) of the tube extension (2A) is held tightly by a coupler fitting (8) connected to a guide tube (11) through which a coolant fluid flows.
    Type: Grant
    Filed: March 30, 2000
    Date of Patent: May 27, 2003
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventors: Nobuyuki Hishinuma, Shinji Sugioka, Satoru Fukuda
  • Publication number: 20030094909
    Abstract: To advantageously eliminate the disadvantage of attenuation of the radiant light from dielectric barrier discharge lamps by a UV transmission component, a treatment device using dielectric barrier discharge lamps is provided with a lamp chamber in which dielectric barrier discharge lamps are located and in which there is an inert gas atmosphere; a treatment chamber, in which an article to be treated is located, is provided with a treatment gas atmosphere, and a UV transmission component by which the lamp chamber and the treatment chamber are separated from one another. In each of the lamp chamber and the treatment chamber there are devices for determining the gas pressure within the respective chamber, a supply arrangement for delivering gas to the inside the respective chamber and an arrangement for discharging gas from the respective chamber.
    Type: Application
    Filed: November 13, 2002
    Publication date: May 22, 2003
    Applicant: Ushiodenki Kabushiki Kaisha
    Inventor: Nobuyuki Hishinuma
  • Patent number: 6525451
    Abstract: To enable the easy and adequately reliable cleaning of the inner surface of the chamber material, and as a result, to provide a dielectric barrier discharge lamp with good lighting characteristics and simplicity of manufacture, a dielectric barrier discharge lamp having a discharge chamber with a cylindrical, double-tube construction with an outer tube and an inner tube, in which the cylindrical discharge space formed between the outer tube and the inner tube is filled with a discharge gas in which excimer molecules are formed by a dielectric barrier discharge, two or more fluid distribution tube remnants connecting to each discharge chamber. It is preferable that the dielectric barrier discharge lamp described above have two or more fluid distribution tube remnants formed on opposite ends of the discharge chamber.
    Type: Grant
    Filed: July 5, 2000
    Date of Patent: February 25, 2003
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventors: Nobuyuki Hishinuma, Kunio Kasagi, Masahide Kiyose