Patents by Inventor Noel Corcoran

Noel Corcoran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for performing model-based layout conversion for use with dipole illumination
    Patent number: 7985515
    Abstract: A method of generating complementary masks for use in a multiple-exposure lithographic imaging process.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: July 26, 2011
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran
  • METHOD AND APPARATUS FOR PERFORMING MODEL-BASED LAYOUT CONVERSION FOR USE WITH DIPOLE ILLUMINATION
    Publication number: 20100167183
    Abstract: A method of generating complementary masks for use in a multiple-exposure lithographic imaging process.
    Type: Application
    Filed: December 3, 2009
    Publication date: July 1, 2010
    Inventors: Duan-Fu Stephen HSU, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran
  • Orientation dependent shielding for use with dipole illumination techniques
    Patent number: 7725872
    Abstract: A method of printing a pattern having vertically oriented features and horizontally oriented features on a substrate utilizing dipole illumination, which includes the steps of: identifying background areas contained in the pattern; generating a vertical component mask comprising non-resolvable horizontally oriented features in the background areas; generating a horizontal component mask comprising non-resolvable vertically oriented features in the background areas; illuminating said vertical component mask utilizing an X-pole illumination; and illuminating said horizontal component mask utilizing a Y-pole illumination.
    Type: Grant
    Filed: May 3, 2007
    Date of Patent: May 25, 2010
    Assignee: ASML Masktools, B.V.
    Inventors: Stephen Duan-Fu Hsu, Noel Corcoran, Jang Fung Chen
  • Method and apparatus for performing model-based layout conversion for use with dipole illumination
    Patent number: 7666554
    Abstract: A method of generating complementary masks for use in a multiple-exposure lithographic imaging process.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: February 23, 2010
    Assignee: ASML Masktools, B.V.
    Inventors: Duan-Fu Stephen Hsu, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran
  • Method for performing pattern pitch-split decomposition utilizing anchoring features
    Patent number: 7617476
    Abstract: A method for decomposing a target pattern containing features to be printed on a wafer into multiple patterns. The method includes the steps of: (a) determining a minimum critical dimension and pitch associated with a process to be utilized to image the multiple patterns; (b) generating an anchoring feature; (c) disposing the anchoring feature adjacent a first feature of the target pattern; (d) growing the anchoring feature a predetermined amount so as to define a first area; (e) assigning any feature within the first area to a first pattern; (f) disposing the anchoring feature adjacent a second feature of the target pattern; (g) growing the anchoring feature the predetermined amount so as to define a second area; and (h) assigning any feature within the second area to a second pattern. Steps (c)-(h) are then repeated until the densely spaced features within the target pattern have been assigned to either the first or second pattern.
    Type: Grant
    Filed: September 13, 2007
    Date of Patent: November 10, 2009
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Noel Corcoran, Jang Fung Chen, Douglas Van Den Broeke
  • Method for performing pattern pitch-split decomposition utilizing anchoring features
    Publication number: 20080092106
    Abstract: A method for decomposing a target pattern containing features to be printed on a wafer into multiple patterns. The method includes the steps of: (a) determining a minimum critical dimension and pitch associated with a process to be utilized to image the multiple patterns; (b) generating an anchoring feature; (c) disposing the anchoring feature adjacent a first feature of the target pattern; (d) growing the anchoring feature a predetermined amount so as to define a first area; (e) assigning any feature within the first area to a first pattern; (f) disposing the anchoring feature adjacent a second feature of the target pattern; (g) growing the anchoring feature the predetermined amount so as to define a second area; and (h) assigning any feature within the second area to a second pattern. Steps (c)-(h) are then repeated until the densely spaced features within the target pattern have been assigned to either the first or second pattern.
    Type: Application
    Filed: September 13, 2007
    Publication date: April 17, 2008
    Inventors: Duan-Fu Hsu, Noel Corcoran, Jang Chen, Douglas Van Den Broeke
  • Orientation dependent shielding for use with dipole illumination techniques
    Publication number: 20070214448
    Abstract: A method of printing a pattern having vertically oriented features and horizontally oriented features on a substrate utilizing dipole illumination, which includes the steps of: identifying background areas contained in the pattern; generating a vertical component mask comprising non-resolvable horizontally oriented features in the background areas; generating a horizontal component mask comprising non-resolvable vertically oriented features in the background areas; illuminating said vertical component mask utilizing an X-pole illumination; and illuminating said horizontal component mask utilizing a Y-pole illumination.
    Type: Application
    Filed: May 3, 2007
    Publication date: September 13, 2007
    Inventors: Stephen Hsu, Noel Corcoran, Jang Chen
  • Orientation dependent shielding for use with dipole illumination techniques
    Patent number: 7246342
    Abstract: A method of printing a pattern having vertically oriented features and horizontally oriented features on a substrate utilizing dipole illumination, which includes the steps of: identifying background areas contained in the pattern; generating a vertical component mask comprising non-resolvable horizontally oriented features in the background areas; generating a horizontal component mask comprising non-resolvable vertically oriented features in the background areas; illuminating said vertical component mask utilizing an X-pole illumination; and illuminating said horizontal component mask utilizing a Y-pole illumination.
    Type: Grant
    Filed: July 25, 2003
    Date of Patent: July 17, 2007
    Assignee: ASML Masktools B.V.
    Inventors: Stephen Duan-Fu Hsu, Noel Corcoran, Jang Fung Chen
  • Method and apparatus for performing model-based layout conversion for use with dipole illumination
    Publication number: 20070042277
    Abstract: A method of generating complementary masks for use in a multiple-exposure lithographic imaging process.
    Type: Application
    Filed: October 27, 2006
    Publication date: February 22, 2007
    Applicant: ASML Masktools B.V.
    Inventors: Duan-Fu Hsu, Kurt Wampler, Markus Antonius Eurlings, Jang Chen, Noel Corcoran
  • Method and apparatus for performing model-based layout conversion for use with dipole illumination
    Patent number: 7138212
    Abstract: A method of generating complementary masks for use in a multiple-exposure lithographic imaging process.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: November 21, 2006
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran
  • Method and apparatus for performing rule-based gate shrink utilizing dipole illumination
    Patent number: 6915505
    Abstract: A method of printing a gate pattern on a substrate comprising the steps of: identifying at least one area in the pattern in which one of the gate features overlays one of the active regions; reducing a width dimension of the one of the gate features at the location which the one of the gate features overlays the one of the active regions; extracting the gate features from the pattern; decomposing the gate features into a vertical component mask and a horizontal component mask; and illuminating the vertical component mask and the horizontal component mask utilizing dipole illumination.
    Type: Grant
    Filed: March 25, 2003
    Date of Patent: July 5, 2005
    Assignee: ASML Masktools B.V.
    Inventors: Stephen D. Hsu, Noel Corcoran, Jang Fung Chen
  • Orientation dependent shielding for use with dipole illumination techniques
    Publication number: 20050102648
    Abstract: A method of printing a pattern having vertically oriented features and horizontally oriented features on a substrate utilizing dipole illumination, which includes the steps of: identifying background areas contained in the pattern; generating a vertical component mask comprising non-resolvable horizontally oriented features in the background areas; generating a horizontal component mask comprising non-resolvable vertically oriented features in the background areas; illuminating said vertical component mask utilizing an X-pole illumination; and illuminating said horizontal component mask utilizing a Y-pole illumination.
    Type: Application
    Filed: July 25, 2003
    Publication date: May 12, 2005
    Inventors: Stephen Hsu, Noel Corcoran, Jang Chen
  • Method and apparatus for performing model-based layout conversion for use with dipole illumination
    Publication number: 20040142251
    Abstract: A method of generating complementary masks for use in a multiple-exposure lithographic imaging process.
    Type: Application
    Filed: November 12, 2003
    Publication date: July 22, 2004
    Inventors: Duan-Fu Stephen Hsu, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran
  • Method and apparatus for performing rule-based gate shrink utilizing dipole illumination
    Publication number: 20040003368
    Abstract: A method of printing a gate pattern on a substrate comprising the steps of: identifying at least one area in the pattern in which one of the gate features overlays one of the active regions; reducing a width dimension of the one of the gate features at the location which the one of the gate features overlays the one of the active regions; extracting the gate features from the pattern; decomposing the gate features into a vertical component mask and a horizontal component mask; and illuminating the vertical component mask and the horizontal component mask utilizing dipole illumination.
    Type: Application
    Filed: March 25, 2003
    Publication date: January 1, 2004
    Inventors: Stephen D. Hsu, Noel Corcoran, Jang Fung Chen