Abstract: The present disclosure provides a method for manufacturing semiconductor element. The method includes: a first masking process, forming a resist layer on the surface of the substrate; a channel forming process, implanting impurities with the same polarity as a well of an FET region into the surface of the substrate, and forming a channel region for the well of the FET region; a gate forming process, forming gates G respectively on the well of the FET region and the well of the variable-capacitance diode region separated by insulating films; a second masking process, generating a second implantation barrier layer on the surface of the substrate; and an epitaxy forming process, implanting impurities with the opposite polarity to that of the well of the FET region into the surface of the substrate, and forming an epitaxy region for the well of the FET region.

Abstract: The present disclosure provides a method for manufacturing semiconductor element. The method includes: a first masking process, forming a resist layer on the surface of the substrate; a channel forming process, implanting impurities with the same polarity as a well of an FET region into the surface of the substrate, and forming a channel region for the well of the FET region; a gate forming process, forming gates G respectively on the well of the FET region and the well of the variable-capacitance diode region separated by insulating films; a second masking process, generating a second implantation barrier layer on the surface of the substrate; and an epitaxy forming process, implanting impurities with the opposite polarity to that of the well of the FET region into the surface of the substrate, and forming an epitaxy region for the well of the FET region.

Abstract: The present disclosure provides a high-voltage tolerant semiconductor element preventing performance deterioration caused by impurity diffusion. The high-voltage tolerant semiconductor element includes a source portion (S), a well impurity region (PW) disposed around the source portion (S), and at least two gate portions (G) disposed at two sides of the source portion (S). An impurity concentration of the well impurity region is higher than an impurity concentration of a silicon substrate. A space between the two gate portions (G) is greater than a diffusion length (DD) of impurities.

Abstract: An air blower apparatus for use in an inspection apparatus includes an air blowing device for blowing air via an air filter to a recording medium and a recording apparatus. The air blowing device includes a fan unit provided above the recording medium, and a fan unit housing provided above the fan unit. The fan unit housing includes a first buffer space having an inlet port directed substantially downwardly toward the recording medium, and the first buffer space temporarily accumulates air inhaled from the inlet port. The fan unit inhales air from the inlet port that faces the first buffer space, discharges inhaled air at a substantially constant air flow rate to deliver the air via an air filter from an outlet port to the recording medium by a fan, and the discharged air is reflected on the recording medium and returns to the inlet port.

Abstract: A housing for enclosing a measuring apparatus for a hard disk recording medium and a recording apparatus for recording a signal on the hard disk recording medium is provided with a fan including a high efficiency particulate air filter. The fan blows air onto the hard disk recording medium and the recording apparatus under measurement through the high efficiency particulate air filter at a substantially constant air temperature and at a substantially constant air flow rate. An automatic door is located at a position other than an air protection area which includes positions of the hard disk recording medium under measurement by the recording apparatus and the recording apparatus, and includes a predetermined surrounding area. The automatic door shields the other area from the air protection area in the housing for enclosing the measuring apparatus under no measurement.

Abstract: A housing for enclosing a measuring apparatus for a hard disk recording medium and a recording apparatus for recording a signal on the hard disk recording medium is provided with a fan including a high efficiency particulate air filter. The fan blows air onto the hard disk recording medium and the recording apparatus under measurement through the high efficiency particulate air filter at a substantially constant air temperature and at a substantially constant air flow rate. An automatic door is located at a position other than an air protection area which includes positions of the hard disk recording medium under measurement by the recording apparatus and the recording apparatus, and includes a predetermined surrounding area. The automatic door shields the other area from the air protection area in the housing for enclosing the measuring apparatus under no measurement.

Abstract: A gas turbine generator unit which is small-sized to be portable. The generator unit comprises a generator directly driven by a gas turbine. The rotatable shaft of the generator is coaxially connected with the rotor shaft of the gas turbine engine. An air filter box having an air filter element is disposed in a manner that the extension of the axis of the generator rotatable shaft passes through the air filter box. The air filter box is located on the opposite side of the gas turbine compressor with respect to the generator. Additionally, an intake silencer for reducing intake air noise is disposed fluidly connect the air filter box and the air intake port of the compressor. The intake silencer is located to extend generally parallel with the axis of the generator rotatable shaft.