Patents by Inventor Norio Kawabe
Norio Kawabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6670343Abstract: An agent for periodontal disease includes, as an active component, a methanebisphosphonic acid derivative or a hydrate thereof represented by the general formula (I): [wherein X, Y, m, n, The methanebisphosphonic acid derivative represented by the general formula (I) or a hydrate thereof according to the present invention has activities such as inhibitory effect on cell infiltration to the affected part associated with periodontal disease, and is useful for the prophylaxis or treatment of periodontal disease.Type: GrantFiled: May 29, 2001Date of Patent: December 30, 2003Assignee: Toray Industries, Inc.Inventors: Masatoshi Ito, Seiji Okazaki, Yuriko Kawai, Norio Kawabe
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Patent number: 5986143Abstract: The present invention relates to a method of producing bis(4-alkylthiophenyl) disulfides characterized by (a) reducing directly a 4-alkylthiobenzenesulfonyl chloride, or (b) oxidizing a 4-alkylthiobenzenethiol obtained by reducing a 4-alkylthiobenzenesulfonyl chloride. The present invention is capable of producing the compound below useful as an intermediate of pharmaceuticals.Type: GrantFiled: September 23, 1996Date of Patent: November 16, 1999Assignee: Toray Industries, Inc.Inventors: Hiromi Uchiro, Norio Kawabe, Kouichi Tsuruta, Teiji Kawano
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Patent number: 5886206Abstract: A process for production of l-alkylthiomethanediphosphonic acid compound or 1-arylthiomethanediphosphonic acid compound characterized by removing a thiolate byproduct as an insoluble salt, in the condensation represented by the following formula: ##STR1## wherein R'.sub.1 represents a linear or branched alkyl group having 1 to 6 carbon atoms, R.sub.2 represents an alkyl or aryl group, R.sub.1 represents a pharmaceutically allowable cation, hydrogen atom, or linear or branched alkyl group having 1 to 6 carbon atoms. The present invention significantly improves the yield compared with conventional methods, and simplifies the purification process at the same time, thus is extremely useful in an economical and industrial points of view.Type: GrantFiled: July 2, 1996Date of Patent: March 23, 1999Assignee: Toray Industries, Inc.Inventors: Norio Kawabe, Keijiro Takanishi, Hiromi Uchiro, Kouichi Tsuruta, Ryuichi Haruta
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Patent number: 5683992Abstract: The present invention relates to a methanediphosphonate derivative, its manufacturing process, and pharmaceutical applications, that is represented with the following formula: ##STR1## wherein, D is either sulfur, oxygen, NH, alkyl-substituted N, CH.sub.2, or SCH.sub.2, X represents an alkyl group, alkyl group having a hetero atom as a substitution group, an aryl group or an acyl group, m represents an integer of 1 to 5, and R.sup.1, R.sup.2, R.sup.3 and R.sup.4 independently represent hydrogen, alkyl groups having 1 to carbon atoms or pharmaceutically allowable cations. .function.The compounds of the present invention have excellent IL-1 inhibitory action, antioxidation action and bone resorption inhibitory action, and are useful as antiinflammatory agents, antirheumatic agents, bone metabolic disease drugs, autoimmune disease drugs, or osteoporosis drugs.Type: GrantFiled: March 15, 1996Date of Patent: November 4, 1997Assignee: Toray Industries, Inc.Inventors: Norio Kawabe, Hiromi Uchiro, Teruo Nakadate, Masahiko Tanahashi, Masatoshi Ito
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Patent number: 5618804Abstract: A methane diphosphonic acid derivative represented by the general formula (I): ##STR1## wherein, X and Y are defined in the specification; m represents an integer of 0 to 3; n represents an integer of 0 to 4; and each X of the (X).sub.m and each Y of the (Y).sub.n may be either identical or different; . . . represents a double bond or single bond; A is --(CH.sub.2)a--(D)b--(CH.sub.2)c-- (wherein D is sulfur, oxygen, NH, alkyl-substituted N, or CH.sub.2, a and c are integers of 0 to 10 and b is 0 or 1), or --(CH.dbd.CH)d.dbd.CH= (wherein d is an integer of 0 to 2, and B does not exist when A represents --CH.dbd.CH)d--CH.dbd.), B refers to a hydrogen atom, alkyl group, amino group, monoalkylamino group, dialkylamino group, acylamino group, hydroxyl group, alkoxy group, trialkylsiloxy group or acyloxy group, and each of R.sup.1, R.sup.2, R.sup.3 and R.sup.Type: GrantFiled: January 14, 1994Date of Patent: April 8, 1997Assignee: Toray Industries, Inc.Inventors: Norio Kawabe, Hiromi Uchiro, Teruo Nakadate, Masahiko Tanahashi, Yuriko Funaba
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Patent number: 5565440Abstract: The present invention discloses a methane diphosphonate derivative, a process for producing said derivative and its pharmaceutical applications, said methane diphosphonate derivative indicated with general formula (1): ##STR1## (wherein, R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are independently a pharmacologically acceptable cation, a hydrogen atom or a straight chain or branched alkyl group having 1-4 carbon atoms, R.sub.5 is a hydrogen atom or a trialkylsilyl group, m is an integer of 0 to 3, n is an integer of 1 to 3, R.sub.6 and R.sub.7 are independently a hydrogen atom or an alkyl group, and X represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or an alkylthio group).Type: GrantFiled: June 28, 1994Date of Patent: October 15, 1996Assignee: Toray Industries, Inc.Inventors: Keijiro Takanishi, Norio Kawabe, Teruo Nakadate
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Patent number: 5527940Abstract: The present invention relates to a methanediphosphonate derivative, its manufacturing process and pharmaceutical applications, that is represented with the following formula: ##STR1## (wherein, B is either hydrogen, an alkyl group, hydroxyl group, alkoxy group or amino group, D is either sulfur, oxygen, NH, alkyl-substituted N, CH.sub.2 or SCH.sub.2, X represents an alkyl group, alkyl group having a hetero atom as a substitution group, an aryl group or an acyl group, m represents an integer of 1 to 5, and R.sup.1, R.sup.2, R.sup.3 and R.sup.4 independently represent hydrogen, alkyl groups having 1 to 7 carbon atoms or pharmaceutically allowable cations). The compound of the present invention has excellent IL-1 inhibitory action, antioxidation action and bone resorption inhibitory action, and is useful as an antiinflammatory agent, antirheumatic, bone metabolic disease drug, autoimmune disease drug, osteoporosis drug and so forth.Type: GrantFiled: November 17, 1994Date of Patent: June 18, 1996Assignee: Toray Industries, Inc.Inventors: Norio Kawabe, Hiromi Uchiro, Teruo Nakadate, Masahiko Tanahashi, Masatoshi Ito
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Patent number: 5153183Abstract: This invention relates to a methylenediphosphonic acid compound expressed by the formula (1). The compound has a marked effect as an anti-inflammatory agent or, more particularly, against inflammations accompanying disturbances in bone metabolism.Type: GrantFiled: May 6, 1991Date of Patent: October 6, 1992Assignee: Toray Industries, Inc.Inventors: Norio Kawabe, Keijiro Takanishi, Shu Matsumoto
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Patent number: 4939003Abstract: Disclosed is a liquid crystal element with an improved orientation layer and a coating composition for forming such an orientation layer. The orientation layer consists essentially of a polymer with a Mark-Houwink coefficient of not less than 0.85, the Mark-Houwink coefficient being represented by the formula [I]:[.eta.]=K.multidot.M.sup..alpha. [I]wherein [.eta.] represents intrinsic viscosity of the polymer determined by solution viscosity measuring method, K represents a constant, M represents molecular weight of the polymer, and .alpha. represents the Mark-Houwink coefficient. The coating composition comprises a polyfumaric acid ester represented by the formula [I]: ##STR1## wherein R.sup.1 and R.sup.2, are the same or different and each represents a straight or branched alkyl group, cycloalkyl group, haloalkyl group, silalkyl group or siloxanylalkyl group; and a halogen-containing organic solvent.Type: GrantFiled: January 22, 1988Date of Patent: July 3, 1990Assignees: Toray Industries, Inc., Seiko Instruments & Electronics Ltd.Inventors: Takao Aoki, Takamasa Harada, Kokichi Ito, Koji Iwasa, Norio Kawabe, Hiroyuki Ikeuchi
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Patent number: 4814132Abstract: A process for preparing a thin film having a large area. A casting solution of a film-forming material and a solvent is fed to the surface of a liquid substrate immiscible with the solution by utilizing interfacial tension. Spontaneous spreading of the casting solution occurs across the surface of the liquid substrate and evaporation of the solvent produces a thin film on the liquid surface which is continuously collected. The feed of the casting solution to the surface of the substrate is at least either a material which shows selective wettability for the casting solution in preference to the liquid substrate or a structure capable of developing capillarity.Type: GrantFiled: June 28, 1988Date of Patent: March 21, 1989Assignee: Toray Industries, Inc.Inventors: Takao Aoki, Norio Kawabe
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Patent number: 4496647Abstract: An image-forming laminated plate, particularly a dry planographic printing unprocessed plate, comprising a base substrate, a photosensitive layer containing a substance with quinonediazide structure and a silicone rubber layer in laminating order is treated with a base after imagewise exposure. In addition, the image-forming laminated plate may be subjected to a whole surface slight exposure to the extent that 5 to 60 molar % of the quinonediazide structure in the photosensitive layer to be exposed is photo-decomposed into carboxylic acid structure before or after the usual imagewise exposure for obtaining a negative working plate, or the image-forming laminated plate may be subjected to a imagewise slight exposure to the same extent without the usual imagewise exposure for obtaining a positive working plate.Type: GrantFiled: July 18, 1983Date of Patent: January 29, 1985Assignee: Toray Industries, Inc.Inventors: Norio Kawabe, Mikio Tsuda, Sadao Kobashi
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Patent number: 4342820Abstract: Provided is a presensitized planographic printing master plate requiring no dampening water for use in negative work which comprises a base substrate, a light releasing photosensitive layer overlying the base substrate and a silicone rubber layer overlying the photosensitive layer. When the printing master plate is exposed through a negative film and then treated with a developer, only the silicone rubber layer overlying the exposed photosensitive layer is removed, while the photosensitive layer remains as it is to form an image area. Dampening water is not required when printing is carried out.Type: GrantFiled: December 10, 1980Date of Patent: August 3, 1982Assignee: Toray Industries, Inc.Inventors: Takao Kinashi, Takashi Fujita, Norio Kawabe
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Patent number: 4065475Abstract: High purity cis-epoxysuccinic acid and salts thereof are economically and systematically prepared by contacting an aqueous solution, obtained by reacting a maleic acid salt and hydrogen peroxide in the presence of a tungstate or molybdate catalyst under a specified condition, with a strongly basic Type II anion exchange resin.Type: GrantFiled: May 21, 1976Date of Patent: December 27, 1977Assignee: Toray Industries, Inc.Inventors: Kazuo Hosoi, Norio Kawabe, Masaji Ohno
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Patent number: 4003936Abstract: As new compound, a series of 2-hydrocinnamoyl-1,3-cyclopentanedione derivative of the general formula: ##STR1## WHEREIN Ar stands for a mono-valent aromatic radical, for example, phenyl and 3,4-methylenedioxy-phenyl, substituted or unsubstituted, have been found to have an activity to inhibit the action of tyrosine hydroxylase and to be useful as hypotensive agent. These new compounds may be produced by condensing 2-acetyl-1,3-cyclopentanedione with an aromatic aldehyde of the formula Ar-CHO wherein Ar is as defined, according to Claisen-Schmidt condensation, followed by the hydrogenation of the condensation product obtained, or the new compounds may also be produced by reacting 2-acetyl-1,3-cyclopentanedione with an aromatic halide of the formula Ar-CH.sub.2 X wherein Ar is as defined and X is a halogen, for example, in liquid ammonia and in the presence of an alkali metal amide.Type: GrantFiled: November 26, 1971Date of Patent: January 18, 1977Assignee: Zaidan Hojin Biseibutsu Kagaku Kenkyu KaiInventors: Masaji Ohno, Mutsuo Kataoka, Norio Kawabe