Abstract: A germ-free glove box includes: a housing in which a germ-free space is formed, the housing including a connector to which a container housing an object is connected; and a glove provided at a front plate of the housing to allow an operating personnel to perform an operation in the germ-free space from the outside of the housing. In this germ-free glove box, the connector is provided on an upper plate of the housing. In the germ-free glove box outside spaces beside the box are effectively utilized, and a large working space is secured at around the bottom surface of a germ-free space.

Abstract: A bag transport and tilt-correction device for a system for, for instance, manufacturing bags with diagonal spouts, the device including openable and closeable gripping members, an air chuck that opens and closes the gripping members, a reciprocal movement mechanism that reciprocates the gripping members between the bag receiving position and the bag hand-over position, and a reciprocal swing mechanisms that swing the gripping members within the vertical plane along the width direction of the gripped bags. The gripping members are moved together with a reciprocal moving body, which is part of the reciprocal movement mechanisms, and attached to the bottom edge of swing levers, which are part of the reciprocal swing mechanism and operated by a cam during the reciprocal movement process, so as to swing together with it. The tilt of the bag is corrected by the swing motion of the gripping members.

Abstract: Disclosed herein is a processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss. The processing system has a processing apparatus including a gas injection injector for injecting a specific material gas into a processing vessel in order to provide specific processing to an object to be processed W, the material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system for supplying the specific material gas to the gas injector, the gas injector is a shower head portion and the gas supply system provides: a gas passage extending upwardly from the showerhead portion; a material reservoir tank attached to the upper-end portion of the gas passage for containing the metallic compound material therein; and an open/close valve for opening/closing the gas passage.

Abstract: A bag transport and tilt-correction device for a system for, for instance, manufacturing bags with diagonal spouts, the device including openable and closeable gripping members, an air chuck that opens and closes the gripping members, a reciprocal movement mechanism that reciprocates the gripping members between the bag receiving position and the bag hand-over position, and a reciprocal swing mechanisms that swing the gripping members within the vertical plane along the width direction of the gripped bags. The gripping members are moved together with a reciprocal moving body, which is part of the reciprocal movement mechanisms, and attached to the bottom edge of swing levers, which are part of the reciprocal swing mechanism and operated by a cam during the reciprocal movement process, so as to swing together with it. The tilt of the bag is corrected by the swing motion of the gripping members.

Abstract: A gas processing apparatus 1 includes a processing container 2 for applying a processing to a wafer W while using a processing gas, a mount table 5 arranged in the processing container 2 to mount the wafer W, a shower head 22 arranged corresponding to the wafer W on the mount table 5 to discharge the processing gas into the processing container 2 and exhausting means 132 for exhausting the interior of the processing container 2. The shower head 22 has first gas discharging holes 46 arranged corresponding to the wafer W mounted on the mount table 5 and second gas discharging holes 47 arranged around the first gas discharging holes 46 independently to discharge the processing gas to the peripheral part of the wafer W. Thus, with a uniform gas supply to a substrate, it is possible to perform a uniform gas processing.

Abstract: A processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss is provided. In a processing system comprising: a processing apparatus including a gas injection means 42 for injecting a specific material gas into a processing vessel 26 in order to provide specific processing to an object to be processed W, said material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system 24 for supplying said specific material gas to said gas injection means, said gas injection means is a shower head portion and said gas supply system provides: a gas passage 56 extending upwardly from said showerhead portion; a material reservoir tank 58 attached to the upper-end portion of said gas passage for containing said metallic compound material therein; and an open/close valve 60 for opening/closing said gas passage.

Abstract: A processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss is provided. In a processing system comprising: a processing apparatus including a gas injection means 42 for injecting a specific material gas into a processing vessel 26 in order to provide specific processing to an object to be processed W, said material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system 24 for supplying said specific material gas to said gas injection means, said gas injection means is a shower head portion and said gas supply system provides: a gas passage 56 extending upwardly from said showerhead portion; a material reservoir tank 58 attached to the upper-end portion of said gas passage for containing said metallic compound material therein; and an open/close valve 60 for opening/closing said gas passage.

Abstract: A processing gas supply mechanism installed on a processing chamber of a film forming apparatus for supplying a processing gas containing a metal organic compound onto a substrate to be processed includes a processing gas inlet opening for introducing the processing gas, a diffusion space for diffusing the processing gas introduced from the processing gas inlet opening, a processing gas supply mechanism main body for forming the processing gas diffusion space, and one or more processing gas supply holes for supplying the processing gas from the diffusion space to a processing space on the substrate in the processing chamber. Further, the processing gas supply holes are shaped to have a Peclet number of 0.5 to 2.5 when the processing gas passes therethrough.

Abstract: A film forming unit includes a source vessel for receiving a raw material from which source gas is produced, a processing vessel for applying a film forming process on a semiconductor substrate, a source supply line for supplying the source gas from the source vessel to the processing vessel, a gas exhaust line for exhausting gas from the processing vessel, having a vacuum pump system structured by a turbo molecular pump and a dry pump, and a pre-flow line branching off from the source supply line while bypassing the processing vessel and the turbo molecular pump, and joining to the gas exhaust line. Moreover, the source supply line includes piping having an inner diameter greater than 6.4 mm, and a turbo molecular pump is provided in the pre-flow line.

Abstract: A gas processing apparatus 1 includes a processing container 2 for applying a processing to a wafer W while using a processing gas, a mount table 5 arranged in the processing container 2 to mount the wafer W, a shower head 22 arranged corresponding to the wafer W on the mount table 5 to discharge the processing gas into the processing container 2 and exhausting means 132 for exhausting the interior of the processing container 2. The shower head 22 has first gas discharging holes 46 arranged corresponding to the wafer W mounted on the mount table 5 and second gas discharging holes 47 arranged around the first gas discharging holes 46 independently to discharge the processing gas to the peripheral part of the wafer W. Thus, with a uniform gas supply to a substrate, it is possible to perform a uniform gas processing.

Abstract: A jig for a cross hatching test which is rectangular in shape and is used for ruling straight lines intersecting each other at a predetermined angle on a rectangular test plate, including (a) a first straight line passing on the surface of the jig with an angle, for adjusting the left longer side of the test plate to draw a straight line on the test plate with the right longer side of the jig; (b) a second straight line orthogonal to the first straight line, for adjusting the lower shorter side of the test plate; (c) a third straight line with the predetermined angle to the left longer side of the jig, for adjusting the drawn straight line to draw another straight line with the left longer side of the jib with the predetermined angle to the previously drawn straight line; and (d) an opening interposed in the middle of the first straight line, for adjusting the left longer side of the plate to the first straight line to draw the straight line on the test plate with the right longer side of the jig.

Abstract: A product of fish meat paste simulating shrimp, prawn or lobster, prepared by mixing 1 part by weight of fish meat paste and 0.2 to 2.5 parts by weight of edible fibrous material having a three-dimensional reticulate structure, kneading the mixture and forming the kneaded mixture into pieces of a predetermined shape and size. The fibrous material may be replaced by 0.4 to 2.0 parts by weight of edible fibers of less than 0.5 mm in diameter. The edible fibrous material or fibers incorporated into the fish meat paste impart to the product a texture which gives a particular oral sensation as if real shrimp, prawn or lobster were being eaten.