Patents by Inventor Noriaki Arai
Noriaki Arai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20110266465Abstract: Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip. The emitter base mount and a vacuum container magnetically interact with each other.Type: ApplicationFiled: January 8, 2010Publication date: November 3, 2011Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Hiroyasu Shichi, Shinichi Matsubara, Norihide Saho, Noriaki Arai, Tohru Ishitani
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Publication number: 20110147609Abstract: An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.Type: ApplicationFiled: March 30, 2009Publication date: June 23, 2011Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Hiroyasu Shichi, Shinichi Matsubara, Norihide Saho, Masahiro Yamaoka, Noriaki Arai
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Publication number: 20110068265Abstract: A high-resolution sample image is acquired by eliminating both of charge over an entire sample (global charge) and charge in a local region irradiated with a primary charged particle beam (local charge). An electrode unit (50) according to the present invention is used in a charged particle beam device. The electrode unit (50) includes a plate electrode disposed facing an insulator sample between an objective lens and the sample, and further includes: a first charge-neutralization charged particle beam source which emits a first charged particle beam to eliminate local charge on the sample; and a second charge-neutralization charged particle beam source (25) which emits a second charged particle beam to eliminate global charge on the sample.Type: ApplicationFiled: May 15, 2009Publication date: March 24, 2011Inventors: Noriaki Arai, Hideyuki Kazumi
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Publication number: 20100181478Abstract: In an apparatus for obtaining an image by irradiating a charged particle beam on a specimen, a condition of the beam conditioned differently from vertical incidence as in the case of the beam being tilted is required to be adjusted. To this end, the apparatus has a controller for automatically controlling a stigmator, an objective lens and a deflector such that astigmatism is corrected, focus is adjusted and view filed shift is corrected. The controller has a selector for inhibiting at least one of the astigmatism correction, focus adjustment and FOV shift correction from being executed.Type: ApplicationFiled: March 29, 2010Publication date: July 22, 2010Applicant: Hitachi High-Technologies CorporationInventors: Hidetoshi Morokuma, Noriaki Arai, Takashi Doi, Fumihiro Sasajima, Yoshihiro Kimura
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Patent number: 7705300Abstract: In an apparatus for obtaining an image by irradiating a charged particle beam on a specimen, a condition of the beam conditioned differently from vertical incidence as in the case of the beam being tilted is required to be adjusted. To this end, the apparatus has a controller for automatically controlling a stigmator, an objective lens and a deflector such that astigmatism is corrected, focus is adjusted and view filed shift is corrected. The controller has a selector for inhibiting at least one of the astigmatism correction, focus adjustment and FOV shift correction from being executed.Type: GrantFiled: April 13, 2005Date of Patent: April 27, 2010Assignee: Hitachi High-Technologies CorporationInventors: Hidetoshi Morokuma, Noriaki Arai, Takashi Doi, Fumihiro Sasajima, Yoshihiro Kimura
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Patent number: 7566872Abstract: A scanning electron microscope is disclosed. The primary electron beam is radiated on a reticle (specimen), and an observation image of the reticle is obtained using the electrons secondarily released. The microscope comprises a lamp for radiating the vacuum ultraviolet light having the wavelength of not more than 172 nm on the reticle in the atmosphere, a radiation chamber for hermetically sealing the reticle so that the vacuum ultraviolet light can be radiated on the reticle, and a specimen holder for holding the reticle in the radiation chamber and capable of adjusting the distance between the lamp and the reticle.Type: GrantFiled: August 24, 2006Date of Patent: July 28, 2009Assignee: Hitachi High-Technologies CorporationInventors: Ritsuo Fukaya, Hidetoshi Sato, Zhigang Wang, Noriaki Arai, Makoto Ezumi
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Publication number: 20090065694Abstract: An object of the invention is to reduce the beam drift in which the orbit of the charged particle beam is deflected by a potential gradient generated by a nonuniform sample surface potential on a charged-particle-beam irradiation area surface, the nonuniform sample surface potential being generated by electrification made when observing an insulating-substance sample using a charged particle beam. Energy of the charged particle beam to be irradiated onto the sample is set so that generation efficiency of secondary electrons generated from the sample becomes equal to 1 or more. A flat-plate electrode (26) is located in such a manner as to be directly opposed to the sample. Here, the flat-plate electrode is an electrode to which a voltage can be applied independently, and which is equipped with a hole through which a primary charged particle beam can pass. Furthermore, a voltage can be applied independently to a sample stage (12) on which the sample is mounted.Type: ApplicationFiled: October 28, 2008Publication date: March 12, 2009Inventors: Noriaki Arai, Makoto Ezumi, Yoichi Ose
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Patent number: 7459681Abstract: An object of the invention is to reduce the beam drift in which the orbit of the charged particle beam is deflected by a potential gradient generated by a nonuniform sample surface potential on a charged-particle-beam irradiation area surface, the nonuniform sample surface potential being generated by electrification made when observing an insulating-substance sample using a charged particle beam. Energy of the charged particle beam to be irradiated onto the sample is set so that generation efficiency of secondary electrons generated from the sample becomes equal to 1 or more. A flat-plate electrode (26) is located in such a manner as to be directly opposed to the sample. Here, the flat-plate electrode is an electrode to which a voltage can be applied independently, and which is equipped with a hole through which a primary charged particle beam can pass. Furthermore, a voltage can be applied independently to a sample stage (12) on which the sample is mounted.Type: GrantFiled: August 10, 2005Date of Patent: December 2, 2008Assignee: Hitachi High-Technologies CorporationInventors: Noriaki Arai, Makoto Ezumi, Yoichi Ose
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Patent number: 7408172Abstract: A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such than an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.Type: GrantFiled: August 20, 2007Date of Patent: August 5, 2008Assignee: Hitachi High-Technologies CorporationInventors: Mitsugu Sato, Hideo Todokoro, Yoichi Ose, Makoto Ezumi, Noriaki Arai, Takashi Doi
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Patent number: 7381951Abstract: A charged particle beam adjustment apparatus for tilting an electron beam by a tilt deflector is disclosed. The tilt angle adjustment of the electron beam and the distortion adjustment for correcting the image distortion generated when the electron beam is tilted are conducted on a specified. sample such as a pyramidal sample. The images before and after the tilting are acquired and processed to determine the tilt angle value and the distortion amount. The tilt angle adjustment and the adjustment for correction of the distortion are automated in accordance with a predetermined processing flow.Type: GrantFiled: August 24, 2005Date of Patent: June 3, 2008Assignee: Hitachi High-Technologies CorporationInventors: Takashi Doi, Noriaki Arai, Hidetoshi Morokuma, Katsumi Setoguchi, Fumihiro Sasajima, Maki Tanaka, Atsushi Miyamoto
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Publication number: 20080042074Abstract: A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such than an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.Type: ApplicationFiled: August 20, 2007Publication date: February 21, 2008Inventors: MITSUGU SATO, Hideo Todokoro, Yoichi Ose, Makoto Ezumi, Noriaki Arai, Takashi Doi
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Patent number: 7282722Abstract: A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such that an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.Type: GrantFiled: July 21, 2005Date of Patent: October 16, 2007Assignee: Hitachi High-Technologies CorporationInventors: Mitsugu Sato, Hideo Todokoro, Yoichi Ose, Makoto Ezumi, Noriaki Arai, Takashi Doi
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Publication number: 20070057183Abstract: An object of the invention is to reduce the beam drift in which the orbit of the charged particle beam is deflected by a potential gradient generated by a nonuniform sample surface potential on a charged-particle-beam irradiation area surface, the nonuniform sample surface potential being generated by electrification made when observing an insulating-substance sample using a charged particle beam. Energy of the charged particle beam to be irradiated onto the sample is set so that generation efficiency of secondary electrons generated from the sample becomes equal to 1 or more. A flat-plate electrode (26) is located in such a manner as to be directly opposed to the sample. Here, the flat-plate electrode is an electrode to which a voltage can be applied independently, and which is equipped with a hole through which a primary charged particle beam can pass. Furthermore, a voltage can be applied independently to a sample stage (12) on which the sample is mounted.Type: ApplicationFiled: August 10, 2005Publication date: March 15, 2007Inventors: Noriaki Arai, Makoto Ezumi, Yoichi Ose
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Publication number: 20070045539Abstract: A scanning electron microscope is disclosed. The primary electron beam is radiated on a reticle (specimen), and an observation image of the reticle is obtained using the electrons secondarily released. The microscope comprises a lamp for radiating the vacuum ultraviolet light having the wavelength of not more than 172 nm on the reticle in the atmosphere, a radiation chamber for hermetically sealing the reticle so that the vacuum ultraviolet light can be radiated on the reticle, and a specimen holder for holding the reticle in the radiation chamber and capable of adjusting the distance between the lamp and the reticle.Type: ApplicationFiled: August 24, 2006Publication date: March 1, 2007Inventors: Ritsuo Fukaya, Hidetoshi Sato, Zhigang Wang, Noriaki Arai, Makoto Ezumi
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Publication number: 20060043293Abstract: A charged particle beam adjustment apparatus for tilting an electron beam by a tilt deflector is disclosed. The tilt angle adjustment of the electron beam and the distortion adjustment for correcting the image distortion generated when the electron beam is tilted are conducted on a specified sample such as a pyramidal sample. The images before and after the tilting are acquired and processed to determine the tilt angle value and the distortion amount. The tilt angle adjustment and the adjustment for correction of the distortion are automated in accordance with a predetermined processing flow.Type: ApplicationFiled: August 24, 2005Publication date: March 2, 2006Inventors: Takashi Doi, Noriaki Arai, Hidetoshi Morokuma, Katsumi Setoguchi, Fumihiro Sasajima, Maki Tanaka, Atsushi Miyamoto
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Patent number: 6979821Abstract: Image observation at high resolution is realized and irregularity information of a sample is obtained. The reflected electrons 12a emitted in a direction at a small angle with the surface of the sample 8 are detected by the detectors 10a and 10b arranged on the side of the electron source 1 of the magnetic field leakage type object lens 7 and a sample image is formed. Irregularity information of the sample is obtained from the effects of light and shade appearing in the sample image.Type: GrantFiled: December 9, 2003Date of Patent: December 27, 2005Assignee: Hitachi, Ltd.Inventors: Naomasa Suzuki, Toshiro Kubo, Noriaki Arai, Mitsugu Sato, Hideo Todokoro, Yoichi Ose
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Publication number: 20050253083Abstract: A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such that an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.Type: ApplicationFiled: July 21, 2005Publication date: November 17, 2005Inventors: Mitsugu Sato, Hideo Todokoro, Yoichi Ose, Makoto Ezumi, Noriaki Arai, Takashi Doi
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Publication number: 20050236570Abstract: In an apparatus for obtaining an image by irradiating a charged particle beam on a specimen, a condition of the beam conditioned differently from vertical incidence as in the case of the beam being tilted is required to be adjusted. To this end, the apparatus has a controller for automatically controlling a stigmator, an objective lens and a deflector such that astigmatism is corrected, focus is adjusted and view filed shift is corrected. The controller has a selector for inhibiting at least one of the astigmatism correction, focus adjustment and FOV shift correction from being executed.Type: ApplicationFiled: April 13, 2005Publication date: October 27, 2005Inventors: Hidetoshi Morokuma, Noriaki Arai, Takashi Doi, Fumihiro Sasajima, Yoshihiro Kimura
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Patent number: 6956211Abstract: A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such that an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.Type: GrantFiled: September 8, 2003Date of Patent: October 18, 2005Assignee: Hitachi High-Technologies CorporationInventors: Mitsugu Sato, Hideo Todokoro, Yoichi Ose, Makoto Ezumi, Noriaki Arai, Takashi Doi
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Publication number: 20040119022Abstract: A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such that an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.Type: ApplicationFiled: September 8, 2003Publication date: June 24, 2004Inventors: Mitsugu Sato, Hideo Todokoro, Yoichi Ose, Makoto Ezumi, Noriaki Arai, Takashi Doi