Abstract: An optoelectronic component may include a layer sequence having an active layer configured to emit an electromagnetic primary radiation and a conversion element arranged in the beam path of the primary radiation. The conversion element may include a conversion layer and a conversion potting arranged over the conversion layer. The conversion layer may include a first matrix material and a converter material, and the conversion potting may include a second matrix material and a converter material. There may be a jump in concentration of converter material between the conversion layer and the conversion potting.

Abstract: A light source is specified which comprises a planar semiconductor light source comprising a plurality of independently operable single emitters, wherein, during operation, each of the single emitters emits light via respective single luminous surface. Furthermore, the light source has a common optical element which is arranged directly downstream of the single emitters and which is embodied and intended to direct light from different single emitters into different solid angle regions, wherein the single emitters are arranged defocused with respect to the optical element and the individual light surfaces are imaged in a blurred manner by the optical element.

Abstract: A light source is specified which comprises a planar semiconductor light source comprising a plurality of independently operable single emitters, wherein, during operation, each of the single emitters emits light via respective single luminous surface. Furthermore, the light source has a common optical element which is arranged directly downstream of the single emitters and which is embodied and intended to direct light from different single emitters into different solid angle regions, wherein the single emitters are arranged defocused with respect to the optical element and the individual light surfaces are imaged in a blurred manner by the optical element.

Abstract: An optoelectronic component may include a layer sequence having an active layer configured to emit an electromagnetic primary radiation and a conversion element arranged in the beam path of the primary radiation. The conversion element may include a conversion layer and a conversion potting arranged over the conversion layer. The conversion layer may include a first matrix material and a converter material, and the conversion potting may include a second matrix material and a converter material. There may be a jump in concentration of converter material between the conversion layer and the conversion potting.

Abstract: An inspection system includes imaging optics for imaging an object plane into an image plane. The imaging optics include an objective lens having positive optical power, a first lens group having negative optical power, and a second lens group having positive optical power. The optical elements are arranged along a common unfolded optical axis with a pupil plane of the imaging optics located between the first lens group and the second lens group.

Abstract: A system for determining at least one optical property of a lens system, comprising: a position sensitive detector 25 for generating image data representing an image projected onto the detector, and a controller 41 configured to receive the image data, to perform a first analysis of the image data in order to determine an identifier of a partial pattern contained in the image represented by the image data, to perform a second analysis of the image data in order to determine at least one property based on the image of the partial pattern, and to generate data representing the at least one optical property of the lens system associated with an image position of the image based on the determined at least one property.

Abstract: An inspection system includes optics, an object support for mounting an object in a region of an object plane of the optics, a bright-field light source, and a dark-field light source. The inspection system also includes an image detector having a radiation sensitive substrate disposed in a region of an image plane of the optics and a beam dump.

Abstract: An inspection system includes optics, an object support for mounting an object in a region of an object plane of the optics, a bright-field light source, and a dark-field light source. The inspection system also includes an image detector having a radiation sensitive substrate disposed in a region of an image plane of the optics and a beam dump.

Abstract: A wafer inspection system has a bright field imaging beam path and a dark field imaging beam path to obtain bright field images and dark field images of a full 300 mm wafer. The optical system provides for telecentric imaging and has low optical aberrations. The bright field and dark field beam paths are folded such that the system can be integrated to occupy a low volume with a small foot print.

Abstract: An inspection system includes optics, an object support for mounting an object in a region of an object plane of the optics, a bright-field light source, and a dark-field light source. The inspection system also includes an image detector having a radiation sensitive substrate disposed in a region of an image plane of the optics and a beam dump.

Abstract: An inspection system includes imaging optics for imaging an object plane into an image plane. The imaging optics include an objective lens having positive optical power, a first lens group having negative optical power, and a second lens group having positive optical power. The optical elements are arranged along a common optical axis with a pupil plane of the imaging optics located between the first lens group and the second lens group.

Abstract: A wafer inspection system has a bright field imaging beam path and a dark field imaging beam path to obtain bright field images and dark field images of a full 300 mm wafer. The optical system provides for telecentric imaging and has low optical aberrations. The bright field and dark field beam paths are folded such that the system can be integrated to occupy a low volume with a small foot print.