Patents by Inventor Nobuyuki Kita

Nobuyuki Kita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4523597
    Abstract: The apparatus and method for measuring the intraocular pressure of an eyeball is constructed so that the image of the fluorescent ring around the flattened surface of the eyeball is formed to measure the area of the flattened surface, and that the intraocular pressure of the eyeball is calculated in accordance with the pressure against the eyeball and the area of the flattened surface corresponding thereto.
    Type: Grant
    Filed: December 29, 1983
    Date of Patent: June 18, 1985
    Assignee: Minolta Camera Kabushiki Kaisha
    Inventors: Seiji Sawa, Nobuyuki Kita
  • Patent number: 4500625
    Abstract: A developer for a light-sensitive lithographic printing plate having an o-quinonediazide-containing light-sensitive layer is disclosed. The developer is comprised of an aqueous solution of an alkali silicate containing an organic boron compound. The organic boron compound is represented by the formula ##STR1## the substituents are defined within the specification. By utilizing the developer of the invention it is possible to provide excellent developing power, development stability, processability and preferred forming properties during development.
    Type: Grant
    Filed: November 4, 1983
    Date of Patent: February 19, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobuyuki Kita, Hiroshi Matsumoto, Hitoshi Hagiwara
  • Patent number: 4469776
    Abstract: A developing solution for a light-sensitive printing plate having an o-quinonediazide-containing light-sensitive layer is disclosed. The developing solution is comprized of an aqueous solution of alkali silicate and a chelating agent. By including the chelating agent within the developing solution it is possible to carry out development utilizing water which contains typical impurities such as insoluble calcium silicate or magnesium silicate for a long period of time which substantially has no formation of insoluble matter within the developing machine. Use of the developing solution substantially eliminate the formation of any deposit within the spraying pipes and nozzles of the developing machine which it is used in connection with.
    Type: Grant
    Filed: April 29, 1983
    Date of Patent: September 4, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroshi Matsumoto, Nobuyuki Kita
  • Patent number: 4336319
    Abstract: A light-solubilizable composition comprising at least one o-quinonediazide compound and at least one alkali-soluble resin compatible therewith as essential components and containing fine particles dispersed therein which:(1) have an average particle size of 500 m.mu. or less;(2) are insoluble in an organic solvent used to coat the light-solubilizable composition and have a hydrophobic surface;(3) are transparent or white; and(4) have a refractive index of 1.3 to 1.7,in an amount of 0.1 to 50% by weight based on said light-solubilizable composition.
    Type: Grant
    Filed: October 22, 1980
    Date of Patent: June 22, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akira Nagashima, Nobuyuki Kita
  • Patent number: 4275138
    Abstract: A photosensitive composition is prepared comprising a diazonium compound and a polymer containing at least 50% by weight of the recurring unit represented by the following general formula (I): ##STR1## wherein R.sub.1 represents hydrogen atom or methyl group, R.sub.2 represents hydrogen atom or a methyl, ethyl or chloromethyl group and n is an integer of 1 to 10.
    Type: Grant
    Filed: September 14, 1976
    Date of Patent: June 23, 1981
    Assignees: Fuji Photo Film Co., Ltd., National Patent Development Corp.
    Inventors: Nobuyuki Kita, Yasuhisa Narutomi
  • Patent number: 4239850
    Abstract: A photopolymerizable composition comprising a polymerizable ethylenically unsaturated compound, optionally, a linear organic polymer, and a photopolymerization initiator comprising a combination of a compound represented by the general formula (I) ##STR1## wherein Z represents the non-metal atomic group necessary to form a nitrogen containing heterocyclic nucleus, R.sub.1 represents an alkyl group or a substituted alkyl group, and R.sub.2 represents an alkyl group or an aryl group having a comparatively high photopolymerization initiating ability; and a compound represented by the general formula (II) ##STR2## wherein X represents a halogen atom, Y represents --CX.sub.3, --NH.sub.2, --NHR.sup.1, --NR.sup.1.sub.2 or OR.sup.1, R.sup.1 represents an alkyl group or an aryl group and R represents an alkyl group, an alkyl group substituted with at least one chlorine atom, an aryl group, a substituted aryl group or a substituted alkenyl group.
    Type: Grant
    Filed: November 22, 1978
    Date of Patent: December 16, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobuyuki Kita, Toshio Uchida, Sadaharu Ikeda, Shigeru Sato
  • Patent number: 4233393
    Abstract: A silver halide photosensitive material capable of providing a relief image after imagewise exposure, tanning development and washing off the non-exposed portions comprising a support having thereon a silver halide emulsion layer, in which the silver halide emulsion layer has thereon a synthetic resin layer which is substantially insoluble in water and permeable to water and has an oleophilic surface.
    Type: Grant
    Filed: July 24, 1978
    Date of Patent: November 11, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keisuke Shiba, Nobuyuki Kita
  • Patent number: 4123276
    Abstract: A photosensitive composition is prepared comprising (a) a copolymer having an acid value of 10 to 100 and containing structural units represented by the following general formula I ##STR1## where R.sub.1 represents a hydrogen atom or methyl group, R.sub.2 represents a hydrogen atom, methyl group, ethyl group or chloromethyl group, and n is an integer of from 1 to 10, inclusive, and structural units represented by the following general formula II ##STR2## where, in the formula, R.sub.3 represents a hydrogen atom or methyl group, and(b) a diazo compound and, optionally,(c) a resin having hydrophilic groups.
    Type: Grant
    Filed: January 18, 1977
    Date of Patent: October 31, 1978
    Assignees: Fuji Photo Film Co., Ltd., National Patent Development Corporation
    Inventors: Nobuyuki Kita, Yasuhisa Narutomi
  • Patent number: 4115128
    Abstract: A radiation-sensitive composition capable of producing a positive image upon exposure to actinic radiation and subsequent treatment with a basic solution which comprises (a) an o-naphthoquinone diazide compound, (b) an alkali soluble film-forming phenolic resin and (c) an organic acid cyclic anhydride.
    Type: Grant
    Filed: December 17, 1976
    Date of Patent: September 19, 1978
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Nobuyuki Kita
  • Patent number: 4047807
    Abstract: A diaphragm device in which a plurality of diaphragm blades are arranged in partly overlapping relation to one another. This diaphragm device provides a diaphragm aperture of a substantially elongated circle having its length extending in a specific direction, when stopped down beyond a given diaphragm aperture. More particularly, the diaphragm aperture is defined by a pair of arcs which oppose each other in a direction perpendicular to the specific direction passing through the center of the aperture and another pair of arcs which are disposed on the opposite sides in the aforesaid specific direction, while the distance of either one of the pair of arcs to the center of the aperture is shorter than the distance of either of the other pair of arcs to the center of the aperture. These pairs of arcs define portions of the inner peripheral edges of the diaphragm blades.
    Type: Grant
    Filed: December 24, 1975
    Date of Patent: September 13, 1977
    Assignee: Minolta Camera Kabushiki Kaisha
    Inventors: Yukio Okano, Nobuyuki Kita, Kyozo Uesugi