Patents by Inventor Norio Kashimura

Norio Kashimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Water and method for storing silicon wafer
    Patent number: 8303722
    Abstract: There is provided a storage water of a silicon wafer wherein a liquid temperature of the storage water is 0 to 18° C. And there is provided a shower water of a silicon wafer wherein a liquid temperature of the shower water is 0 to 18° C. The wafer is stored in the storage water, and showered using the shower water. The present invention also relates to a method for storing silicon wafer wherein the silicon wafer is showered using a shower water of which liquid temperature is 0 to 18° C., and is then stored in liquid using a storage water of which liquid temperature is 0 to 18° C. Thereby, there can be provided a water for storing a silicon wafer, a method for storing it, a water for showering it and a method for showering it wherein degradation of the wafer quality can be prevented.
    Type: Grant
    Filed: March 11, 2002
    Date of Patent: November 6, 2012
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Tatsuo Abe, Kenichi Kanazawa, Akira Miyashita, Norio Kashimura
  • Water and method for storing silicon wafer
    Publication number: 20030139067
    Abstract: There is provided a storage water of a silicon wafer wherein a liquid temperature of the storage water is 0 to 18° C. And there is provided a shower water of a silicon wafer wherein a liquid temperature of the shower water is 0 to 18° C. The wafer is stored in the storage water, and showered using the shower water. The present invention also relates to a method for storing silicon wafer wherein the silicon wafer is showered using a shower water of which liquid temperature is 0 to 18° C., and is then stored in liquid using a storage water of which liquid temperature is 0 to 18° C. Thereby, there can be provided a water for storing a silicon wafer, a method for storing it, a water for showering it and a method for showering it wherein degradation of the wafer quality can be prevented.
    Type: Application
    Filed: November 15, 2002
    Publication date: July 24, 2003
    Inventors: Tatsuo Abe, Kenichi Kanazawa, Akira Miyashita, Norio Kashimura