Patents by Inventor Norihiro TAMURA

Norihiro TAMURA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9997650
    Abstract: A solar cell includes: a first-conductivity-type semiconductor substrate that includes an impurity diffusion layer on one surface side, which is a light receiving surface side, the impurity diffusion layer having a second-conductivity-type impurity element diffused therein; a plurality of linear light-receiving-surface-side electrodes that are a paste electrode that has a multi-layered structure, is formed by multi-layer printing of an electrode material paste on the one surface side, and is electrically connected to the impurity diffusion layer and that extend in parallel in a specific direction in a plane direction of the semiconductor substrate; and a back-surface-side electrode that is formed on another surface side of the semiconductor substrate. In the light-receiving-surface-side electrodes, the light-receiving-surface-side electrodes get smaller in width as they get closer in a width direction of the light-receiving-surface-side electrodes to a specific reference position.
    Type: Grant
    Filed: November 7, 2013
    Date of Patent: June 12, 2018
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Norihiro Tamura, Hayato Kohata, Atsuro Hama
  • Publication number: 20160260852
    Abstract: A solar cell includes: a first-conductivity-type semiconductor substrate that includes an impurity diffusion layer on one surface side, which is a light receiving surface side, the impurity diffusion layer having a second-conductivity-type impurity element diffused therein; a plurality of linear light-receiving-surface-side electrodes that are a paste electrode that has a multi-layered structure, is formed by multi-layer printing of an electrode material paste on the one surface side, and is electrically connected to the impurity diffusion layer and that extend in parallel in a specific direction in a plane direction of the semiconductor substrate; and a back-surface-side electrode that is formed on another surface side of the semiconductor substrate. In the light-receiving-surface-side electrodes, the light-receiving-surface-side electrodes get smaller in width as they get closer in a width direction of the light-receiving-surface-side electrodes to a specific reference position.
    Type: Application
    Filed: November 7, 2013
    Publication date: September 8, 2016
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Norihiro TAMURA, Hayato KOHATA, Atsuro HAMA
  • Publication number: 20160233353
    Abstract: An n-type impurity diffusion layer includes a plurality of linear first n-type impurity diffusion layers and a second n-type impurity diffusion layer. The first n-type impurity diffusion layers extend in parallel in a specific direction, are disposed in a lower region under surface silver grid electrodes and a peripheral region that extends from the lower region, and contain an impurity element at a first concentration. The second n-type impurity diffusion layer contains the impurity element at a second concentration, which is lower than the first concentration. In the first n-type impurity diffusion layers, the first n-type impurity diffusion layers get smaller in width as they get closer in a width direction of the first n-type impurity diffusion layers to a specific reference position.
    Type: Application
    Filed: November 7, 2013
    Publication date: August 11, 2016
    Applicant: Mitsubishi Electric Corporation
    Inventors: Norihiro TAMURA, Hayato KOHATA, Atsuro HAMA