Abstract: A photosensitive lithographic printing plate comprising a substrate having provided on the surface thereof a photosensitive layer through a layer which is formed by coating and drying a composition prepared by hydrolyzing and polycondensing a compound represented by formula (I) in a solvent having dissolved therein a phenol having a molecular weight of 1,000 or less or an organic phosphoric acid compound:A.sub.m M(R).sub.n (I)wherein M represents silicon, aluminum, titanium or zirconium, A represents a hydrogen atom, an alkyl group, an aryl group, an alkenyl group, a propargyl group, an alkoxy group, an epoxyalkyl group, a silyl group, a siloxy group or a functional group capable of addition reaction by a radical, m and n each represents 0 or a positive integer, provided that m+n=3 or 4, and R represents one of the groups (a) to (e) defined in the specification.

Abstract: A negative photosensitive lithographic printing plate comprising an aluminum or organic polymer support having a surface roughness Ra of 0.25 to 0.60 .mu.m and having provided thereon a photopolymerizable photosensitive layer comprising a polymerizable monomer, a photopolymerization initiator and a sensitizer having an absorbing wavelength of 400 to 1,000 nm, wherein the support has a functional group on its surface at the side of the photosensitive layer, and wherein the functional group has an unsaturated bond which can undergo a radical addition reaction and an Si atom which covalently bonds to an aluminum atom, an Si atom, or a carbon atom in the support via an oxygen atom.

Abstract: A PS plate comprises an aluminum substrate having anodized layers on both sides, a photosensitive layer on one side of the substrate and a coating layer of a metal oxide obtained by hydrolyzing and polycondensing an organic or inorganic metal compound on the side of the substrate opposite to that carrying the photosensitive layer. The PS plate is processed by a method comprising the steps of imagewise exposing it to light and then developing the imagewise exposed plate with an alkali aqueous solution containing an alkali metal silicate and having a pH of not less than 12. The PS plate and the method for processing the same permit substantial reduction of the amount of a replenisher for development to be supplemented and ensure a stable processing of the plate over a long time period without accompanying formation of insolubles in a developer. The PS plates never cause adhesion and peeling off of the photosensitive layers even when they are put in stacks.

Abstract: The present invention relates to a process for treating a metal surface wherein a liquid composition comprising an inorganic polymer is applied to the metal surface. The inorganic polymer is produced by hydrolyzing and then polycondensing, in an organic solvent, an organometallic compound having an organic functional group and a group capable of being hydrolyzed and then polycondensed in an organic solvent.According to the present invention, the metal surface per se is made chemically reactive by fixing functional groups on the metal surface an is very useful, for example, as a support for making a presensitized lithographic plate.