Patents by Inventor Noel Thomas Franco
Noel Thomas Franco has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11798804Abstract: A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.Type: GrantFiled: December 9, 2020Date of Patent: October 24, 2023Assignee: FEI CompanyInventors: Brian Roberts Routh, Thomas G. Miller, Chad Rue, Noel Thomas Franco
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Patent number: 11069523Abstract: A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.Type: GrantFiled: May 21, 2018Date of Patent: July 20, 2021Assignee: FEI CompanyInventors: Brian Roberts Routh, Jr., Thomas G. Miller, Chad Rue, Noel Thomas Franco
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Patent number: 11062879Abstract: Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.Type: GrantFiled: December 18, 2019Date of Patent: July 13, 2021Assignee: FEI CompanyInventors: Noel Thomas Franco, Kenny Mani, Chad Rue, Joe Christian, Jeffrey Blackwood
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Publication number: 20210118678Abstract: A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.Type: ApplicationFiled: December 9, 2020Publication date: April 22, 2021Applicant: FEI CompanyInventors: Brian Roberts Routh, Thomas G. Miller, Chad Rue, Noel Thomas Franco
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Publication number: 20200126756Abstract: Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.Type: ApplicationFiled: December 18, 2019Publication date: April 23, 2020Applicant: FEI CompanyInventors: Noel Thomas Franco, Kenny Mani, Chad Rue, Joe Christian, Jeffrey Blackwood
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Patent number: 10546719Abstract: Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.Type: GrantFiled: May 23, 2018Date of Patent: January 28, 2020Assignee: FEI CompanyInventors: Noel Thomas Franco, Kenny Mani, Chad Rue, Joe Christian, Jeffrey Blackwood
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Patent number: 10347463Abstract: Method and system for enhanced charged particle beam processes for carbon removal. With the method and system for enhancing carbon removal, associated method and system for decreasing levels of carbon impurity in depositions, also using a precursor gas in charged particle beam processes (and particularly focused ion beam methodologies), are provided. In a preferred embodiment, the precursor gas comprises methyl nitroacetate. In alternative embodiments, the precursor gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.Type: GrantFiled: December 9, 2016Date of Patent: July 9, 2019Assignee: FEI CompanyInventors: Chad Rue, Joe Christian, Kenny Mani, Noel Thomas Franco
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Publication number: 20180350558Abstract: Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.Type: ApplicationFiled: May 23, 2018Publication date: December 6, 2018Applicant: FEI CompanyInventors: Noel Thomas Franco, Kenny Mani, Chad Rue, Joe Christian, Jeffrey Blackwood
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Publication number: 20180277361Abstract: A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.Type: ApplicationFiled: May 21, 2018Publication date: September 27, 2018Applicant: FEI CompanyInventors: Brian Roberts Routh, JR., Thomas G. Miller, Chad Rue, Noel Thomas Franco
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Publication number: 20180166272Abstract: Method and system for enhanced charged particle beam processes for carbon removal. With the method and system for enhancing carbon removal, associated method and system for decreasing levels of carbon impurity in depositions, also using a precursor gas in charged particle beam processes (and particularly focused ion beam methodologies), are provided. In a preferred embodiment, the precursor gas comprises methyl nitroacetate. In alternative embodiments, the precursor gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.Type: ApplicationFiled: December 9, 2016Publication date: June 14, 2018Applicant: FEI CompanyInventors: Chad Rue, Joe Christian, Kenny Mani, Noel Thomas Franco
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Patent number: 9978586Abstract: A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.Type: GrantFiled: March 31, 2016Date of Patent: May 22, 2018Assignee: FEI CompanyInventors: Brian Roberts Routh, Jr., Thomas G. Miller, Chad Rue, Noel Thomas Franco
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Publication number: 20170133220Abstract: A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.Type: ApplicationFiled: March 31, 2016Publication date: May 11, 2017Applicant: FEI CompanyInventors: Brian Roberts Routh, JR., Thomas G. Miller, Chad Rue, Noel Thomas Franco