Patents by Inventor Norio Yokoyama

Norio Yokoyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090039997
    Abstract: The present invention provides a metal terminal that can hold and fix a conductive wire thereto without excessive deformation. In the metal terminal of this invention, a predetermined relationship is set between a length in the lengthwise direction and a width in the widthwise direction of a conductive wire winding portion and a diameter of the conductive wire wound around the conductive wire winding portion to reduce force applied to the conductive wire when holding and fixing the conductive wire.
    Type: Application
    Filed: February 22, 2007
    Publication date: February 12, 2009
    Applicant: Sumida Corporation
    Inventors: Hideoki Nakashima, Koji Niino, Kenji Takano, Norio Yokoyama
  • Patent number: 7279024
    Abstract: High purity cobalt with a very few content of impurities such as copper, a method of manufacturing thereof, and high purity cobalt targets are provided. The cobalt containing impurities such as copper is dissolved in a hydrochloric acid solution, and the concentration of the hydrochloric acid of the aqueous solution of cobalt chloride is adjusted to 0.1 kmol/m3 to 3 kmol/m3. Then, cobalt is added in the aqueous solution of cobalt chloride, and an inert gas is injected into the solution with agitating, in order to convert the divalent copper ions contained in the aqueous solution of cobalt chloride to monovalent copper ions. Then, the aqueous solution of cobalt chloride is fed into a column filled up with the anion exchange resins. Cobalt is not absorbed on the anion exchange resins although the monovalent copper ions are absorbed on the anion exchange resins. Therefore, copper can be separated from the aqueous solution of cobalt chloride.
    Type: Grant
    Filed: March 17, 2004
    Date of Patent: October 9, 2007
    Assignees: Sony Corporation
    Inventors: Masahito Uchikoshi, Norio Yokoyama, Tamas Kekesi, Minoru Isshiki
  • Publication number: 20070180953
    Abstract: High purity cobalt with a very few content of impurities such as copper, a method of manufacturing thereof, and high purity cobalt targets are provided. The cobalt containing impurities such as copper is dissolved in a hydrochloric acid solution, and the concentration of the hydrochloric acid of the aqueous solution of cobalt chloride is adjusted to 0.1 kmol/m3 to 3 kmol/m3. Then, cobalt is added in the aqueous solution of cobalt chloride, and an inert gas is injected into the solution with agitating, in order to convert the divalent copper ions contained in the aqueous solution of cobalt chloride to monovalent copper ions. Then, the aqueous solution of cobalt chloride is fed into a column filled up with the anion exchange resins. Cobalt is not absorbed on the anion exchange resins although the monovalent copper ions are absorbed on the anion exchange resins. Therefore, copper can be separated from the aqueous solution of cobalt chloride.
    Type: Application
    Filed: March 17, 2004
    Publication date: August 9, 2007
    Inventors: Masahito Uchikoshi, Norio Yokoyama, Tamas Kekesi, Minoru Isshiki
  • Publication number: 20070082147
    Abstract: To provide a heat-resistant lubricity imparting coating agent that can form a heat-resistant lubricous protective layer with good heat resistance and lubricity which will hardly cause chips due to contact with the thermal head, and which will hardly allow the chips to stick to and be fusion-bonded to the head, and a thermal transfer recording medium having the heat-resistant lubricous protective layer. The heat-resistant lubricity imparting coating agent of the invention contains a polydimethylsiloxane copolymer which includes a long chain alkyl group having a carbon number of 12 or more.
    Type: Application
    Filed: January 24, 2005
    Publication date: April 12, 2007
    Applicant: NATOCO CO., LTD.
    Inventors: Shigekazu Teranishi, Norio Yokoyama
  • Patent number: 6740290
    Abstract: High purity cobalt with a very few content of impurities such as copper, a method of manufacturing thereof, and high purity cobalt targets are provided. The cobalt containing impurities such as copper is dissolved in a hydrochloric acid solution, and the concentration of the hydrochloric acid of the aqueous solution of cobalt chloride is adjusted to 0.1 kmol/m3 to 3 kmol/m3. Then, cobalt is added in the aqueous solution of cobalt chloride, and an inert gas is injected into the solution with agitating, in order to convert the divalent copper ions contained in the aqueous solution of cobalt chloride to monovalent copper ions. Then, the aqueous solution of cobalt chloride is fed into a column filled up with the anion exchange resins. Cobalt is not absorbed on the anion exchange resins although the monovalent copper ions are absorbed on the anion exchange resins. Therefore, copper can be separated from the aqueous solution of cobalt chloride.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: May 25, 2004
    Assignees: Sony Corporation
    Inventors: Masahito Uchikoshi, Norio Yokoyama, Tamas Kekesi, Minoru Isshiki
  • Publication number: 20030206822
    Abstract: High purity iron with a very few content of impurities such as copper, a method of manufacturing thereof, and high purity iron targets are provided. The iron containing impurities such as copper is dissolved in a hydrochloric acid solution, and the concentration of the hydrochloric acid of the aqueous solution of iron chloride is adjusted to 0.1 kmol/m3 to 6 kmol/m3. Then, iron is added in the aqueous solution of iron chloride, and an inert gas is injected into the solution with agitating, in order to convert the trivalent iron ions and divalent copper ions contained in the aqueous solution of iron chloride respectively to divalent iron ions and monovalent copper ions. Then, the aqueous solution of iron chloride is fed into a column filled up with the anion exchange resins. The divalent iron ions are not absorbed on the anion exchange resins although the monovalent copper ions are absorbed on the anion exchange resins. Therefore, copper can be separated from the aqueous solution of iron chloride.
    Type: Application
    Filed: May 28, 2003
    Publication date: November 6, 2003
    Inventors: Masahito Uchikoshi, Norio Yokoyama, Tamas Kekesi, Minoru Isshiki
  • Publication number: 20020117025
    Abstract: High purity cobalt with a very few content of impurities such as copper, a method of manufacturing thereof, and high purity cobalt targets are provided. The cobalt containing impurities such as copper is dissolved in a hydrochloric acid solution, and the concentration of the hydrochloric acid of the aqueous solution of cobalt chloride is adjusted to 0.1 kmol/m3 to 3 kmol/m3. Then, cobalt is added in the aqueous solution of cobalt chloride, and an inert gas is injected into the solution with agitating, in order to convert the divalent copper ions contained in the aqueous solution of cobalt chloride to monovalent copper ions. Then, the aqueous solution of cobalt chloride is fed into a column filled up with the anion exchange resins. Cobalt is not absorbed on the anion exchange resins although the monovalent copper ions are absorbed on the anion exchange resins. Therefore, copper can be separated from the aqueous solution of cobalt chloride.
    Type: Application
    Filed: September 28, 2001
    Publication date: August 29, 2002
    Inventors: Masahito Uchikoshi, Norio Yokoyama, Tamas Kekesi, Minoru Isshiki
  • Publication number: 20020117022
    Abstract: High purity iron with a very few content of impurities such as copper, a method of manufacturing thereof, and high purity iron targets are provided. The iron containing impurities such as copper is dissolved in a hydrochloric acid solution, and the concentration of the hydrochloric acid of the aqueous solution of iron chloride is adjusted to 0.1 kmol/m3 to 6 kmol/m3. Then, iron is added in the aqueous solution of iron chloride, and an inert gas is injected into the solution with agitating, in order to convert the trivalent iron ions and divalent copper ions contained in the aqueous solution of iron chloride respectively to divalent iron ions and monovalent copper ions. Then, the aqueous solution of iron chloride is fed into a column filled up with the anion exchange resins. The divalent iron ions are not absorbed on the anion exchange resins although the monovalent copper ions are absorbed on the anion exchange resins. Therefore, copper can be separated from the aqueous solution of iron chloride.
    Type: Application
    Filed: September 28, 2001
    Publication date: August 29, 2002
    Inventors: Masahito Uchikoshi, Norio Yokoyama, Tamas Kekesi, Minoru Isshiki
  • Patent number: 6440572
    Abstract: The object of the present invention is to prevent the sticking of the heat sensitive transfer recording film without generating head refuse and further to prevent transfer obstruction. More particlarly, the present invention provides a compound comprising a polydimethylsiloxane copolymer and one or more synthetic resin(s) selected from a group consisting of polyvinyl acetate derivatives, polyamide, acrylic resin, epoxy resin, unsaturated polyester resin and precursor of unsaturated polyester and/or cellulose derivatives; and sticking proof agents containing said compound; and a heat sensitive transfer film having a sticking proof layer formed by using the agents.
    Type: Grant
    Filed: October 25, 1999
    Date of Patent: August 27, 2002
    Assignee: Natoco Paint Co., Ltd.
    Inventors: Norio Yokoyama, Hironori Hata
  • Patent number: 6409965
    Abstract: An ingot is made from a used target of 30 weight % or more, and new metals of the same components, and recycled alloy powder is made by a gas atomizing process. Magnetic permeability is controlled not to exceed 2 by adjusting the content of rare earth metals in rare earth alloy powder to be at least 35 weight %. By blending the recycled alloy powder with other powder to produce alloy powder containing at least 50 weight % of rare earth alloy powder having a magnetic permeability not higher than 2 and containing at least 65 weight % of rare earth alloy powder. By sintering the alloy powder under pressure and thereafter cutting top, bottom and side surfaces of the sintered material, a target having a magnetic permeability not higher than 2 and having a thickness not less than 8 mm is fabricated.
    Type: Grant
    Filed: September 21, 2000
    Date of Patent: June 25, 2002
    Assignee: Sony Corporation
    Inventors: Takahiro Nagata, Manabu Sasaki, Hitoshi Kimura, Norio Yokoyama
  • Patent number: 6391081
    Abstract: A metal purification method and a metal refinement method in which metals of high purity can be easily refined and recovered without increasing the size of the purification and refining devices or complicating the operation. To this end, metals containing impurities are molten in a plasma arc containing active hydrogen to remove the impurities. If the metals contain ceramics inclusions, the metals are molten in a plasma arc containing active hydrogen and the ceramics inclusions are caused to float over the molten metal by exploiting the difference of density between the molten metal and the ceramics inclusions. The floating ceramics inclusions are decomposed and removed. For application to refining, the metal oxides are molten in a plasma arc containing active hydrogen so as to be reduced to metals.
    Type: Grant
    Filed: March 23, 2000
    Date of Patent: May 21, 2002
    Assignee: Sony Corporation
    Inventors: Masahito Uchikoshi, Norio Yokoyama, Minoru Isshiki, Kouji Mimura
  • Patent number: 6086735
    Abstract: A contoured sputtering target includes a target member of sputtering material having a top surface, a bottom surface and an outer peripheral surface. One or more contoured annular regions are formed on the top surface of the target member that extend radially inwardly from the outer peripheral surface and away from the bottom surface. The target member may further include planar, concave or central recessed regions formed in the top surface that are surrounded by the one or more contoured annular regions. The configuration of the target member reduces generation of contaminating particles from nodules that may form near the outer peripheral surface of the target during a sputtering operation. Methods of forming a contoured sputtering target are also disclosed.
    Type: Grant
    Filed: June 1, 1998
    Date of Patent: July 11, 2000
    Assignee: Praxair S.T. Technology, Inc.
    Inventors: Paul S. Gilman, Tetsuya Kojima, Chi-Fung Lo, Eiichi Shimizu, Hidemasa Tamura, Norio Yokoyama
  • Patent number: 6024852
    Abstract: The present invention provides a sputtering target which generates a reduced quantity of particles during a sputtering and a method for producing such a sputtering target.Mirror treatment is carried out to a sputter surface 2 which is sputtered when forming a thin film, so that the sputter surface 2 has an arithmetic mean roughness Ra of 0.01 .mu.m or below. A sputtering target 1 with such a smooth sputter surface 2 having a small surface roughness enables to reduce a number of particles generated during a sputtering.
    Type: Grant
    Filed: December 3, 1997
    Date of Patent: February 15, 2000
    Assignee: Sony Corporation
    Inventors: Hidemasa Tamura, Norio Yokoyama, Eiichi Shimizu, Fumio Sasaki
  • Patent number: 5652079
    Abstract: A carrier for a dry two-component developer, includes a core material and a silicone-modified acrylic resin layer coated on the surface of the core material, the silicone-modified acrylic resin layer including a silicone-modified acrylic resin, with the ratio of the percentage transmission of infrared spectrum Si--O stretching vibrations (T.sub.Si) of the silicone-modified acrylic resin layer to the percentage transmission of infrared spectrum C.dbd.O stretching vibrations (T.sub.C) thereof, T.sub.Si /T.sub.C, being at least 1.0. The silicone-modified acrylic resin layer can be made from a water-soluble synthetic resin solution containing a silicone macromonomer (A) with a vinyl group being introduced into one terminal thereof, and a vinyl monomer (B) which is copolymerizable with the silicone macromonomer (A), with the molecular weight of the silicone macromonomer (A) of the silicone-modified acrylic resin being in the range of 1,000 to 10,000. Methods of producing such carriers are provided.
    Type: Grant
    Filed: December 6, 1995
    Date of Patent: July 29, 1997
    Assignee: Ricoh Company, Ltd.
    Inventors: Satoshi Mochizuki, Fumihiro Sasaki, Hidefumi Gohhara, Norio Yokoyama, Yutaka Sakai, Takahisa Kato, Tohru Suganuma, Susumu Kawakami, Hironori Hata
  • Patent number: 4696862
    Abstract: A magnetic recording medium includes a metal magnetic layer (4) formed on a nonmagnetic base (1). On one major surface (1A) of the nonmagnetic base (1) is formed a metal layer (2) at least the surface of which is oxidized, nitrogenated or carbonized on which the metal magnetic layer (4) is further formed. This magnetic recording medium is capable of improving the durability of the metal magnetic layer (4).
    Type: Grant
    Filed: January 12, 1983
    Date of Patent: September 29, 1987
    Assignee: Sony Corporation
    Inventors: Takahiro Kawana, Norio Yokoyama