Patents by Inventor Norimitsu Takagi

Norimitsu Takagi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8304534
    Abstract: A process for producing the crystals of difructose dianhydride III (DFA III), namely a indigestible disaccharide where two fructose molecules are bonded to each other at positions 1, 2? and 2,3? (di-D-fructofuranose-1,2?:2,3?-dianhydride), where solutions containing DFA III are adjusted to and/or maintained at pH 5 or more, preferably pH 5 to 8, and more preferably 6 to 8. DFA III can be produced industrially without lowering the crystal yield even when the crystallization thereof is done in a recycling system; additionally by adjusting the total fructose content in mother solutions for (crude) crystallization to 5% or less per a solid content basis and adjusting the fructose content to 1% or less, DFA III can more effectively be produced.
    Type: Grant
    Filed: August 16, 2011
    Date of Patent: November 6, 2012
    Assignee: Nippon Beet Sugar Manufacturing Co., Ltd.
    Inventors: Taizo Nagura, Katsuya Honjyo, Hiroto Kikuchi, Norimitsu Takagi, Tsutomu Aritsuka
  • Publication number: 20110300581
    Abstract: A process for producing the crystals of difructose dianhydride III (DFA III), namely a indigestible disaccharide where two fructose molecules are bonded to each other at positions 1,2? and 2,3? (di-D-fructofuranose-1,2?:2,3?-dianhydride), where solutions containing DFA III are adjusted to and/or maintained at pH 5 or more, preferably pH 5 to 8, and more preferably 6 to 8. DFA III can be produced industrially without lowering the crystal yield even when the crystallization thereof is done in a recycling system; additionally by adjusting the total fructose content in mother solutions for (crude) crystallization to 5% or less per a solid content basis and adjusting the fructose content to 1% or less, DFA III can more effectively be produced.
    Type: Application
    Filed: August 16, 2011
    Publication date: December 8, 2011
    Applicant: NIPPON BEET SUGAR MANUFACTURING CO., LTD.
    Inventors: Taizo NAGURA, Katsuya Honjyo, Hiroto Kikuchi, Norimitsu Takagi, Tsutomu Aritsuka
  • Patent number: 8039615
    Abstract: The invention provides a process for producing the crystals of difructose dianhydride III (DFA III), namely a indigestible disaccharide where two fructose molecules are bonded to each other at positions 1,2? and 2,3? (di-D-fructofuranose-1,2?,2,3?-dianhydride), where solutions containing DFA III are adjusted to and/or maintained at pH 5 or more, preferably pH 5 to 8, and more preferably 6 to 8. In accordance with the invention, DFA III can be produced industrially without lowering the crystal yield even when the crystallization thereof is done in a recycling system; additionally by adjusting the total fructose content in mother solutions for (crude) crystallization to 5% or less per a solid content basis and adjusting the fructose content to 1% or less, DFA III can more effectively be produced.
    Type: Grant
    Filed: December 28, 2004
    Date of Patent: October 18, 2011
    Assignee: Nippon Beet Sugar Manufacturing Co., Ltd.
    Inventors: Taizo Nagura, Katsuya Honjyo, Hiroto Kikuchi, Norimitsu Takagi, Tsutomu Aritsuka
  • Patent number: 7998710
    Abstract: In the invention, highly pure crystals of difructose dianhydride III (di-D-fructofuranose-1,2?:2,3?-dianhydride; hereinafter referred to as DFA III) are produced by adding 5% or less of powdered active carbon to a DFA III containing purified solution containing DFA III of 90% or more purity at a concentration of R-Bx 10-60, preferably 40-55, and after stirring, applying the mixture to solid-liquid separation (filtration with diatomaceous, filtration through a membrane filter, ultrafiltration, or continuous centrifugal separation) and concentrating the separated liquid part, followed by immediate crystallization. In the process of the invention, DFA III crystals can be produced efficiently and industrially, and the resulting crystals can be used for various purposes in pharmaceuticals or food and drink since they have no smell. This is characteristics of the invention different from the prior art products.
    Type: Grant
    Filed: March 2, 2004
    Date of Patent: August 16, 2011
    Assignee: Nippon Beet Sugar Mfg., Co., Ltd.
    Inventors: Hiroto Kikuchi, Hiroaki Sakurai, Norimitsu Takagi, Tsutomu Aritsuka, Yoshihiro Senba, Fusao Tomita, Kozo Asano
  • Patent number: 7704878
    Abstract: A contact structure in a semiconductor device includes a layer of dielectric material and a via formed through the dielectric material. The contact structure further includes a spacer formed on sidewalls of the via using atomic layer deposition (ALD) and a metal deposited in the via.
    Type: Grant
    Filed: October 3, 2005
    Date of Patent: April 27, 2010
    Assignees: Advanced Micro Devices, Inc,, Spansion LLC
    Inventors: Minh Van Ngo, Angela T. Hui, Amol Ramesh Joshi, Wenmei Li, Ning Cheng, Ankur Bhushan Agarwal, Norimitsu Takagi
  • Publication number: 20070287835
    Abstract: The invention provides a process for producing the crystals of difructose dianhydride III (DFA III), namely a indigestible disaccharide where two fructose molecules are bonded to each other at positions 1,2? and 2,3?(di-D-fructofuranose-1,2?:2,3?-dianhydride), where solutions containing DFA III are adjusted to and/or maintained at pH 5 or more, preferably pH 5 to 8, and more preferably 6 to 8. In accordance with th invention, DFA III can be produced industrially without lowering the crystal yield even when the crystallization thereof is done in a recycling system; additionally by adjusting the total fructose content in mother solutions for (crude) crystallization to 5% or less per a solid content basis and adjusting the fructose content to 1% or less, DFA III can more effectively be produced.
    Type: Application
    Filed: December 28, 2004
    Publication date: December 13, 2007
    Applicant: Nippon Beet Sugar Manufacturing Co., Ltd.
    Inventors: Taizo Nagura, Katsuya Honjyo, Hiroto Kikuchi, Norimitsu Takagi, Tsutomu Aritsuka
  • Publication number: 20070077754
    Abstract: A contact structure in a semiconductor device includes a layer of dielectric material and a via formed through the dielectric material. The contact structure further includes a spacer formed on sidewalls of the via using atomic layer deposition (ALD) and a metal deposited in the via.
    Type: Application
    Filed: October 3, 2005
    Publication date: April 5, 2007
    Inventors: Minh Ngo, Angela Hui, Amol Joshi, Wenmei Li, Ning Cheng, Ankur Agarwal, Norimitsu Takagi
  • Publication number: 20060051845
    Abstract: In the invention, highly pure crystals of difructose dianhydride III (di-D-fructofuranose-1,2?:2,3 ?-dianhydride; hereinafter referred to as DFA III) are produced by adding 5% or less of powdered active carbon to a DFA III containing purified solution containing DFA III of 90% or more purity at a concentration of R-Bx 10-60, preferably 40-55, and after stirring, applying the mixture to solid-liquid separation (filtration with diatomaceous, filtration through a membrane filter, ultrafiltration, or continuous centrifugal separation) and concentrating the separated liquid part, followed by immediate crystallization. In the process of the invention, DFA III crystals can be produced efficiently and industrially, and the resulting crystals can be used for various purposes in pharmaceuticals or food and drink since they have no smell. This is characteristics of the invention different from the prior art products.
    Type: Application
    Filed: March 2, 2004
    Publication date: March 9, 2006
    Applicant: NIPPON BEET SUGAR MFG., CO LTD.
    Inventors: Hiroto Kikuchi, Hiroaki Sakurai, Norimitsu Takagi, Tsutomu Aritsuka, Yoshihiro Senba, Fusao Tomita, Kozo Asano
  • Patent number: 5397738
    Abstract: A process of the formation of heteroepitaxy including heating a silicon substrate in gas ambience including one of a hydride of a IIIB group element and an organic substance of a IIIB group element, having the IIIB group element remain on the surface of the silicon substrate, and growing a GaAs film on a surface of the silicon substrate after the heat processing. Particles remaining on an inner wall or the like of a film forming apparatus are prevented from reaching the surface, and a IIIB group element remains on the surface after preprocessing. Such a GaAs film formed on the surface includes less unevenness and crystal defects.
    Type: Grant
    Filed: April 13, 1993
    Date of Patent: March 14, 1995
    Assignee: Fujitsu Ltd.
    Inventor: Norimitsu Takagi