Patents by Inventor Noriko Okoshi

Noriko Okoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6444255
    Abstract: An electrode substrate is brush cleaned with a hydrogen gas dissolved water, which has an oxidation-reduction potential of −860 mV to −400 mV and a pH of 8 to 12, before applying an alignment layer material on the electrode substrate. Thus, it is possible to decrease the manufacturing costs without decreasing the detergency.
    Type: Grant
    Filed: February 13, 2001
    Date of Patent: September 3, 2002
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiyuki Nagahara, Naoya Hayamizu, Naoaki Sakurai, Noriko Okoshi, Toshitaka Nonaka, Hiroaki Furuya
  • Publication number: 20010012544
    Abstract: An electrode substrate is brush cleaned with a hydrogen gas dissolved water, which has an oxidation-reduction potential of −860 mV to −400 mV and a pH of 8 to 12, before applying an alignment layer material on the electrode substrate. Thus, it is possible to decrease the manufacturing costs without decreasing the detergency.
    Type: Application
    Filed: February 13, 2001
    Publication date: August 9, 2001
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yoshiyuki Nagahara, Naoya Hayamizu, Naoaki Sakurai, Noriko Okoshi, Toshitaka Nonaka, Hiroaki Furuya
  • Patent number: 6210748
    Abstract: An electrode substrate is brush cleaned with a hydrogen gas dissolved water, which has an oxidation-reduction potential of −860 mV to −400 mV and a pH of 8 to 12, before applying an alignment layer material on the electrode substrate. Thus, it is possible to decrease the manufacturing costs without decreasing the detergency.
    Type: Grant
    Filed: June 17, 1998
    Date of Patent: April 3, 2001
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiyuki Nagahara, Naoya Hayamizu, Naoaki Sakurai, Noriko Okoshi, Toshitaka Nonaka, Hiroaki Furuya
  • Patent number: 6007638
    Abstract: A detergent composition for cleaning the surface of a substrate prior to or after application of an organic or inorganic thin film thereon, comprises: (A) a compound selected from the compounds represented by the formula: R.sub.1 --O--(A.sub.1 O).sub.n --R.sub.2 (wherein R.sub.1 represents an alkyl or alkenyl group having 1 to 7 carbon atoms or a phenyl group; A.sub.1 represents an alkylene group having 2 to 4 carbon atoms; R.sub.2 represents an alkyl or alkenyl group having 1 to 6 carbon atoms or a hydrogen atom; and n is a numerical value ranging from 1 to 6); (B) a compound selected from at least one of those represented by the formulas: R.sub.3 --O--(A.sub.2 O).sub.m --H and R.sub.4 --O--(A.sub.3 O).sub.m --H (wherein R.sub.3 represents an alkylphenyl or alkenylphenyl group having 12 to 25 carbon atoms; A.sub.2 represents an alkylene group having 2 to 4 carbon atoms; R.sub.4 represents an alkyl or alkenyl group having 8 to 25 carbon atoms; A.sub.
    Type: Grant
    Filed: February 11, 1997
    Date of Patent: December 28, 1999
    Assignee: Lion Corporation
    Inventors: Akira Shinohara, Hirotoshi Ushiyama, Miwa Sugano, Naoaki Sakurai, Noriko Okoshi, Toshiharu Nakagawa