Abstract: An evaluation method for evaluating an aberration of a projection optical system in an exposure apparatus is provided. A first prediction coefficient of a first prediction formula for an aberration that is symmetrical with respect to an optical axis of the projection optical system is obtained, and a second prediction coefficient of a second prediction formula for an aberration that is asymmetrical with respect to the optical axis of the projection optical system is obtained. The aberration of the projection optical system is evaluated using the first prediction coefficient in a case where the shape of the illuminated region is determined as symmetrical with respect to the optical axis, and the aberration of the projection optical system is evaluated using the first and the second prediction coefficients in a case where the shape of the illuminated region is asymmetrical with respect to the optical axis.

Abstract: An evaluation method for evaluating an aberration of a projection optical system in an exposure apparatus is provided. A first prediction coefficient of a first prediction formula for an aberration that is symmetrical with respect to an optical axis of the projection optical system is obtained, and a second prediction coefficient of a second prediction formula for an aberration that is asymmetrical with respect to the optical axis of the projection optical system is obtained. The aberration of the projection optical system is evaluated using the first prediction coefficient in a case where the shape of the illuminated region is determined as symmetrical with respect to the optical axis, and the aberration of the projection optical system is evaluated using the first and the second prediction coefficients in a case where the shape of the illuminated region is asymmetrical with respect to the optical axis.

Abstract: A detecting apparatus that detects a mark includes: an imaging device configured to perform imaging of the mark; and a controller configured to control the imaging device. The controller is configured to control the imaging device such that only a period in which a position of an object with the mark is within a tolerance is a period of the imaging before the position converges within the tolerance.

Abstract: A detecting apparatus that detects a mark includes: an imaging device configured to perform imaging of the mark; and a controller configured to control the imaging device. The controller is configured to control the imaging device such that only a period in which a position of an object with the mark is within a tolerance is a period of the imaging before the position converges within the tolerance.

Abstract: A position measurement apparatus that measures a position of an object using a reference mark includes a first illumination optical system configured to illuminate the object using measurement light from a light source which emits light of a first wavelength band, a second illumination optical system configured to illuminate the reference mark using reference light of a second wavelength band, and a position measurement unit configured to detect light from the object and light from the reference mark and to obtain the position of the object based on the detection result, and the second wavelength band of the reference light is set between an upper limit and a lower limit of the first wavelength band of the measurement light from the light source.

Abstract: An exposure apparatus exposes a resist on a substrate to light via an optical system. The exposure apparatus includes: a table configured to position the substrate at an exposure position upon holding the substrate; an obtaining unit configured to obtain a distance from an alignment mark formed on the substrate to a resist surface, and a tilt of the resist surface; and a control unit configured to calculate a correction value for correcting a shift in exposure position, that occurs upon tilt correction of the table, so as to reduce the tilt of the resist surface, using the distance and the tilt, and control a position of the table in accordance with the correction value.

Abstract: The present invention provides an exposure apparatus including a measurement unit configured to measure a position of the mark on a substrate, and a control unit configured to control an amount of light on a predetermined plane of an optical system included in the measurement unit, wherein an amount of light emitted by a light source is smaller in a non-measurement period in which the position of the mark is not measured than in a measurement period in which the position of the mark is measured, and the control unit sets a transmittance in an optical path between the light source and the predetermined plane to be higher in the non-measurement period than in the measurement period.

Abstract: An exposure apparatus exposes a resist on a substrate to light via an optical system. The exposure apparatus includes: a table configured to position the substrate at an exposure position upon holding the substrate; an obtaining unit configured to obtain a distance from an alignment mark formed on the substrate to a resist surface, and a tilt of the resist surface; and a control unit configured to calculate a correction value for correcting a shift in exposure position, that occurs upon tilt correction of the table, so as to reduce the tilt of the resist surface, using the distance and the tilt, and control a position of the table in accordance with the correction value.

Abstract: The present invention provides an exposure apparatus including a measurement unit configured to measure a position of the mark on a substrate, and a control unit configured to control an amount of light on a predetermined plane of an optical system included in the measurement unit, wherein an amount of light emitted by a light source is smaller in a non-measurement period in which the position of the mark is not measured than in a measurement period in which the position of the mark is measured, and the control unit sets a transmittance in an optical path between the light source and the predetermined plane to be higher in the non-measurement period than in the measurement period.

Abstract: A position detection apparatus includes an imaging system, an illumination system including a rotary table having first and second aperture stops, both of which can be positioned on the pupil plane of the illumination system, a first image sensor that detects the image of the mark formed by the imaging system, a second image sensor that senses an image of the aperture stop for the imaging system and that of the first aperture stop, and a controller. The controller corrects the first aperture stop so as to reduce the adverse influence of a displacement of the first aperture stop, based on sensed images of the aperture stop for the imaging system and the first aperture stop. Based on the detected position of the image of the mark, the apparatus detects the position of an object to be detected using the illumination light having passed through the corrected first aperture stop.

Abstract: A position detection apparatus includes an imaging system, an illumination system including a rotary table having first and second aperture stops, both of which can be positioned on the pupil plane of the illumination system, a first image sensor that detects the image of the mark formed by the imaging system, a second image sensor that senses an image of the aperture stop for the imaging system and that of the first aperture stop, and a controller. The controller corrects the first aperture stop so as to reduce the adverse influence of a displacement of the first aperture stop, based on sensed images of the aperture stop for the imaging system and the first aperture stop. Based on the detected position of the image of the mark, the apparatus detects the position of an object to be detected using the illumination light having passed through the corrected first aperture stop.

Abstract: A position detection apparatus includes an imaging system, an illumination system including a rotary table having first and second aperture stops, both of which can be positioned on the pupil plane of the illumination system, a first image sensor that detects the image of the mark formed by the imaging system, a second image sensor that senses an image of the aperture stop for the imaging system and that of the first aperture stop, and a controller. The controller corrects the first aperture stop so as to reduce the adverse influence of a displacement of the first aperture stop, based on sensed images of the aperture stop for the imaging system and the first aperture stop. Based on the detected position of the image of the mark, the apparatus detects the position of an object to be detected using the illumination light having passed through the corrected first aperture stop.

Abstract: A position detection apparatus includes an imaging system, an illumination system including a rotary table having first and second aperture stops, both of which can be positioned on the pupil plane of the illumination system, a first image sensor that detects the image of the mark formed by the imaging system, a second image sensor that senses an image of the aperture stop for the imaging system and that of the first aperture stop, and a controller. The controller corrects the first aperture stop so as to reduce the adverse influence of a displacement of the first aperture stop, based on sensed images of the aperture stop for the imaging system and the first aperture stop. Based on the detected position of the image of the mark, the apparatus detects the position of an object to be detected using the illumination light having passed through the corrected first aperture stop.