Patents by Inventor Norifumi Nakamoto
Norifumi Nakamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9416283Abstract: A solution for forming an organic thin film wherein the total starting amount of metal surfactants (A) and (B) is 0.05 to 50 wt %, the amount of a hydroxyl group-containing compound generated with the progress of the hydrolysis reaction is 20 ppm to 6 wt %, and the amount of a compound (C) that can interact with the metal surfactant is 0.01 ppm to 8 ppm in terms of metal, relative to the total amount of the solution for forming an organic thin film.Type: GrantFiled: September 15, 2014Date of Patent: August 16, 2016Assignee: Nippon Soda Co., Ltd.Inventors: Tomoya Hidaka, Yoshitaka Fujita, Norifumi Nakamoto, Kazuhisa Kumazawa, Eiji Hoshi
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Publication number: 20150000563Abstract: A solution for forming an organic thin film wherein the total starting amount of metal surfactants (A) and (B) is 0.05 to 50 wt %, the amount of a hydroxyl group-containing compound generated with the progress of the hydrolysis reaction is 20 ppm to 6 wt %, and the amount of a compound (C) that can interact with the metal surfactant is 0.01 ppm to 8 ppm in terms of metal, relative to the total amount of the solution for forming an organic thin film.Type: ApplicationFiled: September 15, 2014Publication date: January 1, 2015Inventors: Tomoya HIDAKA, Yoshitaka FUJITA, Norifumi NAKAMOTO, Kazuhisa KUMAZAWA, Eiji HOSHI
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Patent number: 8864896Abstract: A method is provided for forming an organic thin film comprising: 1) preparing a hydroxyl group-containing solution by mixing the following (a), (b) and (c) so that the total amount of (A) and (B) in the hydroxyl group-containing solution becomes 0.1 wt% to 80 wt%, and conducting hydrolysis to generate a hydroxyl group-containing compound; a) an adjuvant for forming an organic thin film comprising a metal surfactant (A) having at least one or more hydrolysable group, and a compound (C) that can interact with the metal surfactant in an organic solvent b) a metal surfactant having at least one or more hydrolysable group (B), and c) water 2) preparing a solution for forming an organic thin film by mixing an organic solvent and the hydroxyl group-containing solution of 1); and 3) allowing the substrate to contact with the solution for forming an organic thin film of 2).Type: GrantFiled: November 13, 2007Date of Patent: October 21, 2014Assignee: Nippon Soda Co., Ltd.Inventors: Tomoya Hidaka, Yoshitaka Fujita, Norifumi Nakamoto, Kazuhisa Kumazawa, Eiji Hoshi
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Publication number: 20140302325Abstract: The present invention provides a surface-covered inorganic powder having novel physical properties. The surface-covered inorganic powder is an inorganic powder covered with a monolayer formed by at least one structural unit represented by formula (I): (wherein R1 represents an alkyl group having 1 to 30 carbon atoms and optionally having a substituent, X1 and X2 each independently represent a hydroxyl group, or an OR2 or O—Si bond, and . represents a binding site to an atom on the inorganic powder side), wherein the monolayer is at least partially crystalline.Type: ApplicationFiled: October 18, 2012Publication date: October 9, 2014Applicant: Nippon Soda Co., Ltd.Inventors: Mikiya Shimada, Norifumi Nakamoto, Koutarou Arai, Tomoya Hidaka
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Patent number: 8426019Abstract: A method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. Also, a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolysable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water contact within the organic solvent solution is either set or maintained within a predetermined range.Type: GrantFiled: July 9, 2010Date of Patent: April 23, 2013Assignee: Nippon Soda Co., Ltd.Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Tomoya Hidaka
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Forming mold or electroforming mother die having release layer and method for manufacturing the same
Patent number: 8361375Abstract: A forming mold or electroforming mother die including a mold or mother die, and a release layer composed of an organic thin film on a mold surface or mother die surface which is formed by contacting the mold or mother die with an organic solvent solution including a silane surfactant represented by formula [1] Rn—Si—X4-n??[1] where R represents an optionally substituted hydrocarbon group or halogenated hydrocarbon having 1 to 20 carbon atoms, or a hydrocarbon group or a halogenated hydrocarbon group having a linking group which has 1 to 20 carbon atoms, X represents a hydroxyl group, a halogen atom, an alkoxy group having 1 to 6 carbon atoms, or an acyloxy group, and n represents an integer of 1 to 3; and a catalyst capable of interacting with the silane surfactant, and a production method thereof.Type: GrantFiled: January 5, 2012Date of Patent: January 29, 2013Assignee: Nippon Soda Co., Ltd.Inventors: Tomoya Hidaka, Norifumi Nakamoto, Yoshitaka Fujita -
Patent number: 8197906Abstract: A method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolysable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water contact within the organic solvent solution is either set or maintained within a predetermined range.Type: GrantFiled: May 11, 2010Date of Patent: June 12, 2012Assignee: Nippon Soda Co., Ltd.Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Tomoya Hidaka
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FORMING MOLD OR ELECTROFORMING MOTHER DIE HAVING RELEASE LAYER AND METHOD FOR MANUFACTURING THE SAME
Publication number: 20120126448Abstract: A forming mold or electroforming mother die including a mold or mother die, and a release layer composed of an organic thin film on a mold surface or mother die surface which is formed by contacting the mold or mother die with an organic solvent solution including a silane surfactant represented by formula [1] Rn—Si—X4-n??[1] where R represents an optionally substituted hydrocarbon group or halogenated hydrocarbon having 1 to 20 carbon atoms, or a hydrocarbon group or a halogenated hydrocarbon group having a linking group which has 1 to 20 carbon atoms, X represents a hydroxyl group, a halogen atom, an alkoxy group having 1 to 6 carbon atoms, or an acyloxy group, and n represents an integer of 1 to 3; and a catalyst capable of interacting with the silane surfactant, and a production method thereof.Type: ApplicationFiled: January 5, 2012Publication date: May 24, 2012Applicant: NIPPON SODA CO., LTD.Inventors: Tomoya HIDAKA, Norifumi NAKAMOTO, Yoshitaka FUJITA -
Publication number: 20120082793Abstract: Dispersoids having metal-oxygen groups that are suitable for the production of metal oxide thin-films at a low temperature of 200° C. or below and for the production of homogeneous organic-inorganic hybrid materials. The dispersoid having metal-oxygen bonds may be obtained by mixing a metal compound having at least three hydrolyzable groups with at least 0.5 mole but less than 2 moles of water per mole of the metal compound in an organic solvent, in the absence of an acid, a base, and/or a dispersion stabilizer, and at a temperature at or below the temperature at which the metal compound begins to hydrolyze, then raising the temperature to at least the temperature at which hydrolysis begins.Type: ApplicationFiled: December 14, 2011Publication date: April 5, 2012Applicant: NIPPON SODA CO., LTD.Inventors: Nobuo KIMURA, Yoshitaka FUJITA, Norifumi NAKAMOTO, Motoyuki TOKI, Akiji HIGUCHI, Kazuo ONO, Tomoya HIDAKA, Hiroyuki TAKEDA
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Publication number: 20110135878Abstract: Dispersoids having metal-oxygen groups that are suitable for the production of metal oxide thin-films at a low temperature of 200° C. or below and for the production of homogeneous organic-inorganic hybrid materials. The dispersoid having metal-oxygen bonds may be obtained by mixing a metal compound having at least three hydrolyzable groups with at least 0.5 mole but less than 2 moles of water per mole of the metal compound in an organic solvent, in the absence of an acid, a base, and/or a dispersion stabilizer, and at a temperature at or below the temperature at which the metal compound begins to hydrolyze, then raising the temperature to at least the temperature at which hydrolysis begins.Type: ApplicationFiled: February 2, 2011Publication date: June 9, 2011Applicant: NIPPON SODA, CO., LTD.Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Motoyuki Toki, Akiji Higuchi, Kazuo Ono, Tomoya Hidaka, Hiroyuki Takeda
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Patent number: 7909929Abstract: The invention provides dispersoids having metal-oxygen groups which are suitable for the production of metal oxide thin-films at a low temperature of 200° C. or below and for the production of homogeneous organic-inorganic hybrid materials. The invention also provides metal oxide thin-films and organic-inorganic hybrid materials endowed with various capabilities, particularly organic-inorganic hybrid materials having a high refractive index and high transparency. Use is made of a dispersoid having metal-oxygen bonds which is obtained by mixing a metal compound having at least three hydrolyzable groups with at least 0.5 mole but less than 2 moles of water per mole of the metal compound in an organic solvent, in the absence of an acid, a base and/or a dispersion stabilizer, and at a temperature at or below the temperature at which the metal compound begins to hydrolyze, then raising the temperature to at least the temperature at which hydrolysis begins.Type: GrantFiled: November 12, 2003Date of Patent: March 22, 2011Assignee: Nippon Soda Co., Ltd.Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Motoyuki Toki, Akiji Higuchi, Kazuo Ono, Tomoya Hidaka, Hiroyuki Takeda
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Publication number: 20100313789Abstract: A method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. Also, a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolysable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water contact within the organic solvent solution is either set or maintained within a predetermined range.Type: ApplicationFiled: July 9, 2010Publication date: December 16, 2010Applicant: NIPPON SODA CO., LTD.Inventors: Nobuo KIMURA, Yoshitaka Fujita, Norifumi Nakamoto, Tomoya Hidaka
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Publication number: 20100221443Abstract: An object of the present invention is to provide a method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. The present invention provides a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolysable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water contact within the organic solvent solution is either set or maintained within a predetermined range.Type: ApplicationFiled: May 11, 2010Publication date: September 2, 2010Applicant: NIPPON SODA CO., LTD.Inventors: Nobuo KIMURA, Yoshitaka FUJITA, Norifumi NAKAMOTO, Tomoya HIDAKA
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Patent number: 7776403Abstract: An object of the present invention is to provide a method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. The present invention provides a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolyzable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water content within the organic solvent solution is either set or maintained within a predetermined range.Type: GrantFiled: April 14, 2004Date of Patent: August 17, 2010Assignee: Nippon Soda Co., Ltd.Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Tomoya Hidaka
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Publication number: 20090281238Abstract: The object is to provide a method for forming an organic thin film which enables to form quickly a dense monomolecular film with less impurity. It is a method for forming an organic thin film which comprises: 1) a step of preparing a hydroxyl group-containing solution by mixing the following (a), (b) and (c) so that the total amount of (A) and (B) in the hydroxyl group-containing solution becomes 0.Type: ApplicationFiled: November 13, 2007Publication date: November 12, 2009Inventors: Tomoya Hidaka, Yoshitaka Fujita, Norifumi Nakamoto, Kazuhisa Kumazawa, Eiji Hoshi
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Forming Mold Or Electroforming Mother Die Having Release Layer And Method For Manufacturing The Same
Publication number: 20080290249Abstract: The present invention provides a forming mold or electroforming mother die comprising a mold or mother die, and a release layer composed of an organic thin film on a mold surface or mother die surface which is formed by contacting the mold or mother die with an organic solvent solution comprising a silane surfactant represented by the formula [1] Rn—Si—X4-n??[1] (wherein, R represents an optionally substituted hydrocarbon group having 1 to 20 carbon atoms, an optionally substituted halogenated hydrocarbon group having 1 to 20 carbon atom, a hydrocarbon group having a linking group which has 1 to 20 carbon atoms, or a halogenated hydrocarbon group having a linking group which has 1 to 20 carbon atoms, and X represents a hydroxyl group, a halogen atom, an alkoxy group having 1 to 6 carbon atoms, or an acyloxy group, and n represents an integer of 1 to 3), and a catalyst capable of interacting with the silane surfactant, the release layer having excellent releasing properties and abrasion resistance, and a prType: ApplicationFiled: December 28, 2005Publication date: November 27, 2008Applicant: Nippon Soda Co., Ltd.Inventors: Tomoya Hidaka, Norifumi Nakamoto, Yoshitaka Fujita -
Patent number: 7422642Abstract: To provide a method which allows the combination of rapid formation of a chemical adsorption film with the preparation of the film which is reduced in the content of impurities and having a dense structure. A method for preparing a chemical adsorption film on the surface of a substrate containing an active hydrogen, characterized in that it includes treating a metal based surfactant having at least one hydrolyzable group with a metal oxide or a partially hydrolyzed product from a metal alkoxide and water in an organic solvent to form a solution, and contacting the solution with the surface of the substrate.Type: GrantFiled: March 12, 2003Date of Patent: September 9, 2008Assignee: Nippon Soda Co., Ltd.Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto
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Publication number: 20060239902Abstract: The invention provides dispersoids having metal-oxygen groups which are suitable for the production of metal oxide thin-films at a low temperature of 200° C. or below and for the production of homogeneous organic-inorganic hybrid materials. The invention also provides metal oxide thin-films and organic-inorganic hybrid materials endowed with various capabilities, particularly organic-inorganic hybrid materials having a high refractive index and high transparency. Use is made of a dispersoid having metal-oxygen bonds which is obtained by mixing a metal compound having at least three hydrolyzable groups with at least 0.5 mole but less than 2 moles of water per mole of the metal compound in an organic solvent, in the absence of an acid, a base and/or a dispersion stabilizer, and at a temperature at or below the temperature at which the metal compound begins to hydrolyze, then raising the temperature to at least the temperature at which hydrolysis begins.Type: ApplicationFiled: November 12, 2003Publication date: October 26, 2006Applicant: NIPPON SODA CO., LTD.Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Motoyuki Toki, Akiji Higuchi, Kazuo Ono, Tomoya Hidaka, Hiroyuki Takeda
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Publication number: 20060188657Abstract: An object of the present invention is to provide a method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. A method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolyzable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water content within the organic solvent solution is either set or maintained within a predetermined range.Type: ApplicationFiled: April 14, 2004Publication date: August 24, 2006Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Tomoya Hidaka
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Publication number: 20050167004Abstract: To provide a method which allows the combination of rapid formation of a chemical adsorption film with the preparation of the film which is reduced in the content of impurities and having a dense structure. A method for preparing a chemical adsorption film on the surface of a substrate containing an active hydrogen, characterized in that it includes treating a metal based surfactant having at least one hydrolyzable group with a metal oxide or a partially hydrolyzed product from a metal alkoxide and water in an organic solvent to form a solution, and contacting the solution with the surface of the substrate.Type: ApplicationFiled: March 12, 2003Publication date: August 4, 2005Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto