Patents by Inventor Norifumi Nakamoto

Norifumi Nakamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9416283
    Abstract: A solution for forming an organic thin film wherein the total starting amount of metal surfactants (A) and (B) is 0.05 to 50 wt %, the amount of a hydroxyl group-containing compound generated with the progress of the hydrolysis reaction is 20 ppm to 6 wt %, and the amount of a compound (C) that can interact with the metal surfactant is 0.01 ppm to 8 ppm in terms of metal, relative to the total amount of the solution for forming an organic thin film.
    Type: Grant
    Filed: September 15, 2014
    Date of Patent: August 16, 2016
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Tomoya Hidaka, Yoshitaka Fujita, Norifumi Nakamoto, Kazuhisa Kumazawa, Eiji Hoshi
  • Publication number: 20150000563
    Abstract: A solution for forming an organic thin film wherein the total starting amount of metal surfactants (A) and (B) is 0.05 to 50 wt %, the amount of a hydroxyl group-containing compound generated with the progress of the hydrolysis reaction is 20 ppm to 6 wt %, and the amount of a compound (C) that can interact with the metal surfactant is 0.01 ppm to 8 ppm in terms of metal, relative to the total amount of the solution for forming an organic thin film.
    Type: Application
    Filed: September 15, 2014
    Publication date: January 1, 2015
    Inventors: Tomoya HIDAKA, Yoshitaka FUJITA, Norifumi NAKAMOTO, Kazuhisa KUMAZAWA, Eiji HOSHI
  • Patent number: 8864896
    Abstract: A method is provided for forming an organic thin film comprising: 1) preparing a hydroxyl group-containing solution by mixing the following (a), (b) and (c) so that the total amount of (A) and (B) in the hydroxyl group-containing solution becomes 0.1 wt% to 80 wt%, and conducting hydrolysis to generate a hydroxyl group-containing compound; a) an adjuvant for forming an organic thin film comprising a metal surfactant (A) having at least one or more hydrolysable group, and a compound (C) that can interact with the metal surfactant in an organic solvent b) a metal surfactant having at least one or more hydrolysable group (B), and c) water 2) preparing a solution for forming an organic thin film by mixing an organic solvent and the hydroxyl group-containing solution of 1); and 3) allowing the substrate to contact with the solution for forming an organic thin film of 2).
    Type: Grant
    Filed: November 13, 2007
    Date of Patent: October 21, 2014
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Tomoya Hidaka, Yoshitaka Fujita, Norifumi Nakamoto, Kazuhisa Kumazawa, Eiji Hoshi
  • Publication number: 20140302325
    Abstract: The present invention provides a surface-covered inorganic powder having novel physical properties. The surface-covered inorganic powder is an inorganic powder covered with a monolayer formed by at least one structural unit represented by formula (I): (wherein R1 represents an alkyl group having 1 to 30 carbon atoms and optionally having a substituent, X1 and X2 each independently represent a hydroxyl group, or an OR2 or O—Si bond, and . represents a binding site to an atom on the inorganic powder side), wherein the monolayer is at least partially crystalline.
    Type: Application
    Filed: October 18, 2012
    Publication date: October 9, 2014
    Applicant: Nippon Soda Co., Ltd.
    Inventors: Mikiya Shimada, Norifumi Nakamoto, Koutarou Arai, Tomoya Hidaka
  • Patent number: 8426019
    Abstract: A method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. Also, a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolysable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water contact within the organic solvent solution is either set or maintained within a predetermined range.
    Type: Grant
    Filed: July 9, 2010
    Date of Patent: April 23, 2013
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Tomoya Hidaka
  • Patent number: 8361375
    Abstract: A forming mold or electroforming mother die including a mold or mother die, and a release layer composed of an organic thin film on a mold surface or mother die surface which is formed by contacting the mold or mother die with an organic solvent solution including a silane surfactant represented by formula [1] Rn—Si—X4-n??[1] where R represents an optionally substituted hydrocarbon group or halogenated hydrocarbon having 1 to 20 carbon atoms, or a hydrocarbon group or a halogenated hydrocarbon group having a linking group which has 1 to 20 carbon atoms, X represents a hydroxyl group, a halogen atom, an alkoxy group having 1 to 6 carbon atoms, or an acyloxy group, and n represents an integer of 1 to 3; and a catalyst capable of interacting with the silane surfactant, and a production method thereof.
    Type: Grant
    Filed: January 5, 2012
    Date of Patent: January 29, 2013
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Tomoya Hidaka, Norifumi Nakamoto, Yoshitaka Fujita
  • Patent number: 8197906
    Abstract: A method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolysable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water contact within the organic solvent solution is either set or maintained within a predetermined range.
    Type: Grant
    Filed: May 11, 2010
    Date of Patent: June 12, 2012
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Tomoya Hidaka
  • Publication number: 20120126448
    Abstract: A forming mold or electroforming mother die including a mold or mother die, and a release layer composed of an organic thin film on a mold surface or mother die surface which is formed by contacting the mold or mother die with an organic solvent solution including a silane surfactant represented by formula [1] Rn—Si—X4-n??[1] where R represents an optionally substituted hydrocarbon group or halogenated hydrocarbon having 1 to 20 carbon atoms, or a hydrocarbon group or a halogenated hydrocarbon group having a linking group which has 1 to 20 carbon atoms, X represents a hydroxyl group, a halogen atom, an alkoxy group having 1 to 6 carbon atoms, or an acyloxy group, and n represents an integer of 1 to 3; and a catalyst capable of interacting with the silane surfactant, and a production method thereof.
    Type: Application
    Filed: January 5, 2012
    Publication date: May 24, 2012
    Applicant: NIPPON SODA CO., LTD.
    Inventors: Tomoya HIDAKA, Norifumi NAKAMOTO, Yoshitaka FUJITA
  • Publication number: 20120082793
    Abstract: Dispersoids having metal-oxygen groups that are suitable for the production of metal oxide thin-films at a low temperature of 200° C. or below and for the production of homogeneous organic-inorganic hybrid materials. The dispersoid having metal-oxygen bonds may be obtained by mixing a metal compound having at least three hydrolyzable groups with at least 0.5 mole but less than 2 moles of water per mole of the metal compound in an organic solvent, in the absence of an acid, a base, and/or a dispersion stabilizer, and at a temperature at or below the temperature at which the metal compound begins to hydrolyze, then raising the temperature to at least the temperature at which hydrolysis begins.
    Type: Application
    Filed: December 14, 2011
    Publication date: April 5, 2012
    Applicant: NIPPON SODA CO., LTD.
    Inventors: Nobuo KIMURA, Yoshitaka FUJITA, Norifumi NAKAMOTO, Motoyuki TOKI, Akiji HIGUCHI, Kazuo ONO, Tomoya HIDAKA, Hiroyuki TAKEDA
  • Publication number: 20110135878
    Abstract: Dispersoids having metal-oxygen groups that are suitable for the production of metal oxide thin-films at a low temperature of 200° C. or below and for the production of homogeneous organic-inorganic hybrid materials. The dispersoid having metal-oxygen bonds may be obtained by mixing a metal compound having at least three hydrolyzable groups with at least 0.5 mole but less than 2 moles of water per mole of the metal compound in an organic solvent, in the absence of an acid, a base, and/or a dispersion stabilizer, and at a temperature at or below the temperature at which the metal compound begins to hydrolyze, then raising the temperature to at least the temperature at which hydrolysis begins.
    Type: Application
    Filed: February 2, 2011
    Publication date: June 9, 2011
    Applicant: NIPPON SODA, CO., LTD.
    Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Motoyuki Toki, Akiji Higuchi, Kazuo Ono, Tomoya Hidaka, Hiroyuki Takeda
  • Patent number: 7909929
    Abstract: The invention provides dispersoids having metal-oxygen groups which are suitable for the production of metal oxide thin-films at a low temperature of 200° C. or below and for the production of homogeneous organic-inorganic hybrid materials. The invention also provides metal oxide thin-films and organic-inorganic hybrid materials endowed with various capabilities, particularly organic-inorganic hybrid materials having a high refractive index and high transparency. Use is made of a dispersoid having metal-oxygen bonds which is obtained by mixing a metal compound having at least three hydrolyzable groups with at least 0.5 mole but less than 2 moles of water per mole of the metal compound in an organic solvent, in the absence of an acid, a base and/or a dispersion stabilizer, and at a temperature at or below the temperature at which the metal compound begins to hydrolyze, then raising the temperature to at least the temperature at which hydrolysis begins.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: March 22, 2011
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Motoyuki Toki, Akiji Higuchi, Kazuo Ono, Tomoya Hidaka, Hiroyuki Takeda
  • Publication number: 20100313789
    Abstract: A method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. Also, a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolysable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water contact within the organic solvent solution is either set or maintained within a predetermined range.
    Type: Application
    Filed: July 9, 2010
    Publication date: December 16, 2010
    Applicant: NIPPON SODA CO., LTD.
    Inventors: Nobuo KIMURA, Yoshitaka Fujita, Norifumi Nakamoto, Tomoya Hidaka
  • Publication number: 20100221443
    Abstract: An object of the present invention is to provide a method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. The present invention provides a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolysable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water contact within the organic solvent solution is either set or maintained within a predetermined range.
    Type: Application
    Filed: May 11, 2010
    Publication date: September 2, 2010
    Applicant: NIPPON SODA CO., LTD.
    Inventors: Nobuo KIMURA, Yoshitaka FUJITA, Norifumi NAKAMOTO, Tomoya HIDAKA
  • Patent number: 7776403
    Abstract: An object of the present invention is to provide a method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. The present invention provides a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolyzable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water content within the organic solvent solution is either set or maintained within a predetermined range.
    Type: Grant
    Filed: April 14, 2004
    Date of Patent: August 17, 2010
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Tomoya Hidaka
  • Publication number: 20090281238
    Abstract: The object is to provide a method for forming an organic thin film which enables to form quickly a dense monomolecular film with less impurity. It is a method for forming an organic thin film which comprises: 1) a step of preparing a hydroxyl group-containing solution by mixing the following (a), (b) and (c) so that the total amount of (A) and (B) in the hydroxyl group-containing solution becomes 0.
    Type: Application
    Filed: November 13, 2007
    Publication date: November 12, 2009
    Inventors: Tomoya Hidaka, Yoshitaka Fujita, Norifumi Nakamoto, Kazuhisa Kumazawa, Eiji Hoshi
  • Publication number: 20080290249
    Abstract: The present invention provides a forming mold or electroforming mother die comprising a mold or mother die, and a release layer composed of an organic thin film on a mold surface or mother die surface which is formed by contacting the mold or mother die with an organic solvent solution comprising a silane surfactant represented by the formula [1] Rn—Si—X4-n??[1] (wherein, R represents an optionally substituted hydrocarbon group having 1 to 20 carbon atoms, an optionally substituted halogenated hydrocarbon group having 1 to 20 carbon atom, a hydrocarbon group having a linking group which has 1 to 20 carbon atoms, or a halogenated hydrocarbon group having a linking group which has 1 to 20 carbon atoms, and X represents a hydroxyl group, a halogen atom, an alkoxy group having 1 to 6 carbon atoms, or an acyloxy group, and n represents an integer of 1 to 3), and a catalyst capable of interacting with the silane surfactant, the release layer having excellent releasing properties and abrasion resistance, and a pr
    Type: Application
    Filed: December 28, 2005
    Publication date: November 27, 2008
    Applicant: Nippon Soda Co., Ltd.
    Inventors: Tomoya Hidaka, Norifumi Nakamoto, Yoshitaka Fujita
  • Patent number: 7422642
    Abstract: To provide a method which allows the combination of rapid formation of a chemical adsorption film with the preparation of the film which is reduced in the content of impurities and having a dense structure. A method for preparing a chemical adsorption film on the surface of a substrate containing an active hydrogen, characterized in that it includes treating a metal based surfactant having at least one hydrolyzable group with a metal oxide or a partially hydrolyzed product from a metal alkoxide and water in an organic solvent to form a solution, and contacting the solution with the surface of the substrate.
    Type: Grant
    Filed: March 12, 2003
    Date of Patent: September 9, 2008
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto
  • Publication number: 20060239902
    Abstract: The invention provides dispersoids having metal-oxygen groups which are suitable for the production of metal oxide thin-films at a low temperature of 200° C. or below and for the production of homogeneous organic-inorganic hybrid materials. The invention also provides metal oxide thin-films and organic-inorganic hybrid materials endowed with various capabilities, particularly organic-inorganic hybrid materials having a high refractive index and high transparency. Use is made of a dispersoid having metal-oxygen bonds which is obtained by mixing a metal compound having at least three hydrolyzable groups with at least 0.5 mole but less than 2 moles of water per mole of the metal compound in an organic solvent, in the absence of an acid, a base and/or a dispersion stabilizer, and at a temperature at or below the temperature at which the metal compound begins to hydrolyze, then raising the temperature to at least the temperature at which hydrolysis begins.
    Type: Application
    Filed: November 12, 2003
    Publication date: October 26, 2006
    Applicant: NIPPON SODA CO., LTD.
    Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Motoyuki Toki, Akiji Higuchi, Kazuo Ono, Tomoya Hidaka, Hiroyuki Takeda
  • Publication number: 20060188657
    Abstract: An object of the present invention is to provide a method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. A method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolyzable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water content within the organic solvent solution is either set or maintained within a predetermined range.
    Type: Application
    Filed: April 14, 2004
    Publication date: August 24, 2006
    Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto, Tomoya Hidaka
  • Publication number: 20050167004
    Abstract: To provide a method which allows the combination of rapid formation of a chemical adsorption film with the preparation of the film which is reduced in the content of impurities and having a dense structure. A method for preparing a chemical adsorption film on the surface of a substrate containing an active hydrogen, characterized in that it includes treating a metal based surfactant having at least one hydrolyzable group with a metal oxide or a partially hydrolyzed product from a metal alkoxide and water in an organic solvent to form a solution, and contacting the solution with the surface of the substrate.
    Type: Application
    Filed: March 12, 2003
    Publication date: August 4, 2005
    Inventors: Nobuo Kimura, Yoshitaka Fujita, Norifumi Nakamoto