Abstract: The invention relates to a utility vehicle (IO), preferably a truck, comprising a structure (22) or trailer (46) having a consumer (20) and a fuel cell device (12). The fuel cell device (12) is designed to be connectable as a range extender of the utility vehicle (IO) and to supply the consumer (20) with electrical power and/or waste heat.

Abstract: A frame longitudinal beam structure for chassis frames of utility vehicles, in particular for trucks and/or buses, has at least one frame longitudinal beam of modular construction extending in the vehicle longitudinal direction when in the mounted state. The beam has a base profile extending over substantially the entire length of the frame longitudinal beam and having a plate-shaped central web which, as viewed in cross section, extends between opposite frame longitudinal beam regions, such as between upper and lower flanges. The central web is substantially rectilinear along the longitudinal extent of the base profile. Supplemental profiles formed by separate components are attached to the central web in areal abutment. A plurality of supplemental profiles are attached to the central web such that, in the direction of extent of the longitudinal beam, at least two frame longitudinal beam regions of different profile cross section are formed.

Abstract: A frame longitudinal beam structure for chassis frames of utility vehicles, in particular for trucks and/or buses, has at least one frame longitudinal beam of modular construction extending in the vehicle longitudinal direction when in the mounted state. The beam has a base profile extending over substantially the entire length of the frame longitudinal beam and having a plate-shaped central web which, as viewed in cross section, extends between opposite frame longitudinal beam regions, such as between upper and lower flanges. The central web is substantially rectilinear along the longitudinal extent of the base profile. Supplemental profiles formed by separate components are attached to the central web in areal abutment. A plurality of supplemental profiles are attached to the central web such that, in the direction of extent of the longitudinal beam, at least two frame longitudinal beam regions of different profile cross section are formed.

Abstract: The invention relates to the continuous cleaning of objects, in particular of semiconductor elements, using ultrasound, wherein the objects to be cleaned are arranged within a liquid. Furthermore, the present invention relates to an apparatus for carrying out the method according to the invention. A basic idea of the invention is that the surface of an object to be cleaned (2) in a tank (5) filled with liquid passes through at least one oscillation maximum that is emitted by at least one sound source (8a) being present in the tank (5). According to one embodiment, the sound source fields (8) that are positioned within the tank (5) are arranged inclined with respect to the transport direction (4).

Abstract: The invention relates to an apparatus for the cleaning of thin wafers (6), wherein the wafers (6) are fixed with one side to a carrier device (2), and wherein an interspace (7) is formed between two adjacent substrates, wherein the apparatus substantially consists of a shower device (15) by which fluid is injected into the respective interspaces (7), and a basin (14) that can be filled with fluid and that is dimensioned such that it houses the carrier device (2). According to the invention, optionally either the shower device (15) can be moved in relation to the immobile carrier device (2), or the carrier device (2) can be moved in relation to the immobile shower device (15), or both the carrier device (2) as well as the shower device (15) can be moved in relation to each other.

Abstract: An apparatus for cleaning wafers using the CMP process includes a transport device of a feeding station at the beginning of a cleaning line which has a plurality of transport rollers disposed and driven transversely to the direction of transport. The cleaning line transports polished wafers to a main cleaning station having several pairs of transport rollers for transporting the wafers through the main cleaning station and several pairs of cleaning rollers for cleaning the wafers, wherein a supply of a cleaning medium to the pairs of cleaning rollers is provided in the main cleaning station. A withdrawal station is disposed at the end of the cleaning line in which a robot takes up a wafer and transports it to a drying station, wherein the withdrawal station has a first detector.