Patents by Inventor Noriko Kimoto

Noriko Kimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7984396
    Abstract: The EB data is separated into an area A and other area. The area A is covered by a recognition layer to which an algorism is linked to form a recognition layer A. For arranging a same dummy pattern for respective areas A, a dummy pattern creation starting point is designated in a common position for each recognition layer A. When there are areas A which have different rotation angles, the recognition layer is created to satisfy a condition that, even if any corner of the area A is designated as the dummy pattern creation starting point, the created dummy pattern becomes an identical arrangement. The sizes DP and gaps GAP of the dummy pattern elements composing the dummy pattern are respectively same in X-direction and Y-direction. The size of the recognition layer A is determined by: a multiple of (DP+GAP)+DP, in X and Y-direction respectively.
    Type: Grant
    Filed: August 13, 2008
    Date of Patent: July 19, 2011
    Assignee: Renesas Electronics Corporation
    Inventor: Noriko Kimoto
  • Publication number: 20090055794
    Abstract: The EB data is separated into an area A and other area. The area A is covered by a recognition layer to which an algorism is linked to form a recognition layer A. For arranging a same dummy pattern for respective areas A, a dummy pattern creation starting point is designated in a common position for each recognition layer A. When there are areas A which have different rotation angles, the recognition layer is created to satisfy a condition that, even if any corner of the area A is designated as the dummy pattern creation starting point, the created dummy pattern becomes an identical arrangement. The sizes DP and gaps GAP of the dummy pattern elements composing the dummy pattern are respectively same in X-direction and Y-direction. The size of the recognition layer A is determined by: a multiple of (DP+GAP)+DP, in X and Y-direction respectively.
    Type: Application
    Filed: August 13, 2008
    Publication date: February 26, 2009
    Inventor: Noriko Kimoto