Abstract: A method for manufacturing a film structure includes: a positional deviation amount detection process of detecting an amount of positional deviation related to a relative position of a second cured film formed on a rear surface of a film with respect to a first cured film formed on a front surface of the film; a relative position adjustment process of correcting a position or a rotation speed of a second transfer roll to adjust the relative position such that the amount of positional deviation detected in the positional deviation amount detection process is reduced; a first tensile force detection process and a second tensile force detection process of respectively detecting a tensile force of the film between a first pressurizing roll and a second pressurizing roll before and after the relative position adjustment process; and a tensile force adjustment process of adjusting the tensile force of the film such that the tensile force of the film detected in the second tensile force detection process approaches

Abstract: A method for manufacturing a film structure includes: a positional deviation amount detection process of detecting an amount of positional deviation related to a relative position of a second cured film formed on a rear surface of a film with respect to a first cured film formed on a front surface of the film; a relative position adjustment process of correcting a position or a rotation speed of a second transfer roll to adjust the relative position such that the amount of positional deviation detected in the positional deviation amount detection process is reduced; a first tensile force detection process and a second tensile force detection process of respectively detecting a tensile force of the film between a first pressurizing roll and a second pressurizing roll before and after the relative position adjustment process; and a tensile force adjustment process of adjusting the tensile force of the film such that the tensile force of the film detected in the second tensile force detection process approaches

Abstract: A film structural member includes a recessed portion on a transparent substrate, metal wiring on a base of the recessed portion, and a particle layer on the metal wiring. The particle layer is configured as an aggregate of particles having an average particle diameter of 300 nm or smaller.

Abstract: A film structural member includes a recessed portion formed on a transparent substrate, metal wiring provided on a base of the recessed portion, and a particle layer that is provided on the metal wiring and is configured as an aggregate of particles having an average particle diameter of 300 nm or smaller.

Abstract: A processing apparatus includes a rotary table that causes a workpiece to rotate around a rotary axis, a roller-shaped member that rotates on an axis orthogonal to the rotary axis of the rotary table, a vertical driving section that is driven in a direction of the rotary axis of the rotary table so as to bring the roller-shaped member and the workpiece into contact with each other, an ultraviolet ray irradiation source that irradiates a portion between the roller-shaped member and the workpiece with an ultraviolet ray, a polishing material that is supplied to the portion between the roller-shaped member and the workpiece, and a light scattering medium that is supplied to the portion between the roller-shaped member and the workpiece and scatters an ultraviolet ray from the ultraviolet ray irradiation source.

Abstract: A processing apparatus includes a rotary table that causes a workpiece to rotate around a rotary axis, a roller-shaped member that rotates on an axis orthogonal to the rotary axis of the rotary table, a vertical driving section that is driven in a direction of the rotary axis of the rotary table so as to bring the roller-shaped member and the workpiece into contact with each other, an ultraviolet ray irradiation source that irradiates a portion between the roller-shaped member and the workpiece with an ultraviolet ray, a polishing material that is supplied to the portion between the roller-shaped member and the workpiece, and a light scattering medium that is supplied to the portion between the roller-shaped member and the workpiece and scatters an ultraviolet ray from the ultraviolet ray irradiation source.

Abstract: Disclosed is a polycrystalline-type silicon solar cell which can be produced at low cost by forming a polycrystalline silicon film having a PN junction in a simple manner. Specifically, an amorphous silicon film produced by sputtering using a dopant-containing silicon target is polycrystallized with plasma, and a PN junction is formed in the amorphous silicon film, thereby producing a polycrystalline silicon film having a PN junction. The polycrystalline silicon film having a PN junction is used as a silicon substrate for a polycrystalline-type silicon solar cell. Also disclosed is a technique for producing a dopant-containing silicon target from a silicon ingot.

Abstract: A first layer which has a surface including a diffraction grating part having a plurality of fine concavities and convexities and a second layer which is embedded in the diffraction grating part with no space therebetween are formed on a transparent substrate. A recess part having a fixed width is formed on the outer periphery of the first layer. An outer fence part having a fixed width is formed on the outer periphery of the recess part. The second layer is also embedded in the recess part.

Abstract: Disclosed is a polycrystalline-type silicon solar cell which can be produced at low cost by forming a polycrystalline silicon film having a PN junction in a simple manner. Specifically, an amorphous silicon film produced by sputtering using a dopant-containing silicon target is polycrystallized with plasma, and a PN junction is formed in the amorphous silicon film, thereby producing a polycrystalline silicon film having a PN junction. The polycrystalline silicon film having a PN junction is used as a silicon substrate for a polycrystalline-type silicon solar cell. Also disclosed is a technique for producing a dopant-containing silicon target from a silicon ingot.

Abstract: Disclosed is a process for producing a silicon powder, which comprises the steps of: powderizing a silicon ingot having a grade of 99.999% or more into a crude silicon powder having a particle diameter of 3 mm or less by means of high-pressure purified-water cutting; and reducing the crude silicon powder into a silicon powder having a particle diameter ranging from 0.01 to 10 [mu]m inclusive by means of at least one method selected from jet milling, wet granulation, ultrasonic wave disruption and shock wave disruption. The process is a technique for producing a silicon powder rapidly from a silicon ingot without reducing purity.

Abstract: The present invention provides a front panel for a plasma display panel which can suppress the incidence of chipping of the barrier rib of a rear panel for a PDP, can enhance the stability of initial electron emission in a dielectric layer, and can reduce a voltage required for maintaining a wall charge. The front panel for a plasma display panel includes a substrate, a plurality of electrodes formed on the substrate, a dielectric layer formed to cover the respective electrodes and the substrate, a dielectric-protection layer formed to cover the dielectric layer, and powder components dispersed on the dielectric-protection layer, wherein an annealed layer having a thickness of 10 to 300 nm is formed on at least the exposed surface of each of the powder components, wherein said exposed surface does not contact the dielectric-protection layer.

Abstract: The present invention provides a front panel for a plasma display panel which can suppress the incidence of chipping of the barrier rib of a rear panel for a PDP, can enhance the stability of initial electron emission in a dielectric layer, and can reduce a voltage required for maintaining a wall charge. The front panel for a plasma display panel includes a substrate, a plurality of electrodes formed on the substrate, a dielectric layer formed to cover the respective electrodes and the substrate, a dielectric-protection layer formed to cover the dielectric layer, and powder components dispersed on the dielectric-protection layer, wherein an annealed layer having a thickness of 10 to 300 nm is formed on at least the exposed surface of each of the powder components, wherein said exposed surface does not contact the dielectric-protection layer.

Abstract: A method for producing a polymer electrolyte membrane type fuel cell including a polymer electrolyte membrane, fuel and air electrodes that sandwich therebetween the polymer electrolyte membrane and that each include a gas diffusion layer and a catalyst layer provided in contact with the polymer electrolyte membrane, and separators provided in contact with the gas diffusion layers. A paste containing at least a carbon powder having a catalyst supported thereon is spread over a predetermined support, and the coated support is dried to form the catalyst layer. A cracking occupation area on the electrodes is controlled to a predetermined tolerance by controlling at least one of (1) a thickness of the catalyst layer, (2) a kind of carbon having the catalyst supported thereon, and (3) a drying rate of a solvent of the paste.

Abstract: A method of producing a membrane-electrode assembly for a fuel cell remarkably enhances the productivity and properties of fuel cell. There are provided in the method a first catalyst layer forming step of spreading a first coating compound over a running substrate to form a first catalyst layer, an electrolyte forming step of spreading a second coating compound over said first catalyst layer while the first catalyst layer is wet to form an electrolyte layer, a drying step of drying the electrolyte layer, and a second catalyst layer forming step of spreading a third coating compound having a noble metal supported thereon over the dried electrolyte layer to form a second catalyst layer.

Abstract: A method for producing a polymer electrolyte membrane type fuel cell including a polymer electrolyte membrane, fuel and air electrodes that sandwich therebetween the polymer electrolyte membrane and that each include a gas diffusion layer and a catalyst layer provided in contact with the polymer electrolyte membrane, and separators provided in contact with the gas diffusion layers. A paste containing at least a carbon powder having a catalyst supported thereon is spread over a predetermined support, and the coated support is dried to form the catalyst layer. A cracking occupation area on the electrodes is controlled to a predetermined tolerance by controlling at least one of (1) a thickness of the catalyst layer, (2) a kind of carbon having the catalyst supported thereon, and (3) a drying rate of a solvent of the paste.

Abstract: A method of producing electrodes for a battery, characterized by comprising the steps of:

Abstract: A stripe coating applicator for coating at least two stripes having a plurality of slit outlets provided at a nozzle edge and a pair of block edges forming said slit outlets. Stripe partitions partition and define the plurality of slit outlets formed at the pair of block edges. Notches are formed on at least one of said block edges toward a direction of the coating fluid to be discharged and correspond to the positions of the stripe partitions. Movable parts are formed at the at least one of said block edges where the notches are provided. The notches and thin parts form the movable parts. A slit gap adjustment means is provided for adjusting slit gaps by moving the movable parts.