Abstract: A molding device may comprise a mold, a plate, and a ring. The mold may comprise: a lower surface; an upper surface parallel to the lower surface; a hole defined in a part of the upper surface; and a through hole extending from a bottom surface of the hole to the lower surface of the mold. The plate may comprise a surface with a gas outlet defined therein. The ring may be arranged between the lower surface of the mold and the surface of the plate and connecting the mold and the plate. The ring may surround the through hole exposed on the lower surface of the mold and the gas outlet exposed on the surface of the plate. In a region where the ring is not arranged, a space may be defined between the lower surface of the mold and the surface of the plate.

Abstract: A molding device may comprise a mold, a plate, and a ring. The mold may comprise: a lower surface; an upper surface parallel to the lower surface; a hole defined in a part of the upper surface; and a through hole extending from a bottom surface of the hole to the lower surface of the mold. The plate may comprise a surface with a gas outlet defined therein. The ring may be arranged between the lower surface of the mold and the surface of the plate and connecting the mold and the plate. The ring may surround the through hole exposed on the lower surface of the mold and the gas outlet exposed on the surface of the plate. In a region where the ring is not arranged, a space may be defined between the lower surface of the mold and the surface of the plate.

Abstract: The present application discloses a deflector including a substrate portion, a movable portion, a reflective portion, a support portion, and a moving mechanism. The movable portion is supported by a first end of the support portion. A second end of the support portion is supported by the substrate portion. An end of the movable portion is capable of coming into contact with the substrate portion. The reflective portion is formed on the movable portion. The moving mechanism is capable of driving the movable portion so as to bring the movable portion into at least any one of a first state, a second state, a third state, and a fourth state.

Abstract: The present application discloses a deflector including a substrate portion, a movable portion, a reflective portion, a support portion, and a moving mechanism. The movable portion is supported by a first end of the support portion. A second end of the support portion is supported by the substrate portion. An end of the movable portion is capable of coming into contact with the substrate portion. The reflective portion is formed on the movable portion. The moving mechanism is capable of driving the movable portion so as to bring the movable portion into at least any one of a first state, a second state, a third state, and a fourth state.

Abstract: Teaching disclosed herein is an apparatus comprising a support layer. The support layer may be adapted for supporting a heat generator, wherein the support layer includes a flow passage. The flow passage may seal working fluid therein. The flow passage may extend along a thickness direction of the support layer.

Abstract: Teaching disclosed herein is an apparatus comprising a support layer. The support layer may be adapted for supporting a heat generator, wherein the support layer includes a flow passage. The flow passage may seal working fluid therein. The flow passage may extend along a thickness direction of the support layer.

Abstract: The method for producing a semiconductor device includes: forming an opening in an area of at least one of the complementary metal-oxide semiconductor wafer that includes a first part and the other semiconductor wafer that includes a second part, the opening terminating within the area and not penetrating through the area, the area including corresponding one of the first part and the second part and an outer peripheral part of the corresponding one of the first part and the second part; forming a conduction hole within the first part, the conduction hole communicating with a metallic material in the complementary metal-oxide semiconductor wafer; arranging a first joining material inside the conduction hole and on the first part, and a second joining material on the second part; and joining the arranged first joining material and the arranged second joining material.

Abstract: Provided is technique for a semiconductor device including a substrate and a tilting plate which is tiltable relatively to the substrate, the technique being capable of effectively suppressing warpage of the tilting plate. The semiconductor device of the present specification includes a substrate and a tilting plate which is tiltable relatively to the substrate. In the semiconductor device, a rib formed of wavelike portions where a plate thickness is substantially uniform is formed on the tilting plate.

Abstract: The MEMS device includes MEMS units and a circuit board. Each MEMS unit includes a substrate, a movable part with a movable electrode, a driving electrode, a diagnosis electrode, a plurality of through electrodes, and a plurality of MEMS side electrical contacts. The circuit board includes a plurality of circuit side electrical contacts, a drive circuit that is connected electrically with the driving electrode and the movable electrode through the circuit side electrical contact, the MEMS side electrical contact, and the through electrode, and a diagnosis circuit that is connected electrically with the diagnosis electrode and the movable electrode through the circuit side electrical contact, the MEMS side electrical contact, and the through electrode. The diagnosis electrodes of at least two MEMS units are connected electrically with each other, and are connected to a same MEMS side electrical contact through a same through electrode.

Abstract: An alerting illumination device, which includes a detecting component, a danger degree estimating component, a danger assuming component, an illuminating component and a controlling component, is provided. The danger degree estimating component estimates a degree of danger, with respect to a subject vehicle, of the person detected by the detecting component. The danger assuming component, on the basis of the estimated degree of danger, assumes whether or not the person detected by the detecting component is a danger with respect to the subject vehicle. The illuminating component illuminates light. The controlling component, in a case in which the danger assuming component assumes that the person is a danger, controls the illuminating component such that light, which shows a direction of the person who is assumed to be a danger and a distance to the person, is illuminated onto a road surface.

Abstract: An alerting illumination device, which includes a detecting component, a danger degree estimating component, a danger assuming component, an illuminating component and a controlling component, is provided. The danger degree estimating component estimates a degree of danger, with respect to a subject vehicle, of the person detected by the detecting component. The danger assuming component, on the basis of the estimated degree of danger, assumes whether or not the person detected by the detecting component is a danger with respect to the subject vehicle. The illuminating component illuminates light. The controlling component, in a case in which the danger assuming component assumes that the person is a danger, controls the illuminating component such that light, which shows a direction of the person who is assumed to be a danger and a distance to the person, is illuminated onto a road surface.

Abstract: Force detection devices may have high detection precision and may prevent current leakage through a strain gage 126 to the outside. For example, a force detection block 120 may include a semiconductor substrate 122, a first insulating layer 124 and a semiconductor layer 126 (strain gage). The strain gage 126 preferably includes a site where resistance changes in accordance with the stress acting thereon. The strain gage 126 preferably constitutes at least a portion of a ridge 130 projects from the surface of the force detection block 120. A force transmission block 138 may be attached to a top surface of the ridge 130. The width of the first insulating layer 124 is preferably greater than the width of the semiconductor layer 126.

Abstract: A capacitive device includes a substrate, a movable electrode, and a fixed electrode. The movable electrode is located above a surface of the substrate and is movable with respect to the substrate along directions that are substantially orthogonal to the surface. The fixed electrode is stationary with respect to the substrate. When the movable electrode is displaced in a first direction that is substantially orthogonal to the surface, the total sum of area-distance quotients in the overlap between the electrodes remains substantially unchanged or decreases to provide a first reduction rate that is substantially zero or more. On the other hand, when the movable electrode is displaced in a second direction that is substantially opposite to the first direction, the total sum of area-distance quotients remains substantially unchanged or decreases to provide a second reduction rate that is substantially zero or more. The reduction rates are different from each other.

Abstract: A capacitive device includes a substrate, a movable electrode, and a fixed electrode. The movable electrode is located above a surface of the substrate and is movable with respect to the substrate along directions that are substantially orthogonal to the surface. The fixed electrode is stationary with respect to the substrate. When the movable electrode is displaced in a first direction that is substantially orthogonal to the surface, the total sum of area-distance quotients in the overlap between the electrodes remains substantially unchanged or decreases to provide a first reduction rate that is substantially zero or more. On the other hand, when the movable electrode is displaced in a second direction that is substantially opposite to the first direction, the total sum of area-distance quotients remains substantially unchanged or decreases to provide a second reduction rate that is substantially zero or more. The reduction rates are different from each other.

Abstract: Force detection devices may have high detection precision and may prevent current leakage through a strain gage 126 to the outside. For example, a force detection block 120 may include a semiconductor substrate 122, a first insulating layer 124 and a semiconductor layer 126 (strain gage). The strain gage 126 preferably includes a site where resistance changes in accordance with the stress acting thereon. The strain gage 126 preferably constitutes at least a portion of a ridge 130 projects from the surface of the force detection block 120. A force transmission block 138 may be attached to a top surface of the ridge 130. The width of the first insulating layer 124 is preferably greater than the width of the semiconductor layer 126.

Abstract: A detector has first and second excitation beams extending along X-axis and Y-axis directions. These beams are fixed to a substrate via an intersecting portion. Mass portions are disposed at free ends of the beams. Sensing electrodes are disposed at the central portions of the mass portions to face the mass portions. By electrostatic force generated between the excitation electrodes and the mass portions, two mass portions vibrate in the Y-axis direction, while the remaining two mass portions vibrate in the X-axis direction. When an angular velocity .OMEGA..sub.x acts about the X axis, Z-axis Coriolis forces F.sub.1a and F.sub.1b act on the mass portions that are vibrating in the Y-axis direction. When an angular velocity .OMEGA..sub.y acts about the Y axis, Z-axis Coriolis forces F.sub.2a and F.sub.2b act on the mass portions that are vibrating in the X-axis direction. These vibrations are detected by the sensing electrodes in order to detect the angular velocities .OMEGA..sub.x and .OMEGA..sub.y.

Abstract: A resonance type angular velocity sensor is provided with a mass displacement supporting beam (20, 21, 22, 23) for supporting a vibration in a detecting direction due to a Coriolis force of a mass portion (1) and a mass excitation supporting beam for supporting a mass displacement supporting base portion (24, 25) in such a manner as to allow the mass portion (1) to vibrate away from the beam in an excitation direction. When the mass displacement supporting base portion (24) is excited in the excitation direction by an opposing comb exciting electrode (51), the mass portion (1) vibrates. A projecting electrode (31) is provided in a side surface of the Coriolis force detecting direction of the mass portion (1) and capacity detecting electrodes (30, 32) are disposed in such a manner as to oppose this.