Abstract: An object of the invention is to provide a coreless linear motor which can suppress the increase in the temperature of an armature winding.

Abstract: An object of the invention is to provide a coreless linear motor which can suppress the increase in the temperature of an armature winding.

Abstract: Fine patterns with the targeted line widths are formed with a high accuracy by correcting any change in image of a light-attenuating part of a density filter on a substrate arising along with a change in illumination conditions on a reticle by adjusting an amount of defocus of the density filter with respect to a reticle conjugate plane.

Abstract: An exposure method for preventing accumulation of process error for substrates processed by an apparatus designed for multiprocessing and producing high quality semiconductor chips. A semiconductor integrated circuit production line polishes wafers of individual lots at a first processing system and second processing system of a CMP system two at a time. Wafer processing information indicating at which processing system of the first processing system and second processing system each wafer has been processed is transmitted through a communication line to a later processing apparatus including an exposure apparatus. The wafers of a lot loaded in the exposure apparatus are allocated to a plurality of processing systems of the exposure apparatus so that wafers processed by the same processing system are processed by the same processing system among the two processing systems of the exposure apparatus and are exposed at those processing systems.

Abstract: Fine patterns with the targeted line widths are formed with a high accuracy by correcting any change in image of a light-attenuating part of a density filter on a substrate arising along with a change in illumination conditions on a reticle by adjusting an amount of defocus of the density filter with respect to a reticle conjugate plane.

Abstract: A stitching type exposure apparatus for successively exposing an image of a pattern of a reticle (Ri) on different areas of a surface of a substrate (4) while overlaying parts of the same, wherein a density filter (Fj) having a light attenuating part for reducing the amount of light of overlaid parts of the image of the pattern in a sloping manner is provided in the vicinity of the reticle (Ri), the density filter (Fj) is held at a filter stage (FS) for adjusting the posture, the posture of the density filter (Fj) is detected by an illumination uniformity sensor (126) on the substrate stage (6), and the posture of the density filter (Fj) is matched with the posture of the reticle (Ri) by the filter stage (FS).

Abstract: A linear motor excellent in insulation between armature coils, easy to assemble, very small in thrust ripple, comprising a secondary side supporter attached with a secondary side consisting of a plurality of magnetic field poles, and an armature element supporter facing the secondary side via a clearance and provided with an armature element (4) having a plurality of concentrate-wound armature coils (6), the secondary side and the armature element (4) being disposed facing each other and in parallel in the advancing direction, wherein field poles in the secondary side are disposed in the advancing direction of a mover with adjacent poles being unlike every Pm pitches, and a plurality of armature coils (6) are disposed in an array in the advancing direction of the mover every Pc pitches, the coil pitch Pc=5/3×Pm.

Abstract: A canned linear motor such that increase of the temperature of the mover is suppressed, the viscous damping force is reduced, and the strength of the can does not deteriorate. A canned linear motor comprises two parts, in one of which a permanent magnet is provided as a field system and in the other of which a three-phase armature winding, a winding fixing frame for supporting the armature winding, a coolant passage through which a coolant for cooling the surface of the armature winding passes, a can (14) covering the armature winding and the coolant passage, and a header (14′) for sealing the can. Slits (151, 152) extending in the direction of travel and parallel to each other are formed in the can (14).

Abstract: A pattern enlarged from a transfer pattern is divided into patterns (Pi) of a plurality of master reticles (Ri). Images of the patterns (Pi) of the plurality of master reticles (Ri) reduced by a projection optical system are successively projected and exposed on the surface of a blank (mask substrate) while stitching. Marks (M1, M2) indicating identification information for identifying a master reticle from another master reticle, transfer positions, etc. are formed on the master reticles (Ri). These marks (M1, M2) are detected before the exposure and exposure is performed in accordance with the information on the transfer position etc. shown by the marks (M1, M2) or reticle information (exposure conditions, various correction values, etc.) relating to the master reticles stored and held in advance corresponding to the identification information. The number of work steps when producing a working reticle using the plurality of master reticles is reduced and occurrence of work errors can be prevented.

Abstract: A pattern enlarged from a transfer pattern is divided into patterns (Pi) of a plurality of master reticles (Ri). Images of the patterns (Pi) of the plurality of master reticles (Ri) reduced by a projection optical system are successively-projected and exposed on the surface of a blank (mask substrate) while stitching. Marks (M1, M2) indicating identification information for identifying a master reticle from another master reticle, transfer positions, etc. are formed on the master reticles (Ri). These marks (M1, M2) are detected before the exposure and exposure is performed in accordance with the information on the transfer position etc. shown by the marks (M1, M2) or reticle information (exposure conditions, various correction values, etc.) relating to the master reticles stored and held in advance corresponding to the identification information. The number of work steps when producing a working reticle using the plurality of master reticles is reduced and occurrence of work errors can be prevented.

Abstract: An exposure method for preventing accumulation of process error for substrates processed by an apparatus designed for multiprocessing and producing high quality semiconductor chips. A semiconductor integrated circuit production line polishes wafers of individual lots at a first processing system and second processing system of a CMP system two at a time. Wafer processing information indicating at which processing system of the first processing system of second processing system each wafer has been processed is transmitted through a communication line to a later processing apparatus including an exposure apparatus. The wafers of a lot loaded in the exposure apparatus are allocated to a plurality of processing systems of the exposure apparatus so that wafers processed by the same processing system are processed by the same processing system among the two processing systems of the exposure apparatus and are exposed at those processing systems.

Abstract: A method of exposure while gradually reducing the exposure at peripheral parts when transferring patterns to a plurality of areas on a substrate where the peripheral parts are partially superposed, including exposing one shot area of the substrate through a density filter set so that the energy at the peripheral parts becomes a predetermined first distribution, measuring the distribution of exposure at portions corresponding to the peripheral parts on the substrate, determining a second distribution where the exposure at the peripheral parts becomes a target value based on the measured distribution of exposure, and exposes the shot areas adjoining the one shot area through a density filter set to give the second distribution.

Abstract: An exposure apparatus exposes, for example, a substrate for production of a working reticle through a master reticle on which a pattern is formed. The apparatus is provided with three support members for supporting the substrate substantially horizontally at three locations outside illuminated areas of the substrate, e.g., a pattern area, alignment mark areas, and information mark areas.

Abstract: An exposure method which irradiates a slit-shaped illumination light IL on a reticle Ri and a substrate while moving them synchronously so as to sequentially transfer images of patterns formed on the reticle Ri to the substrate 4, wherein a density filter Fj having an attenuating part for gradually reducing the distribution of illuminance of the illumination light IL is moved in synchronization with the movement of the reticle Ri.

Abstract: A canned linear motor such that increase of the temperature of the mover is suppressed, the viscous damping force is reduced, and the strength of the can does not deteriorate. A canned linear motor comprises two parts, in one of which a permanent magnet is provided as a field system and in the other of which a three-phase armature winding, a winding fixing frame for supporting the armature winding, a coolant passage through which a coolant for cooling the surfaced of the armature winding passes, a can (14) covering the armature winding and the coolant passage, and a header (14′) for sealing the can. Slits (151, 152) extending in the direction of travel and parallel to each other are formed in the can (14).

Abstract: A method of exposure projecting and exposing a pattern formed on a mask on to a photosensitive substrate through a projection optical system, comprising the steps of measuring a position of an image projected by said projection optical system; and projecting and exposing said pattern of the mask in a state with imaging characteristics corrected to reduce an amount of offset of a position of said projected image from an ideal position.

Abstract: An exposure method which irradiates a slit-shaped illumination light IL on a reticle Ri and a substrate while moving them synchronously so as to sequentially transfer images of patterns formed on the reticle Ri to the substrate 4, wherein a density filter Fj having an attenuating part for gradually reducing the distribution of illuminance of the illumination light IL is moved in synchronization with the movement of the reticle Ri.

Abstract: An exposure apparatus for exposing for example a substrate for production of a working reticle through a master reticle on which a pattern is formed, provided with three support members for supporting the substrate substantially horizontally at three locations outside illuminated areas of the substrate (pattern area, alignment mark areas, and information mark areas).

Abstract: A method of exposure while gradually reducing the exposure at peripheral parts when transferring patterns to a plurality of areas on a substrate where the peripheral parts are partially superposed, including exposing one shot area of the substrate through a density filter set so that the energy at the peripheral parts becomes a predetermined first distribution, measuring the distribution of exposure at portions corresponding to the peripheral parts on the substrate, determining a second distribution where the exposure at the peripheral parts becomes a target value based on the measured distribution of exposure, and exposes the shot areas adjoining the one shot area through a density filter set to give the second distribution.

Abstract: The control system of the present invention is provided for a hybrid vehicle with an engine, a motor, and a power storage unit. The control system selects one of an air intake passage pressure assist mode (PB assist mode) corresponding to a partial load range of the engine and a throttle assist mode corresponding to the opening state of a throttle.