Patents by Inventor Noriaki Tochizawa

Noriaki Tochizawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6797452
    Abstract: A photosensitive resin composition which includes a photosensitive saponified PVA having a pendant group derived from a quaternary styrylpyridinium or styrylquinolinium, or a derivative thereof. The composition comprises a photosensitive saponified PVA which has structural units represented by formulas (1) to (4): which product is dissolved in at least one organic solvent selected from the group consisting of compounds represented by formulas (5), (6), and (7). The resin composition can be dissolved in a comparatively safe high-boiling-point solvent, such as propylene glycol, and can be developed with water.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: September 28, 2004
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Masahiro Takano, Shin Utsunomiya, Nobuji Sakai, Noriaki Tochizawa
  • Publication number: 20030022104
    Abstract: A photosensitive resin composition which includes a photosensitive saponified PVA having a pendant group derived from a quaternary styrylpyridinium or styrylquinolinium, or a derivative thereof.
    Type: Application
    Filed: July 12, 2002
    Publication date: January 30, 2003
    Inventors: Masahiro Takano, Shin Utsunomiya, Nobuji Sakai, Noriaki Tochizawa
  • Patent number: 6444391
    Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
    Type: Grant
    Filed: January 2, 2001
    Date of Patent: September 3, 2002
    Assignees: Toyo Gosei Kogyo Co., Ltd., Showa Denko K.K.
    Inventors: Masaharu Watanabe, Noriaki Tochizawa
  • Patent number: 6342330
    Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
    Type: Grant
    Filed: January 2, 2001
    Date of Patent: January 29, 2002
    Assignees: Toyo Gosei Kogyo Co., Ltd., Showa Denko K.K.
    Inventors: Masaharu Watanabe, Noriaki Tochizawa, Hirotaka Tagoshi, Tetsuhiko Yamaguchi
  • Publication number: 20010012597
    Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
    Type: Application
    Filed: January 2, 2001
    Publication date: August 9, 2001
    Inventors: Masaharu Watanabe, Noriaki Tochizawa, Hirotaka Tagoshi, Tetsuhiko Yamaguchi
  • Publication number: 20010003633
    Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
    Type: Application
    Filed: January 2, 2001
    Publication date: June 14, 2001
    Inventors: Masaharu Watanabe, Noriaki Tochizawa, Hirotaka Tagoshi, Tetsuhiko Yamaguchi
  • Patent number: 6140018
    Abstract: The invention provides a photosensitive resin and a photosensitive resin composition having excellent water resistance after hardening, excellent developability, and excellent patterning characteristics, and a pattern formation method making use of the composition. The invention provides saponified PVA photosensitive resin which contains structural units represented by formulas (I) and (II): ##STR1## the content of the structural units represented by formulas (I) and (II) in the resin being 0.5-10 mol % with respect to entirety of the structural units of the saponified product of PVA.
    Type: Grant
    Filed: August 5, 1999
    Date of Patent: October 31, 2000
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Noriaki Tochizawa, Mitsuharu Miyazaki, Takaho Ito
  • Patent number: 6140007
    Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylformamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
    Type: Grant
    Filed: May 12, 1999
    Date of Patent: October 31, 2000
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Masaharu Watanabe, Noriaki Tochizawa, Yukari Imamura, Hideo Kikuchi
  • Patent number: 6020093
    Abstract: The photosensitive compound of the present invention contains the following unit: ##STR1## and is particularly expressed by the following formula: ##STR2## Different photosensitive resin compositions can be prepared from this novel photosensitive resin compound, and the resulting photosensitive resin compositions do not raise the problem of environmental pollution, exhibit high resolution, possess a high level of sensitivity, and exhibit excellent adhesion with substrates, coating characteristics and storage stability.
    Type: Grant
    Filed: May 13, 1998
    Date of Patent: February 1, 2000
    Assignee: Toyo Gosei Kogyo, Ltd.
    Inventors: Toru Shibuya, Jian Rong Xie, Noriaki Tochizawa
  • Patent number: 5866296
    Abstract: A photosensitive resin composition includes a polymer compound having a component of Formula (I) and a sensitizer having a cationic group in the molecule: ##STR1## (wherein X denotes a cationic species, and n is 0, 1 or 2.) The photosensitive resin composition is high in sensitivity, good in storage stability, and easy to produce, and is suitable for use in a screen printing plate, formation of black matrix or phosphor pattern of a color cathode-ray tube, a CCD or LCD color filter, a printing color proof, and various etching resists.
    Type: Grant
    Filed: April 25, 1997
    Date of Patent: February 2, 1999
    Assignee: Toyo Gosei Co., Ltd.
    Inventors: Toru Shibuya, Noriaki Tochizawa, Mitsuharu Miyazaki, Hideo Kikuchi
  • Patent number: 5807657
    Abstract: A polyvinyl alcohol base photosensitive resin comprised of a polyvinyl alcohol base polymer compound with the structural units of formulae (I) and (II) ##STR1## as well as a photosensitive resin composition comprising this resin and, optionally, an anionic additive and a method of forming a pattern using this photosensitive composition. R.sup.1 is a residue of a heterocyclic ring with quaternarized aromatic species, R.sup.2 is hydrogen atom or lower alkoxyl group, M is 0 or 1, and n is 1 to 6. X.sup.1, X.sup.2 are hydrogen atom, sodium, potassium or ammonium ion. These resins aid in water solubility, compatibility and sensitivity and are used in forming screen printing plates, black matrix or phosphor pattern formation of color cathode ray tubes, color filters, color printing proofs and etching resists.
    Type: Grant
    Filed: December 11, 1996
    Date of Patent: September 15, 1998
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Hideo Kikuchi, Noriaki Tochizawa, Yasuo Kuniyoshi
  • Patent number: 5589315
    Abstract: A photosensitive composition containing a polyfunctional aromatic diazo compound having at least two groups of Formula (uD) in the molecule, and a photosensitive composition using the same. The diazo compound can be handled under visible light free from ultraviolet, is highly photosensitive, has good shelf life, and lithographic printing plates and screen printing plates formed with the same: ##STR1## wherein G.sup.1 is a substituent derived from alcoholic hydroxyl group; R.sup.1 and R.sup.2 are hydrogen, or alkyl or alkyloxy of 1 to 8 carbon atoms;R.sup.3 is alkyl or substituted alkyl of 1 to 8 carbon atoms, aralkyl or substituted aralkyl of 7 to 14 carbon atoms, or --CH.sub.2 CHG.sup.2 --CH.sub.2 --;X.sup.- is an anion based on protonic acid from which a proton is removed.
    Type: Grant
    Filed: January 6, 1995
    Date of Patent: December 31, 1996
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Hirotada Iida, Noriaki Tochizawa, Yasuo Kuniyoshi, Masaharu Watanabe, Katsuyo Tokuda, Ichiro Hozumi
  • Patent number: 5430130
    Abstract: An photosensitive polyfunctional aromatic diazo compound having at least two groups of Formula (uD) in the molecule, and a photosensitive composition using the same. The diazo compound can be handled under visible light free from ultraviolet, is highly photosensitive, has good shelf life, and is adequate as a photosensitive agent for lithographic printing plates and screen printing plates: ##STR1## wherein G.sup.1 is a substituent derived from alcoholic hydroxyl group; R.sup.1 and R.sup.2 are hydrogen, or alkyl or alkyloxy of 1 to 8 carbon atoms;R.sup.3 is alkyl or substituted alkyl of 1 to 8 carbon atoms, aralkyl or substituted aralkyl of 7 to 14 carbon atoms, or --CH.sub.2 CHG.sup.2 --CH.sub.2 --;X.sup.- is an anion based on protonic acid from which a proton is removed.
    Type: Grant
    Filed: July 21, 1993
    Date of Patent: July 4, 1995
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Hirotada Iida, Noriaki Tochizawa, Yasuo Kuniyoshi, Masaharu Watanabe, Katsuyo Tokuda, Ichiro Hozumi
  • Patent number: 5041570
    Abstract: A photosensitive agent comprising an aromatic diazide compound represented by Formula (I) ##STR1## wherein X denotes ##STR2## Y denotes --CH.dbd.CH--, ##STR3## R.sub.1 is --CH.sub.2 CH.sub.2 --, R.sub.2 --CH.sub.2 CH.sub.3, R.sub.3 is hydrogen, m is 1, and n is 1,R.sub.6, R.sub.7, R.sub.8, R.sub.9, and R.sub.10 are individually hydrogen, alkyl, substituted alkyl, aryl, or two of R.sub.6 to R.sub.9 form alkylene groups, provided that R.sub.6 to R.sub.9 are not all hydrogen simultaneouslyand use of the photosensitive agent in a photosensitive composition and in a method forming forming an image.
    Type: Grant
    Filed: July 31, 1989
    Date of Patent: August 20, 1991
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Noriaki Tochizawa, Hideo Kikuchi
  • Patent number: 5021505
    Abstract: A photosensitive poly(vinyl alcohol) derivative comprising units of the fula ##STR1## wherein R.sub.1 is alkylene, R.sub.2 is hydrogen or a lower alkoxy, ##STR2## is a quaternary aromatic nitrogen-containing heterocycle, X.sup.- is SO.sub.3.sup.- or CO.sub.2.sup.-, m is 0 or 1, and n is an integer of 1 to 6 capable of being developed with an aqueous developing solution.
    Type: Grant
    Filed: December 1, 1989
    Date of Patent: June 4, 1991
    Assignees: Director General of the Agency of Industrial Science and Technology, Toyo Gosei Kogyo Co., Ltd.
    Inventors: Kunihiro Ichimura, Noriaki Tochizawa, Hideo Kikuchi