Patents by Inventor Norio Komine

Norio Komine has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120236285
    Abstract: An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field. including a plurality of illumination fields. The illumination optical system also includes an optical integrator that forms a multipole light source including a plurality of planar light sources with light that has passed through the multipole illumination field. The illumination optical system also includes a polarization optical member disposed in an illumination optical path and that sets a polarization direction of light that has passed through the multipole light source to a predetermined polarization direction.
    Type: Application
    Filed: May 29, 2012
    Publication date: September 20, 2012
    Applicant: NIKON CORPORATION
    Inventors: Osamu TANITSU, Hirohisa TANAKA, Kenichi MURAMATSU, Norio KOMINE, Hisashi NISHINAGA, Tomoyuki MATSUYAMA, Takehito KUDO
  • Publication number: 20100225895
    Abstract: An illumination optical system and method illuminates an irradiated surface based on linearly polarized light supplied from a light source. The illumination optical system includes a depolarizer which is selectively positioned between a first position in an optical path of the illumination optical system and a second position outside of the optical path, and has a crystal member whose thickness in a direction along an optical axis of the illumination optical system varies in a direction crossing the optical axis.
    Type: Application
    Filed: May 18, 2010
    Publication date: September 9, 2010
    Applicant: NIKON CORPORATION
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Publication number: 20100149511
    Abstract: An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field including a plurality of illumination fields. The illumination optical system also includes an optical integrator that forms a multipole light source including a plurality of planar light sources with light that has passed through the multipole illumination field. The illumination optical system also includes a polarization optical member disposed in an illumination optical path and that sets a polarization direction of light that has passed through the multipole light source to a predetermined polarization direction.
    Type: Application
    Filed: February 17, 2010
    Publication date: June 17, 2010
    Applicant: NIKON CORPORATION
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Patent number: 7515248
    Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
    Type: Grant
    Filed: November 5, 2007
    Date of Patent: April 7, 2009
    Assignee: Nikon Corporation
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Patent number: 7515247
    Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
    Type: Grant
    Filed: November 5, 2007
    Date of Patent: April 7, 2009
    Assignee: Nikon Corporation
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Publication number: 20080239274
    Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
    Type: Application
    Filed: June 2, 2008
    Publication date: October 2, 2008
    Applicant: NIKON CORPORATION
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Patent number: 7423731
    Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
    Type: Grant
    Filed: May 31, 2005
    Date of Patent: September 9, 2008
    Assignee: Nikon Corporation
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Publication number: 20080094602
    Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
    Type: Application
    Filed: November 5, 2007
    Publication date: April 24, 2008
    Applicant: NIKON CORPORATION
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Publication number: 20080074632
    Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
    Type: Application
    Filed: November 5, 2007
    Publication date: March 27, 2008
    Applicant: NIKON CORPORATION
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Publication number: 20060171138
    Abstract: An illuminating optical system capable of preventing a change in the polarized status of a linearly polarized light passing through a light transmitting member formed of a cubic-system crystal material such as fluorite. An illuminating optical system comprising a light source unit (1) for suppling a linearly polarized light to illuminate surfaces (M, W) to be illuminated with a light from the light source unit. The system is provided with a polarized status switching means (10, 20) disposed on a light path between the light source unit and the surfaces to be illuminated, for switching the polarized status of a light, that illuminates the surfaces to be illuminated, between a linearly polarized status and a non-linearly polarized status. The polarized status switching means has a phase member (10) for changing the polarization surface of an incident linearly polarized light as needed, and a depolarizer (20) for depolarizing an incident linearly polarized light as needed.
    Type: Application
    Filed: June 29, 2004
    Publication date: August 3, 2006
    Inventors: Kenichi Muramatsu, Norio Komine, Osamu Tanitsu, Hirohisa Tanaka
  • Publication number: 20060164620
    Abstract: In an exposure apparatus, a light source emits ultraviolet light having a wavelength of 300 nm or less, a homogenizer reduces energy density inhomogeneity of the ultraviolet light in a plane perpendicular to an optical axis, and an exposure object is exposed by applying the ultraviolet light passed through a plurality of optical components. At least one of the plurality of optical components is a synthetic silica glass component, and all the synthetic silica glass component is placed closer to the exposure object than is the homogenizer placed closest to the light source.
    Type: Application
    Filed: March 22, 2006
    Publication date: July 27, 2006
    Applicant: NIKON CORPORATION
    Inventors: Masafumi Mizuguchi, Norio Komine
  • Publication number: 20060158636
    Abstract: In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components. At least one of the plurality of optical components is made of a synthetic silica glass component. In ultraviolet light applied to the synthetic silica glass component, a width between adjacent top portions of energy density inhomogeneity in a plane perpendicular to an optical axis is larger than 0.1 mm, and a difference between a top portion and a bottom portion of the energy density is 5% or less of an average energy density.
    Type: Application
    Filed: March 21, 2006
    Publication date: July 20, 2006
    Applicant: NIKON CORPORATION
    Inventors: Masafumi Mizuguchi, Norio Komine
  • Patent number: 7072026
    Abstract: In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components. At least one of the plurality of optical components is made of a synthetic silica glass component. The thickness of the synthetic silica glass component, and the energy density per pulse and the pulse width of the pulsed light satisfy the following expression: ?I?2L?1.7?0.02 (ns·mJ?2·cm2.3·pulse2) wherein L is the thickness (unit: cm) of the synthetic silica glass component, I is the energy density (unit: mJ·cm?2·pulse?1) per pulse, and ? is the pulse width (unit: ns).
    Type: Grant
    Filed: August 12, 2005
    Date of Patent: July 4, 2006
    Assignee: Nikon Corporation
    Inventors: Masafumi Mizuguchi, Norio Komine
  • Publication number: 20060110604
    Abstract: An exposure apparatus includes an illumination optical system configured to illuminate a mask by using a laser beam having a wavelength shorter than 250 nm as a light source, and a projection optical system configured to project and expose a pattern image of the mask onto an exposed substrate, in which an optical element made of a synthetic quartz member is disposed in the illumination optical system and/or the projection optical system. The synthetic quartz member satisfies the following conditions of initial transmittance relative to light having a wavelength of 150 nm being equal to or above 60% per centimeter, striae therein satisfying either grade 1 or grade 2 as defined in Japan Optical Glass Industry Society Standard (JOGIS), an absorption coefficient ? for an infrared absorption band of a hydroxyl group located at 3585 cm?1 being equal to or below 0.035/cm, and the content of aluminum being equal to or below 1 ppm while the content of lithium being equal to or below 0.5 ppm.
    Type: Application
    Filed: December 30, 2005
    Publication date: May 25, 2006
    Applicant: Nikon Corporation
    Inventors: Masafumi Mizuguchi, Norio Komine, Hiroki Jinbo
  • Publication number: 20060055834
    Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
    Type: Application
    Filed: May 31, 2005
    Publication date: March 16, 2006
    Applicant: NIKON CORPORATION
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Publication number: 20060012768
    Abstract: In an exposure apparatus, an exposure object 15 is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components 2, 4a, 4b, 6, 7, 9, and 12. At least one of the plurality of optical components 2, 4a, 4b, 6, 7, 9, and 12 is made of a synthetic silica glass component. The thickness of the synthetic silica glass component, and the energy density per pulse and the pulse width of the pulsed light satisfy the following expression: ?I?2L?1.7?0.02 (ns·mJ?2·cm2.3·pulse2) (L is the thickness (unit: cm) of the synthetic silica glass component, I is the energy density (unit: mJ·cm?2·pulse?1) per pulse, and ? is the pulse width (unit: ns)).
    Type: Application
    Filed: August 12, 2005
    Publication date: January 19, 2006
    Applicant: NIKON CORPORATION
    Inventors: Masafumi Mizuguchi, Norio Komine
  • Publication number: 20050284177
    Abstract: An optical member made of silica glass manufactured by the direct method where a material gas comprising an organosilicon compound is allowed to react in an oxidizing flame, said optical member having a 2×1014 molecules/cm3 or less concentration of formyl radical generated by X-ray irradiation whose dose is 0.01 Mrad or more and 1 Mrad or less.
    Type: Application
    Filed: June 29, 2005
    Publication date: December 29, 2005
    Applicant: Nikon Corporation
    Inventors: Norio Komine, Seishi Fujiwara, Akiko Yoshida, Hiroki Jinbo, Norihisa Yamaguchi
  • Publication number: 20050047986
    Abstract: In a method for producing a quartz glass member, an F2 laser is radiated onto a sample obtained from a quartz glass base material under a predetermined condition to judge whether or not a peak intensity of H2 Raman scattering light is decreased by not less than 80% as compared with a peak intensity of H2 Raman scattering light obtained for a sample not irradiated with the F2 laser. If the peak intensity of H2 Raman scattering light is decreased by less than 80%, then it is judged that the laser resistance of the quartz glass base material is sufficient, and the synthetic quartz glass member is processed from the base material. The compaction of the sample is also measured.
    Type: Application
    Filed: September 23, 2004
    Publication date: March 3, 2005
    Applicant: NIKON CORPORATION
    Inventors: Masafumi Mizuguchi, Seishi Fujiwara, Norio Komine
  • Patent number: 6835683
    Abstract: A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1×1016 molecules/cm3 nor more than 5×1018 molecules/cm3, and wherein a difference A−B between an absorption coefficient A immediately before an end of irradiation with 1×104 pulses of ArF excimer laser light in an average one-pulse energy density of 2 mJ/cm2 and a second absorption coefficient B at 600 seconds after a stop of the irradiation with the ArF excimer laser light is not more than 0.002 cm−1. When this silica glass member is applied to an illumination optical system and/or a projection optical system in projection exposure apparatus, it becomes feasible to implement uniform exposure while reducing variation in illuminance on a reticle surface and in an exposure area on a wafer.
    Type: Grant
    Filed: December 17, 2002
    Date of Patent: December 28, 2004
    Assignee: Nikon Corporation
    Inventors: Norio Komine, Akiko Yoshida, Hiroki Jinbo, Seishi Fujiwara
  • Publication number: 20040095566
    Abstract: An optical member made of silica glass manufactured by the direct method where a material gas comprising an organosilicon compound is allowed to react in an oxidizing flame,
    Type: Application
    Filed: July 8, 2003
    Publication date: May 20, 2004
    Inventors: Norio Komine, Seishi Fujiwara, Akiko Yoshida, Hiroki Jinbo, Norihisa Yamaguchi