Patents by Inventor Norbert Staud

Norbert Staud has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9068274
    Abstract: Methods to etch a workpiece are described. In one embodiment, a workpiece is disposed within an etchant solution having a composition comprising a dilute acid and a non-ionic surfactant. An electric field is generated within the etchant solution to cause an anisotropic etch pattern to form on a surface of the workpiece.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: June 30, 2015
    Assignee: WD Media, LLC
    Inventor: Norbert Staud
  • Patent number: 7569490
    Abstract: Methods to etch a workpiece are described. In one embodiment, a workpiece is disposed within an etchant solution having a composition comprising a dilute acid and a non-ionic surfactant. An electric field is generated within the etchant solution to cause an anisotropic etch pattern to form on a surface of the workpiece.
    Type: Grant
    Filed: March 15, 2005
    Date of Patent: August 4, 2009
    Assignee: WD Media, Inc.
    Inventor: Norbert Staud
  • Publication number: 20060207889
    Abstract: Methods to etch a workpiece are described. In one embodiment, a workpiece is disposed within an etchant solution having a composition comprising a dilute acid and a non-ionic surfactant. An electric field is generated within the etchant solution to cause an anisotropic etch pattern to form on a surface of the workpiece.
    Type: Application
    Filed: March 15, 2005
    Publication date: September 21, 2006
    Inventor: Norbert Staud
  • Publication number: 20060207890
    Abstract: Methods to etch a workpiece are described. In one embodiment, a workpiece is disposed within an etchant solution having a composition comprising a dilute acid and a non-ionic surfactant. An electric field is generated within the etchant solution to cause an anisotropic etch pattern to form on a surface of the workpiece.
    Type: Application
    Filed: March 15, 2005
    Publication date: September 21, 2006
    Inventor: Norbert Staud
  • Patent number: 5436778
    Abstract: A magnetic disk storage system wherein a magnetic includes a magnetoresistive sensor is described. The MR sensor comprises a sputtered layer of ferromagnetic material and a sputtered layer of antiferromagnetic nickel-manganese (Ni-Mn) to provide an exchange coupled longitudinal bias field in the MR element. The antiferromagnetic layer overlays the MR layer and may be patterned to provide the longitudinal bias field only in the end regions of the MR layer. Alternatively, the antiferromagnetic layer can underlay the MR layer with a Zr underlayer to enhance the exchange-coupled field. As initially deposited, the Ni-Mn layer has a face-centered-cubic crystalline structure and exhibits little or no exchange-coupled field. After one annealing cycle at a relatively low temperature, the Ni-Mn layer crystalline structure is face-centered-tetragonal and exhibits increased crystallographic ordering and provides sufficient exchange coupling for the MR element to operate.
    Type: Grant
    Filed: March 15, 1994
    Date of Patent: July 25, 1995
    Assignee: International Business Machines Corporation
    Inventors: Tsann Lin, James K. Howard, Cherngye Hwang, Daniele Mauri, Norbert Staud
  • Patent number: 5380548
    Abstract: A magnetoresistive (MR) sensor comprising a sputtered layer of ferromagnetic material and a sputtered layer of antiferromagnetic nickel-manganese (Ni-Mn) to provide an exchange coupled longitudinal bias field in the MR element is described. The antiferromagnetic layer overlays the MR layer and may be patterned to provide the longitudinal bias field only in the end regions of the MR layer. Alternatively, the antiferromagnetic layer can underlay the MR layer with a Zr underlayer to enhance the exchange-coupled field. As initially deposited, the Ni-Mn layer is face-centered-cubic and exhibits little or no exchange-coupled field. After one annealing cycle at a relatively low temperature, the Ni-Mn layer is face-centered-tetragonal and exhibits increased crystallographic ordering and provides sufficient exchange coupling for the MR element to operate. Addition of chromium to the Ni-Mn alloy provides increased corrosion resistance.
    Type: Grant
    Filed: March 15, 1994
    Date of Patent: January 10, 1995
    Assignee: International Business Machines Corporation
    Inventors: Tsann Lin, James K. Howard, Cherngye Hwang, Daniele Mauri, Norbert Staud
  • Patent number: 5315468
    Abstract: A magnetoresistive (MR) sensor comprising a sputtered layer of ferromagnetic material and a sputtered layer of antiferromagnetic nickel-manganese (Ni-Mn) to provide an exchange coupled longitudinal bias field in the MR element is described. The antiferromagnetic layer overlays the MR layer and may be patterned to provide the longitudinal bias field only in the end regions of the MR layer. Alternatively, the antiferromagnetic layer can underlay the MR layer with a Zr underlayer to enhance the exchange-coupled field. As initially deposited, the Ni-Mn layer is face-centered-cubic and exhibits little or no exchange-coupled field. After one annealing cycle at a relatively low temperature, the Ni-Mn layer is face-centered-tetragonal and exhibits increased crystallographic ordering and provides sufficient exchange coupling for the MR element to operate. Addition of chromium to the Ni-Mn alloy provides increased corrosion resistance.
    Type: Grant
    Filed: July 28, 1992
    Date of Patent: May 24, 1994
    Assignee: International Business Machines Corporation
    Inventors: Tsann Lin, James K. Howard, Cherngye Hwang, Daniele Mauri, Norbert Staud