Patents by Inventor Norifumi Sato

Norifumi Sato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240148699
    Abstract: The present invention provides a oxazole compound represented by Formula (1), or a salt thereof: wherein R1 is an aryl group which may have one or more substituents; R2 is an aryl group or a nitrogen atom-containing heterocyclic group each of which may have one or more substituents; and W is a divalent group represented by —Y1-A1- or —Y2—C(?O)— wherein Y1 is a group such as —C(?O)—, A1 is a group such as a lower alkylene group, and Y2 is a group such as a piperazinediyl group. The oxazole compound has a specific inhibitory action against phosphodiesterase 4.
    Type: Application
    Filed: January 5, 2024
    Publication date: May 9, 2024
    Applicant: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Minoru Okada, Masaya Kato, Norifumi Sato, Tetsuyuki Uno, Hideki Kitagaki, Junpei Haruta, Hidetaka Hiyama, Tomonori Shibata
  • Publication number: 20220265613
    Abstract: The present invention provides an oxazole compound represented by Formula (1), or a salt thereof: wherein R1 is an aryl group which may have one or more substituents; R2 is an aryl group or a nitrogen atom-containing heterocyclic group each of which may have one or more substituents; and W is a divalent group represented by —Y1-A1- or —Y2—C(?O)— wherein Y1 is a group such as —C(?O)—, A1 is a group such as a tower alkylene group, and Y2 is a group such as a piperazinediyl group. The oxazole compound has a specific inhibitory action against phosphodiesterase 4.
    Type: Application
    Filed: February 24, 2022
    Publication date: August 25, 2022
    Applicant: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Minoru OKADA, Masaya Kato, Norifumi Sato, Tetsuyuki Uno, Hideki Kitagaki, Junpei Haruta, Hidetaka Hiyama, Tomonori Shibata
  • Publication number: 20200078340
    Abstract: The present invention provides a oxazole compound represented by Formula (1), or a salt thereof: wherein R1 is an aryl group which may have one or more substituents; R2 is an aryl group or a nitrogen atom-containing heterocyclic group each of which may have one or more substituents; and W is a divalent group represented by —Y1-A1- or —Y2—C(?O)— wherein Y1 is a group such as —C(?O)—, A1 is a group such as a lower alkylene group, and Y2 is a group such as a piperazinediyl group. The oxazole compound has a specific inhibitory action against phosphodiesterase 4.
    Type: Application
    Filed: November 12, 2019
    Publication date: March 12, 2020
    Applicant: OTSUKA PHARMACEUTICAL CO., LTD.
    Inventors: Minoru OKADA, Masaya KATO, Norifumi SATO, Tetsuyuki UNO, Hideki KITAGAKI, Junpei HARUTA, Hidetaka HIYAMA, Tomonori SHIBATA
  • Publication number: 20190070151
    Abstract: The present invention provides a oxazole compound represented by Formula (1), or a salt thereof: wherein R1 is an aryl group which may have one or more substituents; R2 is an aryl group or a nitrogen atom-containing heterocyclic group each of which may have one or more substituents; and W is a divalent group represented by —Y1-A1- or —Y2—C(?O)— wherein Y1 is a group such as —C(?O)—, A1 is a group such as a lower alkylene group, and Y2 is a group such as a piperazinediyl group. The oxazole compound has a specific inhibitory action against phosphodiesterase 4.
    Type: Application
    Filed: November 1, 2018
    Publication date: March 7, 2019
    Applicant: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Minoru OKADA, Masaya KATO, Norifumi SATO, Tetsuyuki UNO, Hideki KITAGAKI, Junpei HARUTA, Hidetaka HIYAMA, Tomonori SHIBATA
  • Publication number: 20170216260
    Abstract: The present invention provides a oxazole compound represented by Formula (1), or a salt thereof: wherein R1 is an aryl group which may have one or more substituents; R2 is an aryl group or a nitrogen atom-containing heterocyclic group each of which may have one or more substituents; and W is a divalent group represented by —Y1-A1- or —Y2—C(?O)— wherein Y1 is a group such as —C(?O)—, A1 is a group such as a lower alkylene group, and Y2 is a group such as a piperazinediyl group. The oxazole compound has a specific inhibitory action against phosphodiesterase 4.
    Type: Application
    Filed: April 11, 2017
    Publication date: August 3, 2017
    Applicant: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Minoru OKADA, Masaya KATO, Norifumi SATO, Tetsuyuki UNO, Hideki KITAGAKI, Junpei HARUTA, Hidetaka HIYAMA, Tomonori SHIBATA
  • Patent number: 9708292
    Abstract: The present invention relates to a novel cyanopyrimidine compound and a pharmaceutical composition which have a safe and potent adenosine A2a receptor agonistic activity.
    Type: Grant
    Filed: February 2, 2010
    Date of Patent: July 18, 2017
    Assignee: OTSUKA PHARMACEUTICAL CO., LTD.
    Inventors: Norifumi Sato, Yohei Yuki, Hisashi Shinohara, Yasuhiro Takeji, Kuni Ito, Daisaku Michikami, Keisuke Hino, Hiroyuki Yamazaki
  • Patent number: 8906852
    Abstract: This invention relates to compounds that inhibit protein tyrosine kinase activity. In particular the invention relates to compounds that inhibit the protein tyrosine kinase activity of growth factor receptors, resulting in the inhibition of receptor signaling, for example, the inhibition of VEGF receptor signaling. The invention also provides compounds, compositions and methods for treating cell proliferative diseases and conditions and ophthalmic diseases, disorders and conditions.
    Type: Grant
    Filed: April 8, 2011
    Date of Patent: December 9, 2014
    Assignee: MethylGene Inc.
    Inventors: Stéphane Raeppel, Franck Raeppel, Stephen William Claridge, Lijie Zhan, Frédéric Gaudette, Michael Mannion, Norifumi Sato, Yohei Yuki, Masashi Kishida, Arkadii Vaisburg
  • Publication number: 20140315801
    Abstract: This invention relates to methods for treating cell proliferative diseases and conditions and ophthalmic diseases, disorders and conditions using compounds that inhibit protein tyrosine kinase activity. In particular the invention relates to the methods of treatment which utilize compounds that inhibit the protein tyrosine kinase activity of growth factor receptors, resulting in the inhibition of receptor signaling, for example, the inhibition of VEGF receptor signaling.
    Type: Application
    Filed: June 18, 2014
    Publication date: October 23, 2014
    Inventors: Stéphane Raeppel, Franck Raeppel, Stephen William Claridge, Lijie Zhan, Frederic Gaudette, Michael Mannion, Norifumi Sato, Yohei Yuki, Masashi Kishida, Arkadii Vaisburg
  • Patent number: 8707893
    Abstract: A substrate treatment system includes a plurality of treatment apparatuses, a position adjustment apparatus adjusting a center position of the substrate, a substrate transfer apparatus transferring the substrate to the treatment apparatuses and the position adjustment apparatus, and a control unit controlling operations of the apparatuses. The substrate transfer apparatus includes an arm part curved along a peripheral edge portion of the substrate with a radius of curvature larger than a radius of the substrate, and a holding part projecting inward from the arm part and holding a rear surface of the substrate. The position adjustment apparatus includes a mounting table which holds a central portion of the rear surface of the substrate and is rotatable and horizontally movable. The control unit controls the mounting table such that the center position of the substrate held on the mounting table is aligned with a center position of the arm part.
    Type: Grant
    Filed: November 18, 2011
    Date of Patent: April 29, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Masatoshi Deguchi, Hideo Funakoshi, Toshichika Takei, Norifumi Sato, Wataru Kiyota, Daisuke Ishimaru, Shinichi Machidori, Ikuo Sunaka, Shigenori Kamei
  • Publication number: 20140100226
    Abstract: The present invention provides a oxazole compound represented by Formula (1), or a salt thereof: wherein R1 is an aryl group which may have one or more substituents; R2 is an aryl group or a nitrogen atom-containing heterocyclic group each of which may have one or more substituents; and W is a divalent group represented by —Y1-A1- or —Y2—C(?O)— wherein Y1 is a group such as —C(?O)—, A1 is a group such as a lower alkylene group, and Y2 is a group such as a piperazinediyl group. The oxazole compound has a specific inhibitory action against phosphodiesterase 4.
    Type: Application
    Filed: December 12, 2013
    Publication date: April 10, 2014
    Applicant: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Minoru OKADA, Masaya KATO, Norifumi SATO, Tetsuyuki UNO, Hideki KITAGAKI, Junpei HARUTA, Hidetaka HIYAMA, Tomonori SHIBATA
  • Patent number: 8637559
    Abstract: The present invention provides a oxazole compound represented by Formula (1), or a salt thereof: wherein R1 is an aryl group which may have one or more substituents; R2 is an aryl group or a nitrogen atom-containing heterocyclic group each of which may have one or more substituents; and W is a divalent group represented by —Y1-A1- or —Y2—C(?O)— wherein Y1 is a group such as —C(?O)—, A1 is a group such as a lower alkylene group, and Y2 is a group such as a piperazinediyl group. The oxazole compound has a specific inhibitory action against phosphodiesterase 4.
    Type: Grant
    Filed: November 14, 2006
    Date of Patent: January 28, 2014
    Assignee: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Minoru Okada, Masaya Kato, Norifumi Sato, Tetsuyuki Uno, Hideki Kitagaki, Junpei Haruta, Hidetaka Hiyama, Tomonori Shibata
  • Patent number: 8518480
    Abstract: The present invention is a method of developing a resist film on a substrate using a developing solution at a predetermined temperature lower than room temperature, including a first cooling step of mounting and cooling the substrate on a cooling plate at a temperature lower than room temperature and higher than the predetermined temperature in a cooling apparatus; a second cooling step of then carrying the substrate into a developing apparatus and supplying a rinse solution at the predetermined temperature or lower onto the substrate to cool the substrate in the developing apparatus; a developing step of then supplying the developing solution onto the substrate and developing the resist film on the substrate to form a resist pattern in the resist film; and a cleaning step of then supplying a rinse solution at the predetermined temperature onto the substrate to clean a front surface of the substrate.
    Type: Grant
    Filed: January 11, 2011
    Date of Patent: August 27, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Norifumi Sato, Yukio Kiba, Tetsushi Miyamoto, Kazuhisa Hasebe
  • Publication number: 20120135148
    Abstract: A substrate treatment system includes a plurality of treatment apparatuses, a position adjustment apparatus adjusting a center position of the substrate, a substrate transfer apparatus transferring the substrate to the treatment apparatuses and the position adjustment apparatus, and a control unit controlling operations of the apparatuses. The substrate transfer apparatus includes an arm part curved along a peripheral edge portion of the substrate with a radius of curvature larger than a radius of the substrate, and a holding part projecting inward from the arm part and holding a rear surface of the substrate. The position adjustment apparatus includes a mounting table which holds a central portion of the rear surface of the substrate and is rotatable and horizontally movable. The control unit controls the mounting table such that the center position of the substrate held on the mounting table is aligned with a center position of the arm part.
    Type: Application
    Filed: November 18, 2011
    Publication date: May 31, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Masatoshi Deguchi, Hideo Funakoshi, Toshichika Takei, Norifumi Sato, Wataru Kiyota, Daisuke Ishimaru, Shinichi Machidori, Ikuo Sunaka, Shigenori Kamei
  • Publication number: 20120022077
    Abstract: The present invention relates to a novel cyanopyrimidine compound and a pharmaceutical composition which have a safe and potent adenosine A2a receptor agonistic activity.
    Type: Application
    Filed: February 2, 2010
    Publication date: January 26, 2012
    Inventors: Norifumi Sato, Yohei Yuki, Hisashi Shinohara, Yasuhiro Takeji, Kuni Ito, Daisaku Michikami, Keisuke Hino, Hiroyuki Yamazaki
  • Publication number: 20110257100
    Abstract: This invention relates to compounds that inhibit protein tyrosine kinase activity. In particular the invention relates to compounds that inhibit the protein tyrosine kinase activity of growth factor receptors, resulting in the inhibition of receptor signaling, for example, the inhibition of VEGF receptor signaling. The invention also provides compounds, compositions and methods for treating cell proliferative diseases and conditions and ophthalmic diseases, disorders and conditions.
    Type: Application
    Filed: April 8, 2011
    Publication date: October 20, 2011
    Inventors: Stëphane Raeppel, Franck Raeppel, Stephen William Claridge, Lijie Zhan, Frëdëric Gaudette, Michael Mannion, Norifumi Sato, Yohei Yuki, Masashi Kishida, Arkadii Vaisburg
  • Patent number: 7989446
    Abstract: The present invention provides 4-amino-5-cyanopyrimidine derivatives of the formula: wherein R1, R2 and R3 are defined herein, or pharmaceutically acceptable salts thereof, having a safe and potent adenosine A2a receptor agonistic activity; and also provides an adenosine A2a receptor agonist, an intraocular pressure reducing agent, or a medicine for treating glaucoma, etc., which comprises the compound as an active ingredient.
    Type: Grant
    Filed: September 22, 2010
    Date of Patent: August 2, 2011
    Assignee: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Masaya Kato, Norifumi Sato, Minoru Okada, Tetsuyuki Uno, Nobuaki Ito, Yasuhiro Takeji, Hisashi Shinohara, Masahiro Fuwa
  • Publication number: 20110183073
    Abstract: The present invention is a method of developing a resist film on a substrate using a developing solution at a predetermined temperature lower than room temperature, including a first cooling step of mounting and cooling the substrate on a cooling plate at a temperature lower than room temperature and higher than the predetermined temperature in a cooling apparatus; a second cooling step of then carrying the substrate into a developing apparatus and supplying a rinse solution at the predetermined temperature or lower onto the substrate to cool the substrate in the developing apparatus; a developing step of then supplying the developing solution onto the substrate and developing the resist film on the substrate to form a resist pattern in the resist film; and a cleaning step of then supplying a rinse solution at the predetermined temperature onto the substrate to clean a front surface of the substrate.
    Type: Application
    Filed: January 11, 2011
    Publication date: July 28, 2011
    Applicant: Tokyo Electron Limited
    Inventors: Norifumi Sato, Yukio Kiba, Tetsushi Miyamoto, Kazuhisa Hasebe
  • Patent number: D665759
    Type: Grant
    Filed: June 10, 2011
    Date of Patent: August 21, 2012
    Assignee: Tokyo Electron Limited
    Inventor: Norifumi Sato
  • Patent number: D666979
    Type: Grant
    Filed: June 10, 2011
    Date of Patent: September 11, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Akihiro Teramoto, Norifumi Sato
  • Patent number: RE46792
    Abstract: The present invention provides a oxazole compound represented by Formula (1), or a salt thereof: wherein R1 is an aryl group which may have one or more substituents; R2 is an aryl group or a nitrogen atom-containing heterocyclic group each of which may have one or more substituents; and W is a divalent group represented by —Y1-A1- or or —Y2—C(?O)— wherein Y1 is a group such as —C(?O)—, A1 is a group such as a lower alkylene group, and Y2 is a group such as a piperazinediyl group. The oxazole compound has a specific inhibitory action against phosphodiesterase 4.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: April 17, 2018
    Assignee: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Minoru Okada, Masaya Kato, Norifumi Sato, Tetsuyuki Uno, Hideki Kitagaki, Junpei Haruta, Hidetaka Hiyama, Tomonori Shibata