Patents by Inventor NoriaKi SANNO

NoriaKi SANNO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD TO PREDICT METROLOGY OFFSET OF A SEMICONDUCTOR MANUFACTURING PROCESS
    Publication number: 20240094640
    Abstract: A method for determining a spatially varying process offset for a lithographic process, the spatially varying process offset (MTD) varying over a substrate subject to the lithographic process to form one or more structures thereon. The method includes obtaining a trained model (MOD), having been trained to predict first metrology data based on second metrology data, wherein the first metrology data (OV) is spatially varying metrology data which relates to a first type of measurement of the one or more structures being a measure of yield and the second metrology data (PB) is spatially varying metrology data which relates to a second type of measurement of the one or more structures and correlates with the first metrology data; and using the model to obtain the spatially varying process offset (MTD).
    Type: Application
    Filed: January 21, 2022
    Publication date: March 21, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thiago DOS SANTOS GUZELLA, Masashi ISHIBASHI, NoriaKi SANNO, Vahid BASTANI, Reza SAHRAEIAN, Putra SAPUTRA