Abstract: A substrate holding member includes a base, and a plurality of convex parts formed at an upper surface of the base and configured to hold a substrate at top surfaces thereof. Each convex part has a root portion extending from the upper surface of the base, and a top portion formed on the root portion and including the top surface. In each convex part, a cross-sectional area of the root portion is larger than a cross-sectional area of the top portion. At least a portion including the top surface of the top portion is formed of a holding member made of a material having a greater Young's modulus than a material forming the base. The respective holding members are spaced apart from each other.

Abstract: A grindstone that enables grinding, polishing, super-finish polishing by using the same grindstone, without clogging even if the grindstone is being used continuously, in which a grinding/polishing section for processing a workpiece has a honeycomb structure formed by arranging polygonal prisms with no clearance therebetween. The grindstone includes the grindstone columns consisting of abrasive grains and binder and having an axis in depth direction of grinding/polishing surface, which are disposed on intersections or wall portions of the honeycomb structure. Porous elastomer is disposed inside the honeycomb structure, thus making it possible to perform a super-finish polishing.

Abstract: A method for producing a SiC member includes a chemical vapor deposition (CVD) step of forming a SiC member formed of ?-SiC by a CVD method and a heat treatment step of heat-treating the SiC member in an inert atmosphere at a temperature of higher than 2000° C. and 2200° C. or lower to partly transform ?-SiC into ?-SiC.

Abstract: A grindstone that enables grinding, polishing, super-finish polishing by using the same grindstone, without clogging even if the grindstone is being used continuously, in which a grinding/polishing section for processing a workpiece has a honeycomb structure formed by arranging polygonal prisms with no clearance therebetween. The grindstone includes the grindstone columns consisting of abrasive grains and binder and having an axis in depth direction of grinding/polishing surface, which are disposed on intersections or wall portions of the honeycomb structure. Porous elastomer is disposed inside the honeycomb structure, thus making it possible to perform a super-finish polishing.

Abstract: A conveying pad, a conveying apparatus and a conveying method using the conveying pad, capable of exactly attracting and fixing an object placed on a part of a conveying surface or levitating the object, by virtue of an attracting force or levitating force of the conveying pad. The conveying pad is made of a porous substrate communicated with a large number of pores, and by depressurizing or pressurizing the back surface of the conveying pad, an object W placed on the front surface of the conveying pad is attracted or levitated, thus satisfying a relational equation between an area ratio a of the object covering the surface of the conveying pad and a conductance ratio ?.

Abstract: A noncontact conveying apparatus and a noncontact conveying system, which moves object from a conveying path to a predetermined position without using another device, and conveys the object in a noncontact manner without causing the object to fall down even if the conveying path is inclined. The system includes a holding device for holding an object in a noncontact manner and moving device for moving holding device. The holding device includes a levitating device for levitating the object and an attracting device for attracting the object. The levitating device includes conveying plate made of a porous material having a large number of pores, a compressor for sending gas to the conveying plate's pores and ejecting gas from the pores towards the object. The moving device is constituted by the magnetic material and the magnet for moving the object in a noncontact manner while attracting the object towards the conveying plate.

Abstract: A substrate holding member includes a base, and a plurality of convex parts formed at an upper surface of the base and configured to hold a substrate at top surfaces thereof. Each convex part has a root portion extending from the upper surface of the base, and a top portion formed on the root portion and including the top surface. In each convex part, a cross-sectional area of the root portion is larger than a cross-sectional area of the top portion. At least a portion including the top surface of the top portion is formed of a holding member made of a material having a greater Young's modulus than a material forming the base. The respective holding members are spaced apart from each other.

Abstract: A film device provided with a resistance-adjustable resistive element comprises a base film, a resistive element, a conductive circuit pattern wherein the resistive element is formed on and connected to the conductive circuit pattern, and a corrective layer formed so as to partially cover the resistive element. The resistance of the resistive element is corrected by the corrective layer formed on the resistive element.

Abstract: A flexible print circuit board which is almost free from damages to the distributor section is provided. This circuit board comprises a wired flexible insulation film held on a holder plate, a distributor section having a portion projecting from said insulation film, a cluster of conductive patterns arranged on said distributor section, and a recessed portion provided on the holder plate under the area of the distributor section. This recess portion, which has a width greater than that of said cluster of conductive patterns, effectively accommodates bending stress.

Abstract: A continuous-cast low-carbon resulfurized free-cutting steel which consists in weight percentage ofC: 0.05-0.15,Mn: 0.5-1.5,P: 0.05-0.10,S: 0.15-0.40,O: 0.010-0.020,one or more of Pb, Bi, and Te as accompanying elements for improving machinability at a following content:Pb: 0.05-0.40,Bi: 0.05-0.40, andTe: 0.003-0.10,Si: 0.003 or less,Al; 0.0009 or less, andthe remainder consisting of Fe and unavoidable impurities, and contains a manganese sulfide-base inclusion with the provision that:a mean sectional area of the manganese sulfide-base inclusion present in a sectional area of 1 mm.sup.2 in the rolling direction of the steel is not less than 30 .mu.m.sup.2 ; anda rate of the number of a manganese sulfide-base inclusions not in the form of a complex with oxide is not less than 80% of the total amount of manganese sulfide-base inclusion.