Patents by Inventor Norihito Tachi

Norihito Tachi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230333473
    Abstract: A photosensitive resin printing plate precursor includes at least a support and a photosensitive resin layer, wherein the photosensitive resin layer contains at least a polymer (A) having an ethylenic double bond, a compound (B) having an ethylenic double bond, and a photopolymerization initiator (C); wherein the photosensitive resin layer includes at least a first photosensitive resin layer including a printing surface, and a second photosensitive resin layer including the interior of the photosensitive resin layer; and wherein the ethylenic double bond equivalent F1 (g/eq) of component (A) in the first photosensitive resin layer is higher than the ethylenic double bond equivalent F2 (g/eq) of component (A) in the second photosensitive resin layer.
    Type: Application
    Filed: July 26, 2021
    Publication date: October 19, 2023
    Inventors: Kenji Ido, Tsutomu Abura, Norihito Tachi
  • Patent number: 11137683
    Abstract: A photosensitive resin composition and a photosensitive resin printing plate precursor which allow development that uses a solution containing a lower alcohol and which are excellent in abrasion resistance and excellent in the ink wiping characteristics of a plate surface exhibited when the plate surface is squeegeed with a blade of a pad printer are provided. The photosensitive resin composition is characterized by containing (A) an inorganic fine particle whose average particle diameter is greater than or equal to 0.5 ?m and less than or equal to 4 ?m and whose sphericity is greater than or equal to 0.9, (B) a polyamide having in its molecular main chain an aliphatic ring and/or a skeleton represented by general formula (1), (C) a compound having an ethylenic double bond, and (D) a photopolymerization initiating agent.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: October 5, 2021
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Tsutomu Abura, Norihito Tachi, Kohei Ideta, Ryosuke Takahashi
  • Publication number: 20200103753
    Abstract: A photosensitive resin composition and a photosensitive resin printing plate precursor which allow development that uses a solution containing a lower alcohol and which are excellent in abrasion resistance and excellent in the ink wiping characteristics of a plate surface exhibited when the plate surface is squeegeed with a blade of a pad printer are provided. The photosensitive resin composition is characterized by containing (A) an inorganic fine particle whose average particle diameter is greater than or equal to 0.5 ?m and less than or equal to 4 ?m and whose sphericity is greater than or equal to 0.9, (B) a polyamide having in its molecular main chain an aliphatic ring and/or a skeleton represented by general formula (1), (C) a compound having an ethylenic double bond, and (D) a photopolymerization initiating agent.
    Type: Application
    Filed: December 20, 2017
    Publication date: April 2, 2020
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Tsutomu ABURA, Norihito TACHI, Kohei IDETA, Ryosuke TAKAHASHI
  • Patent number: 10583679
    Abstract: A photosensitive resin printing plate precursor includes at least a substrate and a photosensitive resin layer, the photosensitive resin layer containing: (A) a partially saponified polyvinyl acetate, (B) a polyamide having basic nitrogen, (C) a compound having an ethylenic double bond, and (D) a photopolymerization initiator; the photosensitive resin layer including at least an underlayer and a printing surface layer; the substrate, the underlayer, and the printing surface layer being included in this order; and the photosensitive resin layer containing, as the partially saponified polyvinyl acetate (A), those (A1) having an average polymerization degree of 1,200 to 2,600 in the printing surface layer and those (A2) having an average polymerization degree of 400 to 800 in the underlayer.
    Type: Grant
    Filed: September 2, 2016
    Date of Patent: March 10, 2020
    Assignee: Toray Industries, Inc.
    Inventors: Hiroyuki Kawahara, Norihito Tachi, Kei Nagano
  • Publication number: 20190039397
    Abstract: A photosensitive resin printing plate precursor includes at least a substrate and a photosensitive resin layer, the photosensitive resin layer containing: (A) a partially saponified polyvinyl acetate, (B) a polyamide having basic nitrogen, (C) a compound having an ethylenic double bond, and (D) a photopolymerization initiator; the photosensitive resin layer including at least an underlayer and a printing surface layer; the substrate, the underlayer, and the printing surface layer being included in this order; and the photosensitive resin layer containing, as the partially saponified polyvinyl acetate (A), those (A1) having an average polymerization degree of 1,200 to 2,600 in the printing surface layer and those (A2) having an average polymerization degree of 400 to 800 in the underlayer.
    Type: Application
    Filed: September 2, 2016
    Publication date: February 7, 2019
    Applicant: Toray Industries, Inc.
    Inventors: Hiroyuki Kawahara, Norihito Tachi, Kei Nagano