Patents by Inventor Noel Magnea

Noel Magnea has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7285378
    Abstract: The invention relates to a structure composed of a substrate wherein a surface supports juxtaposed islands, characterized in that the islands rest on a periodic network of terraces composed of the intersection of two step networks, each terrace having a first dimension corresponding to the step width of one of the step networks and a second dimension corresponding to the step width of the other step network, each terrace supporting at least two islands formed of a different superimposition of monolayers wherein the composition is chosen between at least one first composition and one second composition.
    Type: Grant
    Filed: June 4, 2002
    Date of Patent: October 23, 2007
    Assignee: Commissariat a l'Energie Atomique
    Inventors: David Martrou, Noël Magnea
  • Patent number: 7229897
    Abstract: Method for producing a stacked structure by obtaining at least two crystalline parts by detaching them from a same initial structure, each crystalline part having one face created by the detachment having a tilt angle with a reference crystalline plane of the initial structure. Structures are formed from the crystalline parts, each structure having a face to be assembled that has a controlled tilt angle in relation to the tilt angle of the created face of the corresponding crystalline part. The structures are assembled while controlling their relative positions, rotating in an interface plane, in relation to relative positions of respective crystalline parts within the initial structure, to obtain a controlled resulting tilt angle at the interface between the structures. The method may find application particularly in microelectronics, optics, and optoelectronics.
    Type: Grant
    Filed: December 27, 2001
    Date of Patent: June 12, 2007
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Franck Fournel, Hubert Moriceau, Marc Zussy, Noel Magnea
  • Patent number: 7041227
    Abstract: A process for permitting defects or stresses in a structure to be revealed, including (a) securing by molecular bonding of a face of a first element containing crystalline material with a face of a second element containing crystalline material, so that the faces have offset crystalline lattices, the securing causing the formation of a lattice of crystalline defects and/or stress fields in a crystalline zone next to the securing interface, and (b) reducing the thickness of one of the elements until at least a thin film is obtained which adheres to the other element, along the securing interface to form the structure, the thickness of the thin film being such that its free face does not reveal the crystalline defect lattice and/or the stress fields, but allowing to perform (c) treatment of the thin film resulting in that its free face reveals the crystalline defect lattice and/or the stress fields.
    Type: Grant
    Filed: October 5, 2001
    Date of Patent: May 9, 2006
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Franck Fournel, Hubert Moriceau, Noël Magnea
  • Publication number: 20050101095
    Abstract: Method for producing a stacked structure by obtaining at least two crystalline parts by detaching them from a same initial structure, each crystalline part having one face created by the detachment having a tilt angle with a reference crystalline plane of the initial structure. Structures are formed from the crystalline parts, each structure having a face to be assembled that has a controlled tilt angle in relation to the tilt angle of the created face of the corresponding crystalline part. The structures are assembled while controlling their relative positions, rotating in an interface plane, in relation to relative positions of respective crystalline parts within the initial structure, to obtain a controlled resulting tilt angle at the interface between the structures. The method may find application particularly in microelectronics, optics, and optoelectronics.
    Type: Application
    Filed: December 27, 2001
    Publication date: May 12, 2005
    Inventors: Franck Fournel, Hubert Moriceau, Marc Zussy, Noel Magnea
  • Publication number: 20040074866
    Abstract: The invention relates to a process permitting defects or stresses in a structure to be revealed, comprising the following steps:
    Type: Application
    Filed: October 27, 2003
    Publication date: April 22, 2004
    Inventors: Franck Fournel, Hubert Moriceau, Noel Magnea
  • Patent number: 6724017
    Abstract: The invention relates to a device comprising microstructures or nanostructures on a support, characterized in that the support comprises: a) a substrate (1) comprising at least one part composed of a crystalline material, this part having a surface (2) with a stress field or a topology associated with a stress field, the stress field being associated with dislocations, b) an intermediate layer (3) bonded to the surface (2), and having a thickness and/or composition and/or a surface state enabling transmission of said stress field through this layer as far as its free face that supports microstructures or nanostructures (4).
    Type: Grant
    Filed: March 28, 2003
    Date of Patent: April 20, 2004
    Assignees: Commissariat a l'Energie Atomique, Centre National de la Recherche Scientific
    Inventors: Marie-Noëlle Semeria, Pierre Mur, Franck Fournel, Hubert Moriceau, Hubert Eymery, Noël Magnea, Thierry Baron, François Martin
  • Patent number: 6570187
    Abstract: The invention concerns a light emitting and guiding device comprising at least one active region (22) in silicon and the means for creating photons in the said active region. In accordance with the invention, the means for creating the photons comprise a diode (22c, 22d) formed in the active region. In addition, the device includes the means for confining the carriers injected by the diode, and the silicon in the active region is mono-crystalline.
    Type: Grant
    Filed: August 9, 2001
    Date of Patent: May 27, 2003
    Assignee: Commissariat a l′Energie Atomique
    Inventors: Jean-Louis Pautrat, Hélène Ulmer, Noël Magnea, Emmanuel Hadji
  • Publication number: 20030064570
    Abstract: The invention relates to a structure composed of a substrate wherein a surface supports juxtaposed islands, characterized in that the islands rest on a periodic network of terraces composed of the intersection of two step networks, each terrace having a first dimension corresponding to the step width of one of the step networks and a second dimension corresponding to the step width of the other step network, each terrace supporting at least two islands formed of a different superimposition of monolayers wherein the composition is chosen between at least one first composition and one second composition.
    Type: Application
    Filed: June 4, 2002
    Publication date: April 3, 2003
    Inventors: David Martrou, Noel Magnea
  • Patent number: 6507149
    Abstract: The invention relates to a plasma cell able to be fixed in a vacuum chamber by means of a first flange, having an outer envelope in which a gas under pressure (P′) is added and provided in its upper part with a discharge opening, and electrodes, at least one anode and one cathode, arranged in said envelope and mounted on a second flange, to whose terminals a voltage may be applied, such as to cause ionization of the gas producing the monoatomic species which are to be discharged through the opening. Electrodes can be dismounted and are assembled on a second removable flange. Electrically insulated separation means are provided between cathode and anode(s). A gas inlet opening is provided in the lower part of the envelope.
    Type: Grant
    Filed: March 21, 2000
    Date of Patent: January 14, 2003
    Assignee: Commissariat a l 'Energie Atomique
    Inventors: Emmanuel Picard, Noël Magnea
  • Patent number: 6013912
    Abstract: A multispectral resonant-cavity detector is formed of at least one cavity (2) resonating at not less than two wavelengths and containing at least two layers (12, 14) that absorb the corresponding radiation and are placed at antinodes specific to stationary waves in the cavity, the cavity having at least two P-N junctions at whose space charge zones the layers are disposed. For each cavity, there are at least two electrical contacts to polarize the two junctions inversely to each other to detect the corresponding radiation.
    Type: Grant
    Filed: November 13, 1997
    Date of Patent: January 11, 2000
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Jean-Louis Pautrat, Noel Magnea, Emmanuel Hadji