Patents by Inventor Noriyasu Shinohara
Noriyasu Shinohara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11932716Abstract: There is provided a radiation-curable resin composition for formation of a primary covering layer, the radiation-curable resin composition being able to form a cured layer having excellent flexibility and adequate mechanical strength. A radiation-curable resin composition for formation of a primary covering layer of an optical fiber, comprising a urethane oligomer, a polymerization initiator and a free-radically polymerizable non-urethane monomer, the urethane oligomer being the reaction product of a polyether-based urethane prepolymer and an isocyanate reactive compound containing one active hydrogen group, the isocyanate reactive compound containing an aliphatic alcohol and an ethylenic unsaturated group-containing isocyanate reactive compound, and the aliphatic alcohol content in the isocyanate reactive compound being 24 mol % or higher.Type: GrantFiled: August 30, 2019Date of Patent: March 19, 2024Assignee: Covestro (Netherlands) B.V.Inventors: Noriyasu Shinohara, Seiichirou Takahashi
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Publication number: 20240010553Abstract: Provided is a composition for forming a coating layer of an optical fiber, the composition comprising a compound having a structure represented by the following formula (I): *—NH—CO—N(R1)—R2—SiR3n—(OR4)3-n??(I) wherein, R1 is a hydrogen atom, an alkyl group, or an aryl group, R2 is a methylene group optionally substituted with a halogen, a C2-10 alkylene group that may have a heteroatom or an atomic group having a heteroatom between carbon atoms and may optionally be substituted with a halogen, or a phenylene group that may have a substituent, R3 is an alkyl group, and R4 is a C1-6 alkyl group, * being a bond and n indicating an integer of 0 or more and 2 or less.Type: ApplicationFiled: November 17, 2021Publication date: January 11, 2024Inventors: Takumi Nakajima, Noriyasu Shinohara
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Patent number: 11697616Abstract: [Problem] To provide a radiation curable resin composition which is suitable as a primary material for optical fibers, while having a high curing rate by means of irradiation of radiation [Solution] A radiation polymerizable composition for forming an optical fiber primary coating layer, said composition containing: (A) a urethane oligomer containing a structure represented by formula (I) (in formula (I), R represents a vinyl group; and * represents a bonding hand); (B) one or more compounds selected from among (i) maleic acid anhydride, (ii) a compound represented by formula (II) (in formula (II), RI represents a single bond or an alkanediyl group having from 1 to 6 carbon atoms; and R2 represents a hydrogen atom, a hydroxy group or a specific group represented by formula (II-1) or formula (II-2)), and (iii) a compound represented by formula (III) (in formula (III), R5 represents an alkanediyl group having from 1 to 6 carbon atoms); and (C) a radiation polymerization initiator.Type: GrantFiled: January 15, 2021Date of Patent: July 11, 2023Assignee: Japan Fine Coatings Co., Ltd.Inventors: Daigou Mochizuki, Takumi Nakajima, Noriyasu Shinohara
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Publication number: 20230122926Abstract: [Problem] To provide a radiation curable resin composition that is suitable as a primary material of an optical fiber and has a fast curing rate by irradiation with radiation. [Solution] A radiation polymerizable composition for forming a primary coating layer of an optical fiber, the radiation polymerizable composition comprising: (A) a urethane oligomer comprising a structure represented by formula (I) below: wherein R is a vinyl group and * is a bond; (B) one or more compounds of: (i) maleic anhydride, (ii) a compound represented by formula (II): wherein R1 is a single bond or an alkanediyl group comprising 1 to 6 carbon atoms, and R2 is a hydrogen atom, a hydroxy group, or a group represented by predetermined formula (II-1) or formula (II-2), or (iii) a compound represented by formula (III): wherein R5 is an alkanediyl group comprising 1 to 6 carbon atoms; and (C) a radiation polymerization initiator.Type: ApplicationFiled: January 15, 2021Publication date: April 20, 2023Inventors: Daigou MOCHIZUKI, Takumi NAKAJIMA, Noriyasu SHINOHARA
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Publication number: 20210171691Abstract: There is provided a radiation-curable resin composition for formation of a primary covering layer, the radiation-curable resin composition being able to form a cured layer having excellent flexibility and adequate mechanical strength. A radiation-curable resin composition for formation of a primary covering layer of an optical fiber, comprising a urethane oligomer, a polymerization initiator and a free-radically polymerizable non-urethane monomer, the urethane oligomer being the reaction product of a polyether-based urethane prepolymer and an isocyanate reactive compound containing one active hydrogen group, the isocyanate reactive compound containing an aliphatic alcohol and an ethylenic unsaturated group-containing isocyanate reactive compound, and the aliphatic alcohol content in the isocyanate reactive compound being 24 mol % or higher.Type: ApplicationFiled: August 30, 2019Publication date: June 10, 2021Inventors: Noriyasu SHINOHARA, Seiichirou TAKAHASHI
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Patent number: 8207239Abstract: The present invention aims to provide a radiation-curing liquid resin composition for optical tridimensional modeling having good storage stability. The suitable radiation-curing liquid resin composition for optical tridimensional modeling of the present invention includes a compound represented by the below general formula (1), a compound having phenolic hydroxyl group, a cationic polymerizable compound, a radical polymerization initiator, a radical polymerizable compound, one or more sulfur compound selected from the group consisting of 2-mercaptobenzothiazole, 2-(4-morpholinodithiobenzothiazole, diisopropylxantogendisulfide and diphenyldisulfide, a polyether polyol compound.Type: GrantFiled: October 17, 2011Date of Patent: June 26, 2012Assignees: DSM IP Assets B.V., JSR Corporation, Japan Fine Coatings Co. Ltd.Inventors: Katsuyuki Takase, Takayoshi Tanabe, Noriyasu Shinohara
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Publication number: 20120041091Abstract: The present invention aims to provide a radiation-curing liquid resin composition for optical tridimensional modeling having good storage stability. The suitable radiation-curing liquid resin composition for optical tridimensional modeling of the present invention includes a compound represented by the below general formula (1), a compound having phenolic hydroxyl group, a cationic polymerizable compound, a radical polymerization initiator, a radical polymerizable compound, one or more sulfur compound selected from the group consisting of 2-mercaptobenzothiazole, 2-(4-morpholinodithiobenzothiazole, diisopropylxantogendisulfide and diphenyldisulfide, a polyether polyol compound.Type: ApplicationFiled: October 17, 2011Publication date: February 16, 2012Applicants: DSM IP ASSETS B.V., Japan Fine Coatings Co., Ltd., JSR CorporationInventors: Katsuyuki Takase, Takayoshi Tanabe, Noriyasu Shinohara
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Publication number: 20110144271Abstract: The present invention aims to provide a radiation-curing liquid resin composition for optical tridimensional modeling having good storage stability. The suitable radiation-curing liquid resin composition for optical tridimensional modeling of the present invention includes a compound represented by the below general formula (1), a compound having phenolic hydroxyl group, a cationic polymerizable compound, a radical polymerization initiator, a radical polymerizable compound, one or more sulfur compound selected from the group consisting of 2-mercaptobenzothiazole, 2-(4-morpholinodithiobenzothiazole, diisopropylxantogendisulfide and diphenyldisulfide, a polyether polyol compound.Type: ApplicationFiled: June 16, 2006Publication date: June 16, 2011Applicant: JSR CORPORATIONInventors: Katsuyuki Takase, Takayoshi Tanabe, Noriyasu Shinohara
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Publication number: 20080096033Abstract: To provide a curable a composition exhibiting excellent applicability and capable of forming a coating having high hardness, low curling properties, and excellent flexibility on the surface of a substrate, and a cured film including a cured product of the composition. A curable composition comprising: (A) 30 to 80 wt % of metal oxide particles to which an organic compound containing a polymerizable unsaturated group is bonded, and (B) 5 to 50 wt % of a urethane (meth)acrylate having an aromatic cyclic structure in the molecule and including three or more (meth)acryloyl groups, provided that the total amount of the composition excluding an organic solvent is 100 wt %; and a cured layer formed by curing the composition, and a laminate.Type: ApplicationFiled: October 14, 2005Publication date: April 24, 2008Applicant: JSR CORPORATIONInventors: Noriyasu Shinohara, Ryousuke Iinuma, Jiro Ueda, Takayoshi Tanabe
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Publication number: 20070219314Abstract: To provide a curable composition exhibiting excellent applicability and capable of forming a coating having high hardness, showing a small amount of curling after hot water immersion, and exhibiting excellent scratch resistance on the surface of a substrate, and a cured product of the composition. [Means for the Solution] A curate composition, comprising: (A) 5 to 70 wt % of metal oxide particles having a refractive index of 1.50 or more, to which an organic compound containing a polymerizable unsaturated group is bonded; and (B) 10 to 50 wt % of a compound shown by the following formula (I), the amount of each component being based on the total amount of the composition excluding a solvent, and a cured product produced by curing the curate composition.Type: ApplicationFiled: October 14, 2005Publication date: September 20, 2007Applicant: JSR CorporationInventors: Noriyasu Shinohara, Shinji Usui, Takayoshi Tanabe
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Publication number: 20070178298Abstract: To provide a curable composition having excellent applicability and capable of forming a coat (film) having high hardness and high refractive index and excelling in scratch resistance and adhesion to a substrate and a low-refractive-index layer on the surface of various types of substrates, a cured product of the curable composition, and a laminate having a low reflectance and excelling in antistatic property. A curate e composition comprising particles (A) prepared by bonding oxide particles of at least one element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium with an organic compound having a polymerizable unsaturated group, a compound (B) having a urethane bond and two or more polymerizable unsaturated groups in the molecule, and a photoinitiator (C).Type: ApplicationFiled: March 25, 2005Publication date: August 2, 2007Applicants: DSM IP ASSETS B.V., JSR CORPORATION, JAPAN FINE COATINGS CO., LTDInventors: Yasunobu Suzuki, Ryousuke Iinuma, Noriyasu Shinohara, Zen Komiya
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Publication number: 20070066703Abstract: The present invention relates to a radiation-curable resin composition which produces a cured film having low surface resistivity and high transparency, a cured film of the composition, and a laminate including a layer of the cured film. The laminate of the present invention is suitably used as a hard coat material for preventing scratches or stains on a plastic optical part, touch panel, film-type liquid crystal element, plastic container, or flooring material, wall material, or artificial marble as an architectural interior finish; adhesive and sealing material for various substrates; vehicle for printing ink; or the like.Type: ApplicationFiled: July 23, 2004Publication date: March 22, 2007Inventors: Noriyasu Shinohara, Hiroyuki Mano, Takayoshi Tanabe, John Southwell, Christopher Tronche
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Publication number: 20060247353Abstract: A curable composition comprising: (A) reactive particles prepared by bonding oxide particles of at least one element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium to an organic compound having a polymerizable unsaturated group and a hydrolyzable silyl group, (B) an organic compound having two or more polymerizable unsaturated groups, and (C) a both terminal reactive polysiloxane compound other than the component (B).Type: ApplicationFiled: May 18, 2004Publication date: November 2, 2006Inventors: Jiro Ueda, Noriyasu Shinohara, Isao Nishiwaki, Takayoshi Tanabe
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Publication number: 20060155016Abstract: The invention relates to a curable composition comprising (A) particles prepared by bonding at least one oxide of an element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium, and an organic compound which comprises a polymerizable group, (B) a compound having a melamine group and no polymerizable unsaturated groups and (C) a compound having at least two polymerizable groups in the molecule other than the component (B); and to cured products and laminates with a with low reflectance and superior chemical resistance.Type: ApplicationFiled: March 21, 2003Publication date: July 13, 2006Inventors: Noriyasu Shinohara, Yasunobu Suzuki, Yoshikazu Yamaguchi, Takayoshi Tanabe
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Publication number: 20060115669Abstract: To provide a curable composition having excellent applicability and capable of forming a coat (film) having high hardness and high refractive index, excelling in scratch resistance and adhesion to a substrate and a low-refractive-index layer, and excelling in scratch resistance even in the case where the cured product is allowed to stand in a high pH environment or the composition is cured under anaerobic conditions on the surface of various types of substrates, a cured product of the curable composition, and a laminate having low reflectance and excelling in chemical resistance. Means for the Solution.Type: ApplicationFiled: February 18, 2004Publication date: June 1, 2006Inventors: Noriyasu Shinohara, Yasunobu Suzuki, Takayoshi Tanabe
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Patent number: 6852370Abstract: A composition for film formation capable of forming a coating film excellent in low dielectric constant characteristics, cracking resistance, modulus of elasticity, and adhesion to substrates and useful as an interlayer insulating film material in semiconductor devices, etc. The composition for film formation contains (A) at least one member selected from an aromatic polyarylene and an aromatic poly(arylene ether), (B) a polyvinylsiloxane, and (C) an organic solvent.Type: GrantFiled: March 22, 2002Date of Patent: February 8, 2005Assignee: JSR CorporationInventors: Noriyasu Shinohara, Kaori Shirato, Michinori Nishikawa, Takashi Okada, Kinji Yamada
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Publication number: 20020172652Abstract: A composition for film formation capable of forming a coating film excellent in low dielectric constant characteristics, cracking resistance, modulus of elasticity, and adhesion to substrates and useful as an interlayer insulating film material in semiconductor devices, etc. The composition for film formation contains (A) at least one member selected from an aromatic polyarylene and an aromatic poly (arylene ether), (B) a polyvinylsiloxane, and (C) an organic solvent.Type: ApplicationFiled: March 22, 2002Publication date: November 21, 2002Applicant: JSR CORPORATIONInventors: Noriyasu Shinohara, Kaori Shirato, Michinori Nishikawa, Takashi Okada, Kinji Yamada